Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method

Abstract

An exposure apparatus includes a projection system, a stage having a holder on which a substrate is held, a supply system having a supply flow path via which liquid is supplied to form an immersion area under the projection system, a first recovery system having a recovery port via which the supplied liquid is recovered from above the stage, a second recovery system having a recovery flow path provided in the stage via which the supplied liquid is recovered, and a third recovery system which has a path and which removes liquid in the supply flow path using the path. The substrate is exposed via the liquid immersion area covering a portion of an upper surface of the substrate with exposure light from the projection system.

What is claimed is: 
     
         1 . An exposure apparatus comprising:
 a projection system;   a stage having a holder on which a substrate is held;   a supply system having a supply flow path via which liquid is supplied to form an immersion area under the projection system;   a first recovery system having a recovery port via which the supplied liquid is recovered from above the stage;   a second recovery system having a recovery flow path provided in the stage via which the supplied liquid is recovered; and   a third recovery system which has a path and which removes liquid in the supply flow path using the path,   wherein the substrate is exposed via the liquid immersion area covering a portion of an upper surface of the substrate with exposure light from the projection system.