Inventor · disambiguated record
David J. Kubista
Also filed as: KUBISTA DAVID · KUBISTA DAVID J
16 granted patents·5 pending applications·1,360 citations·filing 1993–2013
95Inventor score
Top patents by PatentIndex Score
21 records- 0199US7422635B2Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2003·Granted Sep 9, 2008·483 cites·17 claims
- 0298US6461436B1Apparatus and process of improving atomic layer deposition chamber performanceMICRON TECHNOLOGY INC·Filed 2001·Granted Oct 8, 2002·579 cites·33 claims
- 0392US7647886B2Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambersMICRON TECHNOLOGY INC·Filed 2003·Granted Jan 19, 2010·45 cites·8 claims
- 0490US6758911B2Apparatus and process of improving atomic layer deposition chamber performanceMICRON TECHNOLOGY INC·Filed 2002·Granted Jul 6, 2004·32 cites·13 claims
- 0590US6458714B1Method of selective oxidation in semiconductor manufactureMICRON TECHNOLOGY INC·Filed 2000·Granted Oct 1, 2002·53 cites·53 claims
- 0686US7771537B2Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD depositionMICRON TECHNOLOGY INC·Filed 2006·Granted Aug 10, 2010·5 cites·13 claims
- 0786US7279398B2Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2006·Granted Oct 9, 2007·6 cites·12 claims
- 0886US6716284B2Apparatus and process of improving atomic layer deposition chamber performanceMICRON TECHNOLOGY INC·Filed 2002·Granted Apr 6, 2004·24 cites·25 claims
- 0986US5409587ASputtering with collinator cleaning within the sputtering chamberMICRON TECHNOLOGY INC·Filed 1993·Granted Apr 25, 1995·63 cites·6 claims
- 1085US7056806B2Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2003·Granted Jun 6, 2006·23 cites·31 claims
- 1179US7258892B2Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD depositionMICRON TECHNOLOGY INC·Filed 2003·Granted Aug 21, 2007·13 cites·27 claims
- 1278US7235138B2Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2003·Granted Jun 26, 2007·14 cites·20 claims
- 1374US8384192B2Methods for forming small-scale capacitor structuresMICRON TECHNOLOGY INC·Filed 2011·Granted Feb 26, 2013·2 cites·22 claims
- 1471US7344755B2Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambersMICRON TECHNOLOGY INC·Filed 2003·Granted Mar 18, 2008·10 cites·12 claims
- 1567US7906393B2Methods for forming small-scale capacitor structuresMICRON TECHNOLOGY INC·Filed 2004·Granted Mar 15, 2011·8 cites·44 claims
- 1661US2006205187A1Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 1761US2006213440A1Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 1859US2006198955A1Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 1956US8518184B2Methods and systems for controlling temperature during microfeature workpiece processing, E.G., CVD depositionBEAMAN KEVIN L·Filed 2010·Granted Aug 27, 2013·0 cites·22 claims
- 2053US2013166057A1Methods for forming small-scale capacitor structuresMICRON TECHNOLOGY INC·Filed 2013·Application pending·0 cites
- 2146US2006196538A1Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambersMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
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