Inventor · disambiguated record
Robert Kaim
Also filed as: KAIM ROBERT · KAIM ROBERT E
32 granted patents·12 pending applications·743 citations·filing 1987–2019
97Inventor score
Files withENTEGRIS INC14ADVANCED TECH MATERIALS12KAIM ROBERT5ADVANCED ION BEAM TECH INC2OLANDER W KARL2
Top patents by PatentIndex Score
44 records- 0198US4980562AMethod and apparatus for high efficiency scanning in an ion implanterVARIAN ASSOCIATES·Filed 1989·Granted Dec 25, 1990·123 cites·18 claims
- 0298US4922106AIon beam scanning method and apparatusVARIAN ASSOCIATES·Filed 1987·Granted May 1, 1990·162 cites·10 claims
- 0397US8062965B2Isotopically-enriched boron-containing compounds, and methods of making and using sameKAIM ROBERT·Filed 2011·Granted Nov 22, 2011·21 cites·20 claims
- 0495US8237134B2Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation systemKAIM ROBERT·Filed 2012·Granted Aug 7, 2012·23 cites·20 claims
- 0595US7966879B2Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vesselADVANCED TECH MATERIALS·Filed 2005·Granted Jun 28, 2011·25 cites·53 claims
- 0694US7943204B2Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantationADVANCED TECH MATERIALS·Filed 2006·Granted May 17, 2011·20 cites·18 claims
- 0793US8598022B2Isotopically-enriched boron-containing compounds, and methods of making and using sameKAIM ROBERT·Filed 2011·Granted Dec 3, 2013·12 cites·31 claims
- 0893US8399865B2Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation systemKAIM ROBERT·Filed 2012·Granted Mar 19, 2013·11 cites·29 claims
- 0992US8779383B2Enriched silicon precursor compositions and apparatus and processes for utilizing sameADVANCED TECH MATERIALS·Filed 2013·Granted Jul 15, 2014·13 cites·17 claims
- 1091US8796131B2Ion implantation system and methodJONES EDWARD E·Filed 2010·Granted Aug 5, 2014·18 cites·20 claims
- 1191US5595784ATitanium nitride and multilayers formed by chemical vapor deposition of titanium halidesFiled 1995·Granted Jan 21, 1997·133 cites·14 claims
- 1290US7057192B2Radial scan arm and collimator for serial processing of semiconductor wafers with ribbon beamsKAIM ROBERT E·Filed 2005·Granted Jun 6, 2006·26 cites·11 claims
- 1389US8389068B2Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantationOLANDER W KARL·Filed 2010·Granted Mar 5, 2013·8 cites·16 claims
- 1488US9111860B2Ion implantation system and methodADVANCED TECH MATERIALS·Filed 2014·Granted Aug 18, 2015·6 cites·21 claims
- 1588US8785889B2Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation systemADVANCED TECH MATERIALS·Filed 2013·Granted Jul 22, 2014·5 cites·54 claims
- 1688US8603252B2Cleaning of semiconductor processing systemsDIMEO FRANK·Filed 2007·Granted Dec 10, 2013·21 cites·6 claims
- 1788US8555705B2Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vesselDIETZ JAMES·Filed 2011·Granted Oct 15, 2013·8 cites·20 claims
- 1886US9170246B2Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vesselENTEGRIS INC·Filed 2013·Granted Oct 27, 2015·4 cites·17 claims
- 1986US5996528AMethod and apparatus for flowing gases into a manifold at high potentialNOVELLUS SYSTEMS INC·Filed 1996·Granted Dec 7, 1999·72 cites·5 claims
- 2083US9171725B2Enriched silicon precursor compositions and apparatus and processes for utilizing sameENTEGRIS INC·Filed 2014·Granted Oct 27, 2015·4 cites·20 claims
- 2183US9012874B2Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation systemENTEGRIS INC·Filed 2014·Granted Apr 21, 2015·3 cites·25 claims
- 2283US7819981B2Methods for cleaning ion implanter componentsADVANCED TECH MATERIALS·Filed 2004·Granted Oct 26, 2010·16 cites·39 claims
- 2382US9754786B2Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation systemENTEGRIS INC·Filed 2015·Granted Sep 5, 2017·2 cites·21 claims
- 2480US9142387B2Isotopically-enriched boron-containing compounds, and methods of making and using sameENTEGRIS INC·Filed 2013·Granted Sep 22, 2015·3 cites·11 claims
- 2576US8138071B2Isotopically-enriched boron-containing compounds, and methods of making and using sameKAIM ROBERT·Filed 2010·Granted Mar 20, 2012·3 cites·10 claims
- 2664US2020051819A1Carbon materials for carbon implantationENTEGRIS INC·Filed 2019·Application pending·0 cites
- 2762US9269528B2Medium current ribbon beam for ion implantationADVANCED ION BEAM TECH INC·Filed 2014·Granted Feb 23, 2016·1 cites·14 claims
- 2860US2017330756A1Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation systemENTEGRIS INC·Filed 2017·Application pending·0 cites
- 2959US10497569B2Carbon materials for carbon implantationENTEGRIS INC·Filed 2016·Granted Dec 3, 2019·0 cites·20 claims
- 3059US2011259366A1Ion source cleaning in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 3159US2016041136A1Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vesselENTEGRIS INC·Filed 2015·Application pending·0 cites
- 3258US9991095B2Ion source cleaning in semiconductor processing systemsSWEENEY JOSEPH D·Filed 2009·Granted Jun 5, 2018·0 cites·7 claims
- 3356US9455147B2Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantationENTEGRIS INC·Filed 2012·Granted Sep 27, 2016·0 cites·20 claims
- 3455US2013078790A1Carbon materials for carbon implantationADVANCED TECH MATERIALS·Filed 2012·Application pending·0 cites
- 3554US11062906B2Silicon implantation in substrates and provision of silicon precursor compositions thereforENTEGRIS INC·Filed 2014·Granted Jul 13, 2021·0 cites·7 claims
- 3654US9685304B2Isotopically-enriched boron-containing compounds, and methods of making and using sameENTEGRIS INC·Filed 2015·Granted Jun 20, 2017·0 cites·16 claims
- 3753US2009095713A1Novel methods for cleaning ion implanter componentsADVANCED TECH MATERIALS·Filed 2005·Application pending·0 cites
- 3851US2011021011A1Carbon materials for carbon implantationADVANCED TECH MATERIALS·Filed 2010·Application pending·0 cites
- 3950US2010112795A1Method of forming ultra-shallow junctions for semiconductor devicesADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 4050US2015357152A1Ion implantation system and methodENTEGRIS INC·Filed 2015·Application pending·0 cites
- 4149US2016046849A1Enriched silicon precursor compositions and apparatus and processes for utilizing sameENTEGRIS INC·Filed 2015·Application pending·0 cites
- 4244US9748072B2Lower dose rate ion implantation using a wider ion beamADVANCED ION BEAM TECH INC·Filed 2014·Granted Aug 29, 2017·0 cites·37 claims
- 4344US2008220596A1Delivery of Low Pressure Dopant Gas to a High Voltage Ion SourceADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 4438US2013251913A1Ion implanter system including remote dopant source, and method comprising sameOLANDER W KARL·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →