Inventor · disambiguated record
Dale R. Du Bois
Also filed as: DU BOIS DALE R · DU BOIS DALE ROBERT
38 granted patents·16 pending applications·1,431 citations·filing 1991–2021
97Inventor score
Files withAPPLIED MATERIALS INC39DU BOIS DALE R2JANAKIRAMAN KARTHIK2SANKARAKRISHNAN RAMPRAKASH2BANSAL AMIT1
Top patents by PatentIndex Score
54 records- 0198US10774423B2Tunable ground planes in plasma chambersAPPLIED MATERIALS INC·Filed 2014·Granted Sep 15, 2020·41 cites·20 claims
- 0298US7566891B2Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectorsAPPLIED MATERIALS INC·Filed 2007·Granted Jul 28, 2009·553 cites·33 claims
- 0395US9355876B2Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locationsAPPLIED MATERIALS INC·Filed 2014·Granted May 31, 2016·452 cites·17 claims
- 0495US7777198B2Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiationAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·29 cites·30 claims
- 0593US8203126B2Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiationROCHA-ALVAREZ JUAN CARLOS·Filed 2010·Granted Jun 19, 2012·26 cites·15 claims
- 0692US5326725AClamping ring and susceptor thereforAPPLIED MATERIALS INC·Filed 1993·Granted Jul 5, 1994·166 cites·13 claims
- 0788US11031262B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2020·Granted Jun 8, 2021·2 cites·20 claims
- 0888US10570517B2Apparatus and method for UV treatment, chemical treatment, and depositionAPPLIED MATERIALS INC·Filed 2016·Granted Feb 25, 2020·2 cites·20 claims
- 0988US5320680APrimary flow CVD apparatus comprising gas preheater and means for substantially eddy-free gas flowSILICON VALLEY GROUP·Filed 1991·Granted Jun 14, 1994·74 cites·4 claims
- 1085US8274017B2Multifunctional heater/chiller pedestal for wide range wafer temperature controlYAP LIPYEOW·Filed 2009·Granted Sep 25, 2012·12 cites·20 claims
- 1180US10094486B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2015·Granted Oct 9, 2018·1 cites·14 claims
- 1280US9922819B2Wafer rotation in a semiconductor chamberAPPLIED MATERIALS INC·Filed 2017·Granted Mar 20, 2018·2 cites·20 claims
- 1379US10480077B2PEALD apparatus to enable rapid cyclingAPPLIED MATERIALS INC·Filed 2014·Granted Nov 19, 2019·1 cites·21 claims
- 1479US10281261B2In-situ metrology method for thickness measurement during PECVD processesAPPLIED MATERIALS INC·Filed 2016·Granted May 7, 2019·2 cites·16 claims
- 1579US10153185B2Substrate temperature measurement in multi-zone heaterAPPLIED MATERIALS INC·Filed 2014·Granted Dec 11, 2018·3 cites·14 claims
- 1679US8884524B2Apparatus and methods for improving reliability of RF groundingZHOU JIANHUA·Filed 2011·Granted Nov 11, 2014·4 cites·19 claims
- 1779US7922440B2Apparatus and method for centering a substrate in a process chamberAPPLIED MATERIALS INC·Filed 2008·Granted Apr 12, 2011·6 cites·20 claims
- 1878US9593419B2Wafer rotation in a semiconductor chamberAPPLIED MATERIALS INC·Filed 2015·Granted Mar 14, 2017·2 cites·11 claims
- 1976US8778813B2Confined process volume PECVD chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2011·Granted Jul 15, 2014·4 cites·17 claims
- 2074US10636684B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2019·Granted Apr 28, 2020·1 cites·20 claims
- 2174US10227695B2Shadow ring for modifying wafer edge and bevel depositionDU BOIS DALE R·Filed 2010·Granted Mar 12, 2019·4 cites·13 claims
- 2272US9206511B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2013·Granted Dec 8, 2015·0 cites·17 claims
- 2370US11004663B2Chamber design for semiconductor processingAPPLIED MATERIALS INC·Filed 2014·Granted May 11, 2021·0 cites·14 claims
- 2469US10403515B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2016·Granted Sep 3, 2019·1 cites·13 claims
- 2568US6436194B1Method and a system for sealing an epitaxial silicon layer on a substrateAPPLIED MATERIALS INC·Filed 2001·Granted Aug 20, 2002·10 cites·18 claims
- 2668US2021217592A1Chamber design for semiconductor processingAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2766US8591699B2Method and system for supplying a cleaning gas into a process chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2012·Granted Nov 26, 2013·0 cites·20 claims
- 2865US2009236214A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2008·Application pending·0 cites
- 2962US11133210B2Dual temperature heaterAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·0 cites·20 claims
- 3060US10720349B2Temperature measurement in multi-zone heaterAPPLIED MATERIALS INC·Filed 2018·Granted Jul 21, 2020·0 cites·15 claims
- 3160US10527407B2In-situ metrology method for thickness measurement during PECVD processesAPPLIED MATERIALS INC·Filed 2019·Granted Jan 7, 2020·0 cites·20 claims
- 3258US6685779B2Method and a system for sealing an epitaxial silicon layer on a substrateAPPLIED MATERIALS INC·Filed 2002·Granted Feb 3, 2004·5 cites·15 claims
- 3355US10518418B2Wafer swapperAPPLIED MATERIALS INC·Filed 2018·Granted Dec 31, 2019·0 cites·19 claims
- 3455US2012205046A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2012·Application pending·0 cites
- 3554US2007298167A1Ozone abatement in a re-circulating cooling systemAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3653US10325799B2Dual temperature heaterAPPLIED MATERIALS INC·Filed 2015·Granted Jun 18, 2019·0 cites·9 claims
- 3750US9889567B2Wafer swapperAPPLIED MATERIALS INC·Filed 2015·Granted Feb 13, 2018·0 cites·7 claims
- 3850US6376387B2Method of sealing an epitaxial silicon layer on a substrateAPPLIED MATERIALS INC·Filed 1999·Granted Apr 23, 2002·13 cites·16 claims
- 3949US6170433B1Method and apparatus for processing a waferAPPLIED MATERIALS INC·Filed 1998·Granted Jan 9, 2001·14 cites·7 claims
- 4049US2009314211A1Big foot lift pinAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4149US2012258259A1Apparatus and method for uv treatment, chemical treatment, and depositionBANSAL AMIT·Filed 2012·Application pending·0 cites
- 4248US2011034034A1Dual temperature heaterAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4347US6489220B2Method and a system for sealing an epitaxial silicon layer on a substrateAPPLIED MATERIALS INC·Filed 2002·Granted Dec 3, 2002·1 cites·11 claims
- 4447US2006162661A1Mixing energized and non-energized gases for silicon nitride depositionAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 4547US2012009803A1Mixing Energized and Non-Energized Gases for Silicon Nitride DepositionJUNG KEE BUM·Filed 2011·Application pending·0 cites
- 4645US2016240410A1Substrate lift assembliesAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4743US10240234B2Gas distribution apparatus for processing chambersAPPLIED MATERIALS INC·Filed 2017·Granted Mar 26, 2019·0 cites·18 claims
- 4843US2007295012A1Nitrogen enriched cooling air module for uv curing systemAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4942US2006275933A1Thermally conductive ceramic tipped contact thermocoupleAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 5040US2005121145A1Thermal processing system with cross flow injection system with rotatable injectorsFiled 2004·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
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