Wafer table having sensor for immersion lithography

Abstract

A liquid immersion lithography apparatus and method exposes a substrate with light via a projection system and liquid. A table assembly has a top surface and is movable relative to the projection system while supporting the substrate. The top surface and the substrate are positionable opposite to the projection system such that the liquid is maintained between the projection system and a portion of one or both of the top surface and a surface of the substrate. A sensor has a top surface arranged at the top surface of the table assembly and is positionable opposite to the projection system such that a gap, in which the liquid can be maintained, is formed between the projection system and the top surface of the sensor. The top surfaces of the table assembly and of the sensor are apposed on a substantially same plane, or are substantially co-planar.

What is claimed is: 
     
         1 . A liquid immersion lithography apparatus which exposes a substrate with light via a projection optical system and a liquid, the apparatus comprising:
 a table assembly that has a top surface and is movable relative to the projection optical system while supporting the substrate at a top surface side of the table assembly, each of the top surface and the supported substrate being positionable opposite to the projection optical system such that the liquid is maintained between the projection optical system and a portion of one of the top surface and a surface of the supported substrate or both; and   a sensor that has a top surface, the top surface of the sensor being arranged at the top surface of the table assembly and being positionable opposite to the projection optical system such that a gap, in which the liquid is capable of being maintained, is formed between the projection optical system and the top surface of the sensor,   wherein the top surface of the table assembly and the top surface of the sensor are apposed on a substantially same plane, or are substantially co-planar.   
     
     
         2 . The apparatus according to  claim 1 , wherein
 the table assembly has an opening portion at the top surface of the table assembly, and   the substrate is supported at an inside of the opening portion.   
     
     
         3 . The apparatus according to  claim 2 , wherein the substrate is supported in the opening portion with a gap between edges of the substrate and of the opening portion. 
     
     
         4 . The apparatus according to  claim 3 , wherein the substrate, which is supported by the table assembly, and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         5 . The apparatus according to  claim 4 , further comprising;
 a mark member arranged at the table assembly, that has a top surface,   wherein the top surface of the mark member and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar.   
     
     
         6 . The apparatus according to  claim 5 , wherein the top surface of the mark member is positionable opposite to the projection optical system such that a gap, in which the liquid is capable of being maintained, is formed between the projection optical system and the top surface of the mark member. 
     
     
         7 . The apparatus according to  claim 5 , wherein
 the table assembly has a different opening portion from the opening portion at the top surface of the table assembly, and   the top surface of the mark member is arranged inside of the different opening portion.   
     
     
         8 . The apparatus according to  claim 7 , wherein the top surface of the mark member is arranged in the different opening portion with a gap between edges of the mark member and of the different opening portion. 
     
     
         9 . The apparatus according to  claim 5 , wherein the sensor is viewable via the projection optical system and the liquid maintained between the projection optical system and the top surface of the sensor. 
     
     
         10 . The apparatus according to  claim 5 , wherein the light is detected by the sensor via the projection optical system and the liquid maintained between the projection optical system and the top surface of the sensor. 
     
     
         11 . A liquid immersion lithography method of exposing a substrate with light via a projection optical system and a liquid, the method comprising:
 moving a table assembly that has a top surface and supports the substrate at a top surface side of the table assembly relative to the projection optical system, each of the top surface and the supported substrate being positioned opposite to the projection optical system such that the liquid is maintained between the projection optical system and a portion of one of the top surface and a surface of the supported substrate or both; and   positioning a top surface of a sensor opposite to the projection optical system such that a gap, in which the liquid is capable of being maintained, is formed between the projection optical system and the top surface of the sensor,   wherein the top surface of the sensor is arranged at the top surface of the table assembly, and   wherein the top surface of the table assembly and the top surface of the sensor are apposed on a substantially same plane, or are substantially co-planar.   
     
     
         12 . The method according to  claim 11 , wherein the table assembly has an opening portion at the top surface of the table assembly, and wherein the substrate is supported at an inside of the opening portion. 
     
     
         13 . The method according to  claim 12 , wherein the substrate is supported in the opening portion with a gap between edges of the substrate and of the opening portion. 
     
     
         14 . The method according to  claim 13 , wherein the substrate, which is supported by the table assembly, and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         15 . The method according to  claim 14 , wherein a top surface of a mark member arranged at the table assembly and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         16 . The method according to  claim 15 , wherein the top surface of the mark member is positioned opposite to the projection optical system such that a gap, in which the liquid is capable of being maintained, is formed between the projection optical system and the top surface of the mark member. 
     
     
         17 . The method according to  claim 15 , wherein the top surface of the mark member is arranged inside of a different opening portion from the opening portion at the top surface of the table assembly. 
     
     
         18 . The method according to  claim 17 , wherein the top surface of the mark member is arranged in the different opening portion with a gap between edges of the mark member and of the different opening portion. 
     
     
         19 . The method according to  claim 15 , wherein the sensor is viewed via the projection optical system and the liquid maintained between the projection optical system and the top surface of the sensor. 
     
     
         20 . The method according to  claim 15 , wherein the light is detected by the sensor via the projection optical system and the liquid maintained between the projection optical system and the top surface of the sensor. 
     
     
         21 . A device manufacturing method comprising:
 exposing a substrate using a liquid immersion lithography apparatus according to  claim 1 ; and   developing the exposed substrate.   
     
     
         22 . A device manufacturing method comprising:
 exposing a substrate using a liquid immersion lithography method according to  claim 11 ; and   developing the exposed substrate.   
     
     
         23 . A method of making a liquid immersion lithography apparatus which exposes a substrate with light via a projection optical system and a liquid, the method comprising:
 providing a table assembly that has a top surface and is movable relative to the projection optical system while supporting the substrate at a top surface side of the table assembly, each of the top surface and the supported substrate being positionable opposite to the projection optical system such that the liquid is maintained between the projection optical system and a portion of one of the top surface and a surface of the supported substrate or both; and   providing a sensor that has a top surface, the top surface of the sensor being arranged at the top surface of the table assembly and being positionable opposite to the projection optical system such that a gap, in which the liquid is capable of being maintained, is formed between the projection optical system and the top surface of the sensor,   wherein the top surface of the table assembly and the top surface of the sensor are apposed on a substantially same plane, or are substantially co-planar.