Assignee
TAKAIWA HIROAKI
JP·3 granted patents·3 citations·filing 2011–2011
Top patents by PatentIndex Score
3 records- 0182US8488101B2Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload positionTAKAIWA HIROAKI·Filed 2011·Granted Jul 16, 2013·2 cites·30 claims
- 0264US8749755B2Stage apparatus and exposure apparatusTAKAIWA HIROAKI·Filed 2011·Granted Jun 10, 2014·1 cites·18 claims
- 0357US8767168B2Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposureTAKAIWA HIROAKI·Filed 2011·Granted Jul 1, 2014·0 cites·8 claims
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