Wafer table having sensor for immersion lithography

Abstract

A liquid immersion lithography apparatus and method exposes a substrate with light via a projection system and a liquid. A table assembly has a top surface and is movable relative to the projection system while supporting the substrate. The table assembly top surface has a first opening portion, and a top surface of a sensor is arranged inside of the first opening portion. The sensor top surface is positionable opposite the projection system by the table assembly such that a gap, in which the liquid can be maintained, is formed between the projection system and the sensor top surface. The table assembly and sensor top surfaces are apposed on a substantially same plane, or are substantially co-planar.

What is claimed is: 
     
         1 . A liquid immersion lithography apparatus which exposes a substrate with light via a projection optical system and a liquid, the apparatus comprising:
 a table assembly that has a top surface and is movable relative to the projection optical system while supporting the substrate at a top surface side of the table assembly, each of the top surface and the supported substrate being positionable opposite to the projection optical system such that the liquid is maintained between the projection optical system and a portion of one of the top surface and a surface of the supported substrate or both; and   a sensor that has a top surface; wherein   the table assembly has a first opening portion at the top surface of the table assembly,   the top surface of the sensor is arranged inside of the first opening portion and is positionable opposite to the projection optical system by the table assembly such that a gap, in which the liquid is capable of being maintained, is formed between the projection optical system and the top surface of the sensor, and   the top surface of the table assembly and the top surface of the sensor are apposed on a substantially same plane, or are substantially co-planar.   
     
     
         2 . The apparatus according to  claim 1 , wherein the top surface of the sensor is arranged in the first opening portion with a gap between edges of the sensor top surface and of the first opening portion. 
     
     
         3 . The apparatus according to  claim 1 , wherein the substrate, which is supported by the table assembly, and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         4 . The apparatus according to  claim 3 , further comprising;
 a mark member that is arranged at the table assembly and that has a top surface,   wherein the top surface of the mark member and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar.   
     
     
         5 . The apparatus according to  claim 1 , wherein the table assembly has a second opening portion at the top surface of the table assembly, and
 wherein the substrate is supported at an inside of the second opening portion.   
     
     
         6 . The apparatus according to  claim 5 , wherein the substrate, which is supported by the table assembly, and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         7 . The apparatus according to  claim 6 , wherein the substrate is supported in the second opening portion with a gap between edges of the substrate and of the second opening portion. 
     
     
         8 . The apparatus according to  claim 7 , further comprising;
 a mark member arranged at the table assembly and that has a top surface, wherein   the table assembly has a third opening portion at the top surface of the table assembly, and   the top surface of the mark member is arranged inside of the third opening portion.   
     
     
         9 . The apparatus according to  claim 8 , wherein the top surface of the mark member and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         10 . The apparatus according to  claim 9 , wherein the top surface of the mark member is positionable opposite to the projection optical system by the table assembly such that the liquid is maintained between the projection optical system and the top surface of the mark member. 
     
     
         11 . The apparatus according to  claim 9 , wherein the top surface of the mark member is arranged in the third opening portion with a gap between edges of the mark member top surface and of the third opening portion. 
     
     
         12 . The apparatus according to  claim 9 , wherein
 the projection optical system is supported by a first frame, and   the table assembly is capable of moving relative to the first frame.   
     
     
         13 . The apparatus according to  claim 12 , further comprising:
 a second frame arranged to release a reaction force, the reaction force being generated by the movement of the table assembly.   
     
     
         14 . The apparatus according to  claim 12 , further comprising;
 a mask stage arranged to support a mask having a pattern,   wherein a scanning exposure of the substrate is executable by moving the table assembly and the mask stage.   
     
     
         15 . The apparatus according to  claim 7 , wherein the sensor is viewable via the projection optical system and the liquid maintained between the projection optical system and the top surface of the sensor. 
     
     
         16 . The apparatus according to  claim 7 , wherein the light is detected by the sensor via the projection optical system and the liquid maintained between the projection optical system and the top surface of the sensor. 
     
     
         17 . The apparatus according to  claim 1 , further comprising;
 a mark member arranged at the table assembly and that has a top surface, wherein   the table assembly has a third opening portion at the top surface of the table assembly, and   the top surface of the mark member is arranged inside of the third opening portion.   
     
     
         18 . The apparatus according to  claim 17 , wherein the top surface of the mark member and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         19 . The apparatus according to  claim 18 , wherein the top surface of the mark member is positionable opposite to the projection optical system by the table assembly such that the liquid is maintained between the projection optical system and the top surface of the mark member. 
     
     
         20 . The apparatus according to  claim 18 , wherein the top surface of the mark member is arranged in the third opening portion with a gap between edges of the mark member top surface and of the third opening portion. 
     
