Carbon materials for carbon implantation

Abstract

A method of implanting carbon ions into a target substrate, including: ionizing a carbon containing dopant material to produce a plasma having ions; optionally co-flowing an additional gas or series of gases with the carbon-containing dopant material; and implanting the ions into the target substrate. The carbon-containing dopant material is of the formula CwFxOyHz wherein if w=1, then x>0 and y and z can take any value, and wherein if w>1 then x or y is >0, and z can take any value. Such method significantly improves the efficiency of an ion implanter tool, in relation to the use of carbon source gases such as carbon monoxide or carbon dioxide.

1 - 22 . (canceled) 
     
     
         23 . A gas composition comprising:
 a carbon-containing dopant material for implanting carbon ions into a substrate, wherein the carbon-containing dopant material is any one of CO, CO 2  or COF 2 ; and   at least one additional gas.   
     
     
         24 . The gas composition of  claim 23 , wherein the at least one additional gas comprises a gas selected from the group consisting of oxygen, oxygen-containing gas, fluorine-containing gas, COF 2 , CO 2 , CO, air, hydrogen, fluorine, nitrogen, argon, xenon, and helium. 
     
     
         25 . The gas composition of  claim 23 , wherein the carbon-containing dopant material comprises at least one of CO and CO 2 , and wherein the additional gas or series of gases comprises one or more of F 2 , COF 2 , and CF 4 . 
     
     
         26 . The gas composition of  claim 23 , wherein the carbon-containing dopant material comprises CO. 
     
     
         27 . The gas composition of  claim 23 , wherein the at least one additional gas comprises hydrogen. 
     
     
         28 . The gas composition of  claim 23 , wherein the at least one additional gas comprises xenon and hydrogen. 
     
     
         29 . The gas composition of  claim 23 , wherein the at least one additional gas comprises a fluorine-containing gas. 
     
     
         30 . The gas composition of  claim 23 , wherein the carbon-containing dopant material and the at least one additional gas form a gas composition comprising CO and H 2 . 
     
     
         31 . The gas composition of  claim 23 , wherein the carbon-containing dopant material and the at least one additional gas form a gas composition comprising CO and COF 2 . 
     
     
         32 . The gas composition of  claim 23 , wherein the carbon-containing dopant material and the at least one additional gas form a composition comprising CO, COF 2  and H 2 . 
     
     
         33 . The gas composition of  claim 23 , wherein the carbon containing dopant material and the at least one additional gas form a composition comprising CO and F 2 . 
     
     
         34 . The gas composition of  claim 23 , wherein the carbon-containing dopant material and the at least one additional gas form composition comprising CO and CF 4 . 
     
     
         35 . The gas composition of  claim 23 , wherein the carbon-containing dopant material and the at least one additional gas form composition comprising CO, CF 4  and H 2 . 
     
     
         36 . The gas composition of  claim 23 , wherein the carbon containing dopant material and the at least one additional gas are co-flowed to form the gas composition.