Inventor · disambiguated record
Dustin W. Ho
Also filed as: HO DUSTIN · HO DUSTIN W · HO DUSTIN WENPIN
14 granted patents·13 pending applications·1,634 citations·filing 2000–2018
94Inventor score
Top patents by PatentIndex Score
27 records- 0198US7566891B2Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectorsAPPLIED MATERIALS INC·Filed 2007·Granted Jul 28, 2009·553 cites·33 claims
- 0297US8338809B2Ultraviolet reflector with coolant gas holes and methodYANG YAO-HUNG·Filed 2011·Granted Dec 25, 2012·408 cites·23 claims
- 0397US7692171B2Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectorsKASZUBA ANDRZEI·Filed 2007·Granted Apr 6, 2010·471 cites·26 claims
- 0496US7663121B2High efficiency UV curing systemAPPLIED MATERIALS INC·Filed 2006·Granted Feb 16, 2010·38 cites·12 claims
- 0595US7777198B2Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiationAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·29 cites·30 claims
- 0693US8203126B2Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiationROCHA-ALVAREZ JUAN CARLOS·Filed 2010·Granted Jun 19, 2012·26 cites·15 claims
- 0791US6576044B1Process for the purification of nitric oxideBOC GROUP INC·Filed 2000·Granted Jun 10, 2003·61 cites·30 claims
- 0887US7964858B2Ultraviolet reflector with coolant gas holes and methodAPPLIED MATERIALS INC·Filed 2008·Granted Jun 21, 2011·21 cites·44 claims
- 0986US7410916B2Method of improving initiation layer for low-k dielectric film by digital liquid flow meterAPPLIED MATERIALS INC·Filed 2006·Granted Aug 12, 2008·9 cites·18 claims
- 1085US7501354B2Formation of low K material utilizing process having readily cleaned by-productsAPPLIED MATERIALS INC·Filed 2005·Granted Mar 10, 2009·6 cites·10 claims
- 1182US7611996B2Multi-stage curing of low K nano-porous filmsAPPLIED MATERIALS INC·Filed 2005·Granted Nov 3, 2009·10 cites·7 claims
- 1269US7947611B2Method of improving initiation layer for low-k dielectric film by digital liquid flow meterAPPLIED MATERIALS INC·Filed 2008·Granted May 24, 2011·2 cites·10 claims
- 1359US8382885B2Fluid filtration for substrate processing chamberAPPLIED MATERIALS INC·Filed 2010·Granted Feb 26, 2013·0 cites·18 claims
- 1457US2013012030A1Method and apparatus for remote plasma source assisted silicon-containing film depositionAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1557US2009162259A1High efficiency uv curing systemNOWAK THOMAS·Filed 2009·Application pending·0 cites
- 1654US2007298167A1Ozone abatement in a re-circulating cooling systemAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1752US2008099920A1Multi-stage curing of low k nano-porous filmsAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1850US2006249175A1High efficiency UV curing systemAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1950US2006251827A1Tandem uv chamber for curing dielectric materialsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2050US2006270221A1Heated gas feedthrough for cvd chambersAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2146US2016376710A1Method and apparatus to abate pyrophoric byproducts from ion implant processAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 2244US2009305515A1Method and apparatus for uv curing with water vaporHO DUSTIN·Filed 2008·Application pending·0 cites
- 2343US2007295012A1Nitrogen enriched cooling air module for uv curing systemAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2440US11114285B2Apparatus for exhaust coolingAPPLIED MATERIALS INC·Filed 2017·Granted Sep 7, 2021·0 cites·20 claims
- 2537US2016089630A1Vacuum foreline reagent addition for fluorine abatementAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 2635US2018221816A1Plasma abatement of nitrous oxide from semiconductor process effluentsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2735US2012171852A1Remote hydrogen plasma source of silicon containing film depositionYUAN ZHENG·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →