Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
Abstract
The present disclosure suggests several systems and methods for batch processing of microfeature workpieces, e.g., semiconductor wafers or the like. One exemplary implementation provides a method of depositing a reaction product on each of a batch of workpieces positioned in a process chamber in a spaced-apart relationship. A first gas may be delivered to an elongate first delivery conduit that includes a plurality of outlets spaced along a length of the conduit. A first gas flow may be directed by the outlets to flow into at least one of the process spaces between adjacent workpieces along a first vector that is transverse to the direction in which the workpieces are spaced. A second gas may be delivered to an elongate second delivery conduit that also has outlets spaced along its length. A second gas flow of the second gas may be directed by the outlets to flow into the process spaces along a second vector that is transverse to the first direction.
Claims
exact text as granted — not AI-modified1 - 29 . (canceled)
30 . A method of depositing a reaction product on each of a batch of microfeature workpieces, comprising:
positioning a plurality of microfeature workpieces in a process chamber, the microfeature workpieces being spaced from one another in a first direction to define a process space between pairs of adjacent workpieces; delivering a first gas to an elongate first delivery conduit that has a length in the first direction and directing a first gas flow of the first gas into at least one of the process spaces from a plurality of outlets spaced in the first direction along the length of the first delivery conduit, the individual first gas flows being directed to flow along a first vector transverse to the first direction; and after terminating the first gas flow, delivering a second gas to an elongate second delivery conduit that has a length in the first direction and directing a second gas flow of the second gas into at least one of the process spaces from a plurality of outlets spaced in the first direction along the length of the second delivery conduit, the individual second gas flows being directed to flow along a second vector transverse to the first direction.
31 . The method of claim 30 wherein the first vectors are transverse to the second vectors.
32 . The method of claim 30 wherein the first vectors are substantially parallel to one another.
33 . The method of claim 30 wherein the second vectors are substantially parallel to one another.
34 . The method of claim 30 wherein each of the first vectors and the second vectors are directed inwardly toward a center of one of the microfeature workpieces.
35 . The method of claim 30 wherein the first gas comprises a first reaction precursor and the second gas comprises a purge gas that is different from the first reaction precursor.
36 . The method of claim 30 wherein the first gas comprises a first reaction precursor and the second gas comprises a second reaction precursor that is adapted to react with the first reaction precursor to form the reaction product.
37 . (canceled)
38 . The method of claim 30 further comprising:
terminating the first gas flow; exhausting the first gas from the process chamber; and, thereafter, initiating the second gas flow.
39 . The method of claim 30 further comprising:
terminating the first gas flow; delivering a purge gas to the process chamber and exhausting the purge gas from the process chamber; and, thereafter, initiating the second gas flow.
40 . The method of claim 30 further comprising directing a third gas flow of the first gas along a third vector that extends in the first direction.
41 . The method of claim 30 further comprising delivering a third gas flow of the first gas to the process chamber while directing the first gas flows, the third gas flow being directed to flow along a third vector that extends in the first direction and is transverse to the first gas flow.
42 . The method of claim 41 further comprising delivering a fourth gas flow of the second gas to the process chamber while directing the second gas flows, the fourth gas flow being directed to flow along a fourth vector that extends in the first direction and is transverse to the second gas flow.
43 . A method of depositing a reaction product on each of a batch of microfeature workpieces, comprising:
positioning a plurality of microfeature workpieces in a process chamber, the microfeature workpieces being spaced from one another in a first direction to define a process space between pairs of adjacent workpieces; delivering a first gas to an elongate first delivery conduit that has a length in the first direction and directing a first gas flow of the first gas into at least one of the process spaces from a plurality of first outlets that are spaced in the first direction along the length of the first delivery conduit, the individual first gas flows being directed transverse to the first direction; and delivering a second gas to a second delivery conduit and directing a second gas flow of the second gas from a second outlet in the first direction with the second outlet positioned at the process chamber.
44 . The method of claim 43 wherein the first gas comprises a first reaction precursor and the second gas comprises a purge gas that is different from the first reaction precursor.
45 . The method of claim 43 wherein the first gas comprises a first reaction precursor and the second gas comprises a second reaction precursor that is configured to react with the first reaction precursor to form the reaction product.
46 . The method of claim 43 , further comprising terminating the first gas flow before initiating the second gas flow.
47 . The method of claim 43 , further comprising:
terminating the first gas flow; exhausting the first gas from the process chamber; and, thereafter, initiating the second gas flow.
48 . The method of claim 43 , further comprising:
terminating the first gas flow; delivering a purge gas to the process chamber and exhausting the purge gas from the process chamber; and, thereafter, initiating the second gas flow.
49 . The method of claim 43 wherein directing the first gas flow occurs while directing the second gas flow.
50 . The method of claim 43 , further comprising delivering a third gas to an elongate second delivery conduit that has a length in the first direction and directing a third gas flow of the third gas into at least one of the process spaces from a plurality of outlets spaced in the first direction along the length of the second delivery conduit, the individual third gas flows being directed to flow along a second vector transverse to the first direction.Join the waitlist — get patent alerts
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