     
         21 . A liquid immersion lithography method of exposing a substrate with light via a projection optical system and a liquid, the method comprising:
 moving a table assembly that has a top surface and supports the substrate at a top surface side of the table assembly relative to the projection optical system, each of the top surface and the supported substrate being positioned opposite to the projection optical system such that the liquid is maintained between the projection optical system and a portion of one of the top surface and a surface of the supported substrate or both; and   positioning a top surface of a sensor opposite to the projection optical system such that a gap, in which the liquid is capable of being maintained, is formed between the projection optical system and the top surface of the sensor, wherein   the table assembly has a first opening portion at the top surface of the table assembly,   the top surface of the sensor is arranged inside of the first opening portion, and   the top surface of the table assembly and the top surface of the sensor are apposed on a substantially same plane, or are substantially co-planar.   
     
     
         22 . The method according to  claim 21 , wherein the top surface of the sensor is arranged in the first opening portion with a gap between edges of the sensor top surface and of the first opening portion. 
     
     
         23 . The method according to  claim 21 , wherein the substrate, which is supported by the table assembly, and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         24 . The method according to  claim 23 , wherein a top surface of a mark member arranged at the table assembly and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         25 . The method according to  claim 21 , wherein
 the table assembly has a second opening portion at the top surface of the table assembly, and   the substrate is supported at an inside of the second opening portion.   
     
     
         26 . The method according to  claim 25 , wherein the substrate, which is supported by the table assembly, and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         27 . The method according to  claim 26 , wherein the substrate is supported in the second opening portion with a gap between edges of the substrate and of the second opening portion. 
     
     
         28 . The method according to  claim 27 , wherein the table assembly has a third opening portion at the top surface of the table assembly, and a mark member having a top surface which is arranged inside of the third opening portion. 
     
     
         29 . The method according to  claim 28 , wherein the top surface of the mark member and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         30 . The method according to  claim 29 , wherein the top surface of the mark member is positioned opposite to the projection optical system by the table assembly such that the liquid is maintained between the projection optical system and the top surface of the mark member. 
     
     
         31 . The method according to  claim 29 , wherein the top surface of the mark member is arranged in the third opening portion with a gap between edges of the mark member top surface and of the third opening portion. 
     
     
         32 . The method according to  claim 29 , wherein the table assembly is moved relative to a first frame which supports the projection optical system. 
     
     
         33 . The method according to  claim 32 , wherein a reaction force generated by the movement of the table assembly is released by a second frame. 
     
     
         34 . The method according to  claim 32 , wherein a scanning exposure of the substrate is executed by moving the table assembly and a mask stage which supports a mask having a pattern. 
     
     
         35 . The method according to  claim 27 , wherein the sensor is viewed via the projection optical system and the liquid maintained between the projection optical system and the top surface of the sensor. 
     
     
         36 . The method according to  claim 27 , wherein the light is detected by the sensor via the projection optical system and the liquid maintained between the projection optical system and the top surface of the sensor. 
     
     
         37 . The method according to  claim 21 , wherein the table assembly has a third opening portion at the top surface of the table assembly, and a mark member having a top surface which is arranged inside of the third opening portion. 
     
     
         38 . The method according to  claim 37 , wherein the top surface of the mark member and the top surface of the table assembly are apposed on the substantially same plane, or are substantially co-planar. 
     
     
         39 . The method according to  claim 38 , wherein the top surface of the mark member is positioned opposite to the projection optical system by the table assembly such that the liquid is maintained between the projection optical system and the top surface of the mark member. 
     
     
         40 . The method according to  claim 38 , wherein the top surface of the mark member is arranged in the third opening portion with a gap between edges of the mark member top surface and of the third opening portion. 
     
     
         41 . A device manufacturing method comprising:
 exposing a substrate using a liquid immersion lithography apparatus according to  claim 1 ; and   developing the exposed substrate.   
     
     
         42 . A device manufacturing method comprising:
 exposing a substrate using a liquid immersion lithography method according to  claim 21 ; and   developing the exposed substrate.   
     
     
         43 . A method of making a liquid immersion lithography apparatus which exposes a substrate with light via a projection optical system and a liquid, the method comprising:
 providing a table assembly that has a top surface and is movable relative to the projection optical system while supporting the substrate at a top surface side of the table assembly, each of the top surface and the supported substrate being positionable opposite to the projection optical system such that the liquid is maintained between the projection optical system and a portion of one of the top surface and a surface of the supported substrate or both; and   providing a sensor that has a top surface; wherein   the table assembly has a first opening portion at the top surface of the table assembly,   the top surface of the sensor is arranged inside of the first opening portion and is positionable opposite to the projection optical system by the table assembly such that a gap, in which the liquid is capable of being maintained, is formed between the projection optical system and the top surface of the sensor, and   the top surface of the table assembly and the top surface of the sensor are apposed on a substantially same plane, or are substantially co-planar.