Exposure method, substrate stage, exposure apparatus, and device manufacturing method

Abstract

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

What is claimed is: 
     
         1 . An exposure apparatus which exposes a substrate with light via a liquid immersion region formed with liquid, the exposure apparatus comprising:
 a stage which supports the substrate;   a projection optical system which projects a pattern image in a projection region on the substrate supported on the stage; and   a liquid supply and recovery system which forms the liquid immersion region on a part of the substrate supported on the stage so that the projection region is located in the liquid immersion region,   wherein the liquid supply and recovery system comprises a supply port to supply liquid and a recovery port to recovery liquid, the supply port being located off the projection region with respect to a direction perpendicular to an optical axis of the projection optical system, the recovery port being located away from the projection region compared to the supply port, the supply port and the recovery port being arranged above the stage, and   wherein the stage comprises a substrate holder to hold the substrate and a flow channel to recovery liquid, the substrate holder being disposed in a concave portion formed on the stage, the flow channel being disposed in the stage so as to remove liquid from the concave portion.   
     
     
         2 . The exposure apparatus according to  claim 1 , wherein the substrate holder comprises at least one peripheral wall and supporting portions disposed in a space surrounded by the peripheral wall, and the substrate holder is configured to hold the substrate on the supporting portions by applying a negative pressure to the space surrounded by the peripheral wall. 
     
     
         3 . The exposure apparatus according to  claim 2 , wherein the peripheral wall includes a first peripheral wall that faces an inner surface of the concave portion and a second peripheral wall that is disposed between the first peripheral wall and the supporting portion. 
     
     
         4 . The exposure apparatus according to  claim 2 , wherein the flow channel is connected to a space between the peripheral wall and an inner surface of the concave portion. 
     
     
         5 . The exposure apparatus according to  claim 1 , wherein the recovery port is provided to face the surface of the substrate held by the substrate holder. 
     
     
         6 . The exposure apparatus according to  claim 1 , wherein an upper surface of the stage around the concave portion is arranged so that a height of the upper surface of the stage around the concave portion is substantially the same height as an upper surface of the substrate supported by the substrate holder. 
     
     
         7 . The exposure apparatus according to  claim 6 , wherein the upper surface of the stage is arranged so as to contact with the liquid immersion region. 
     
     
         8 . A method for producing a device, comprising using the exposure apparatus according to  claim 1 .