Exposure apparatus and device manufacturing method

Abstract

An exposure apparatus includes a projection optical system, a substrate stage which is movable and has a holder to hold a substrate, and a detection apparatus that detects whether liquid is present on a surface of an object, which is disposed lower than a front end of the projection optical system. The surface of the object includes a recessed portion formed on the object. The substrate is exposed by emitting exposure light onto the substrate through the projection optical system and a liquid in a liquid immersion area locally formed on a portion of an upper surface of the substrate.

1 . An exposure apparatus comprising:
 a projection optical system;   a substrate stage which is movable and has a holder to hold a substrate; and   a detection apparatus that detects whether liquid is present on a surface of an object, which is disposed lower than a front end of the projection optical system, wherein   the surface of the object includes a recessed portion formed on the object, and   the substrate is exposed by emitting exposure light onto the substrate through the projection optical system and a liquid in a liquid immersion area locally formed on a portion of an upper surface of the substrate.   
     
     
         2 . The exposure apparatus according to  claim 1 , wherein the object is movable with respect to the projection optical system. 
     
     
         3 . The exposure apparatus according to  claim 2 , wherein the object includes the substrate stage and the recessed portion is provided to the substrate stage. 
     
     
         4 . The exposure apparatus according to  claim 3 , wherein the holder holds the substrate which is disposed in the recessed portion. 
     
     
         5 . The exposure apparatus according to  claim 1 , wherein detection by the detection apparatus is performed while relatively moving detection light of the detection apparatus and the object. 
     
     
         6 . The exposure apparatus according to  claim 1 , wherein the detection apparatus has an emitting portion that emits detection light and a light receiving portion disposed at a predetermined position to receive light from the object. 
     
     
         7 . The exposure apparatus according to  claim 6 , wherein a position of the liquid on the object is obtained based on a light receiving result of the light receiving portion. 
     
     
         8 . The exposure apparatus according to  claim 1 , further comprising:
 a liquid supply system having a supply port via which the liquid is supplied; and   a liquid recovery system having a recovery port via which the supplied liquid is collected,   wherein an operation of at least one of the liquid supply system and the liquid recovery system is controlled based on a detection result of the detection apparatus.   
     
     
         9 . The exposure apparatus according to  claim 8 , wherein the supply of the liquid by the liquid supply system is stopped if it is determined that the detection result of the detection apparatus is abnormal. 
     
     
         10 . The exposure apparatus according to  claim 1 , wherein an exposure operation is controlled based on a detection result of the detection apparatus. 
     
     
         11 . A device manufacturing method comprising:
 exposing a wafer using the exposure apparatus according to  claim 1 , and   processing the exposed wafer.