Inventor · disambiguated record
Takashi Yokogawa
Also filed as: YOKOGAWA TAKASHI
12 granted patents·9 pending applications·49 citations·filing 2005–2025
89Inventor score
Files withHITACHI INT ELECTRIC INC8KAGA YUKINAO3KOKUSAI ELECTRIC CORP2SAITO TATSUYUKI2SAKAI MASANORI2
Top patents by PatentIndex Score
21 records- 0191US8808455B2Substrate processing apparatus and method of manufacturing semiconductor deviceSAITO TATSUYUKI·Filed 2011·Granted Aug 19, 2014·14 cites·8 claims
- 0289US8652258B2Substrate treatment deviceYOKOGAWA TAKASHI·Filed 2011·Granted Feb 18, 2014·9 cites·4 claims
- 0387US9340873B2Semiconductor device manufacturing method and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted May 17, 2016·4 cites·16 claims
- 0482US9472398B2Method of manufacturing semiconductor device and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted Oct 18, 2016·3 cites·6 claims
- 0579US9238257B2Method of manufacturing semiconductor device, cleaning method, and substrate processing apparatusSAKAI MASANORI·Filed 2010·Granted Jan 19, 2016·4 cites·17 claims
- 0678US8691708B2Method of manufacturing semiconductor device and substrate processing apparatusKAGA YUKINAO·Filed 2011·Granted Apr 8, 2014·4 cites·9 claims
- 0775US9045825B2Method of forming metal-containing filmKAGA YUKINAO·Filed 2012·Granted Jun 2, 2015·3 cites·6 claims
- 0870US8123858B2Manufacturing method of semiconductor device and substrate processing apparatusWANG JIE·Filed 2007·Granted Feb 28, 2012·3 cites·11 claims
- 0967US8466049B2Semiconductor device producing method with selective epitaxial growthINOKUCHI YASUHIRO·Filed 2006·Granted Jun 18, 2013·4 cites·11 claims
- 1064US9466477B2Method of manufacturing semiconductor device, substrate processing apparatus, and semiconductor deviceSAITO TATSUYUKI·Filed 2010·Granted Oct 11, 2016·1 cites·8 claims
- 1162US2008135516A1Substrate treatment deviceHITACHI INT ELECTRIC INC·Filed 2007·Application pending·0 cites
- 1262US2025011931A1Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 1355US9416446B2Semiconductor device manufacturing method and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted Aug 16, 2016·0 cites·14 claims
- 1455US2025215563A1Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 1552US2014162454A1Method of manufacturing semiconductor device and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2014·Application pending·0 cites
- 1652US2013095668A1Semiconductor device manufacturing method and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2012·Application pending·0 cites
- 1751US9650715B2Method of forming metal-containing filmHITACHI INT ELECTRIC INC·Filed 2015·Granted May 16, 2017·0 cites·6 claims
- 1847US2011290182A1Method of manufacturing semiconductor device, cleaning method, and substrate processing apparatusSAKAI MASANORI·Filed 2011·Application pending·0 cites
- 1944US2009023139A1Method For Site-Specifically Introducing Non-Natural Amino Acid Into Protien Using Mitochondrial Protein and Method For Effectively Preparing TrnaNISHIKAWA KAZUYA·Filed 2005·Application pending·0 cites
- 2042US2014080317A1Mehod of manufacturing a semiconductor device and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2013·Application pending·0 cites
- 2136US2012108077A1Substrate processing apparatus and semiconductor device manufacturing methodKAGA YUKINAO·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →