Inventor · disambiguated record
Hiroaki Takaiwa
Also filed as: TAKAIWA HIROAKI
32 granted patents·14 pending applications·190 citations·filing 2004–2018
97Inventor score
Top patents by PatentIndex Score
46 records- 0198US7486380B2Wafer table for immersion lithographyNIKON CORP·Filed 2006·Granted Feb 3, 2009·46 cites·48 claims
- 0298US7301607B2Wafer table for immersion lithographyNIKON CORP·Filed 2005·Granted Nov 27, 2007·48 cites·76 claims
- 0396US7826031B2Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing methodNIKON CORP·Filed 2006·Granted Nov 2, 2010·21 cites·17 claims
- 0494US7990517B2Immersion exposure apparatus and device manufacturing method with residual liquid detectorNIKON CORP·Filed 2007·Granted Aug 2, 2011·13 cites·14 claims
- 0594US7847916B2Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing methodNIKON CORP·Filed 2005·Granted Dec 7, 2010·12 cites·18 claims
- 0692US7990516B2Immersion exposure apparatus and device manufacturing method with liquid detection apparatusNIKON CORP·Filed 2005·Granted Aug 2, 2011·11 cites·23 claims
- 0790US8749757B2Exposure apparatus, method for producing device, and method for controlling exposure apparatusNIKON CORP·Filed 2013·Granted Jun 10, 2014·4 cites·125 claims
- 0885US9019467B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2013·Granted Apr 28, 2015·2 cites·35 claims
- 0983US8508718B2Wafer table having sensor for immersion lithographyHAZELTON ANDREW J·Filed 2008·Granted Aug 13, 2013·4 cites·29 claims
- 1082US8488101B2Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload positionTAKAIWA HIROAKI·Filed 2011·Granted Jul 16, 2013·2 cites·30 claims
- 1181US8102512B2Substrate holding device, exposure apparatus, and device manufacturing methodSHIBUTA MAKOTO·Filed 2005·Granted Jan 24, 2012·6 cites·11 claims
- 1279US8054447B2Exposure apparatus, exposure method, method for producing device, and optical partNIKON CORP·Filed 2004·Granted Nov 8, 2011·11 cites·37 claims
- 1378US8451424B2Exposure apparatus, method for producing device, and method for controlling exposure apparatusMAGOME NOBUTAKA·Filed 2006·Granted May 28, 2013·4 cites·51 claims
- 1476US9041901B2Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing methodHARA HIDEAKI·Filed 2008·Granted May 26, 2015·2 cites·59 claims
- 1567US9341959B2Substrate holding device, exposure apparatus, and device manufacturing methodSHIBUTA MAKOTO·Filed 2011·Granted May 17, 2016·1 cites·17 claims
- 1667US2018299789A1Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing methodNIKON CORP·Filed 2018·Application pending·0 cites
- 1766US8034539B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2007·Granted Oct 11, 2011·1 cites·8 claims
- 1866US2019094708A1Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2018·Application pending·0 cites
- 1965US9268237B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2013·Granted Feb 23, 2016·0 cites·26 claims
- 2065US7973910B2Stage apparatus and exposure apparatusNIKON CORP·Filed 2007·Granted Jul 5, 2011·1 cites·12 claims
- 2165US2018364581A1Exposure apparatus, exposure method, method for producing device, and optical partNIKON CORP·Filed 2018·Application pending·0 cites
- 2264US9846371B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIPPON KOGAKU KK·Filed 2015·Granted Dec 19, 2017·0 cites·17 claims
- 2364US9041906B2Immersion exposure apparatus and method that detects liquid adhered to rear surface of substrateNIKON CORP·Filed 2013·Granted May 26, 2015·0 cites·24 claims
- 2464US8749755B2Stage apparatus and exposure apparatusTAKAIWA HIROAKI·Filed 2011·Granted Jun 10, 2014·1 cites·18 claims
- 2562US10012909B2Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing methodNIKON CORP·Filed 2015·Granted Jul 3, 2018·0 cites·33 claims
- 2662US8867017B2Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing methodNIKON CORP·Filed 2013·Granted Oct 21, 2014·0 cites·127 claims
- 2762US2017329234A1Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2017·Application pending·0 cites
- 2861US10151983B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2015·Granted Dec 11, 2018·0 cites·43 claims
- 2961US9182685B2Exposure apparatus, exposure method, method for producing device, and optical partNIKON CORP·Filed 2013·Granted Nov 10, 2015·0 cites·20 claims
- 3061US8384880B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2008·Granted Feb 26, 2013·0 cites·17 claims
- 3161US8208117B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodOWA SOICHI·Filed 2008·Granted Jun 26, 2012·0 cites·8 claims
- 3261US2013301016A1Wafer table having sensor for immersion lithographyNIKON CORP·Filed 2013·Application pending·0 cites
- 3361US2013301018A1Wafer table having sensor for immersion lithographyNIKON CORP·Filed 2013·Application pending·0 cites
- 3460US2018292759A1Substrate holding device, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2018·Application pending·0 cites
- 3558US10088760B2Exposure apparatus, exposure method, method for producing device, and optical partNIKON CORP·Filed 2015·Granted Oct 2, 2018·0 cites·15 claims
- 3657US8854599B2Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing methodHARA HIDEAKI·Filed 2010·Granted Oct 7, 2014·0 cites·56 claims
- 3757US8767168B2Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposureTAKAIWA HIROAKI·Filed 2011·Granted Jul 1, 2014·0 cites·8 claims
- 3855US9019469B2Exposure apparatus, exposure method, method for producing device, and optical partNAGASAKA HIROYUKI·Filed 2006·Granted Apr 28, 2015·0 cites·23 claims
- 3955US2016231653A1Substrate holding device, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2016·Application pending·0 cites
- 4053US2006227312A1Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2006·Application pending·0 cites
- 4151US2005225735A1Exposure apparatus and method for producing deviceNIKON CORP·Filed 2005·Application pending·0 cites
- 4251US2016103397A1Exposure Apparatus with Component from which Liquid is Protected and/or Removed and Device Fabricating MethodNIKON CORP·Filed 2015·Application pending·0 cites
- 4350US9223224B2Exposure apparatus with component from which liquid is protected and/or removed and device fabricating methodHARA HIDEAKI·Filed 2006·Granted Dec 29, 2015·0 cites·43 claims
- 4449US2010259737A1Exposure apparatus preventing gas from moving from exposure region to measurement regionNIKON CORP·Filed 2010·Application pending·0 cites
- 4548US2008151200A1Exposure Apparatus and Device Manufacturing MethodNIKON CORP·Filed 2005·Application pending·0 cites
- 4643US2008073982A1Magnetic Guide Apparatus, Stage Apparatus, Exposure Apparatus, and Device Manufacturing MethodNIKON CORP·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →