Inventor · disambiguated record
Katherina Babich
Also filed as: BABICH KATHERINA · BABICH KATHERINA E
46 granted patents·9 pending applications·1,052 citations·filing 1997–2020
98Inventor score
Top patents by PatentIndex Score
55 records- 0198US6316167B1Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereofIBM·Filed 2000·Granted Nov 13, 2001·189 cites·50 claims
- 0297US6514667B2Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereofIBM·Filed 2001·Granted Feb 4, 2003·108 cites·21 claims
- 0396US6730454B2Antireflective SiO-containing compositions for hardmask layerIBM·Filed 2002·Granted May 4, 2004·112 cites·11 claims
- 0495US6815329B2Multilayer interconnect structure containing air gaps and method for makingIBM·Filed 2002·Granted Nov 9, 2004·105 cites·13 claims
- 0595US6686124B1Multifunctional polymeric materials and use thereofIBM·Filed 2000·Granted Feb 3, 2004·67 cites·31 claims
- 0691US8497212B2Filling narrow openings using ion beam etchBABICH KATHERINA E·Filed 2011·Granted Jul 30, 2013·15 cites·24 claims
- 0791US6428894B1Tunable and removable plasma deposited antireflective coatingsIBM·Filed 1997·Granted Aug 6, 2002·146 cites·27 claims
- 0888US7098476B2Multilayer interconnect structure containing air gaps and method for makingIBM·Filed 2004·Granted Aug 29, 2006·39 cites·4 claims
- 0986US7709177B2Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereofIBM·Filed 2007·Granted May 4, 2010·7 cites·18 claims
- 1083US7648820B2Antireflective hardmask and uses thereofIBM·Filed 2006·Granted Jan 19, 2010·7 cites·11 claims
- 1183US6759321B2Stabilization of fluorine-containing low-k dielectrics in a metal/insulator wiring structure by ultraviolet irradiationIBM·Filed 2002·Granted Jul 6, 2004·24 cites·9 claims
- 1281US7326442B2Antireflective composition and process of making a lithographic structureIBM·Filed 2005·Granted Feb 5, 2008·11 cites·24 claims
- 1380US6448655B1Stabilization of fluorine-containing low-k dielectrics in a metal/insulator wiring structure by ultraviolet irradiationIBM·Filed 1998·Granted Sep 10, 2002·50 cites·9 claims
- 1478US7545041B2Techniques for patterning features in semiconductor devicesIBM·Filed 2006·Granted Jun 9, 2009·4 cites·1 claims
- 1577US7030008B2Techniques for patterning features in semiconductor devicesIBM·Filed 2003·Granted Apr 18, 2006·14 cites·26 claims
- 1675US6653027B2Attenuated embedded phase shift photomask blanksIBM·Filed 2001·Granted Nov 25, 2003·12 cites·41 claims
- 1774US7651947B2Mask forming and implanting methods using implant stopping layer and mask so formedIBM·Filed 2006·Granted Jan 26, 2010·4 cites·17 claims
- 1873US8293454B2Process of making a lithographic structure using antireflective materialsANGELOPOULOS MARIE·Filed 2008·Granted Oct 23, 2012·2 cites·25 claims
- 1973US7223517B2Lithographic antireflective hardmask compositions and uses thereofIBM·Filed 2003·Granted May 29, 2007·14 cites·29 claims
- 2070US8895352B2Method to improve nucleation of materials on graphene and carbon nanotubesBABICH KATHERINA·Filed 2009·Granted Nov 25, 2014·3 cites·20 claims
- 2170US8816333B2Method to improve nucleation of materials on graphene and carbon nanotubesBABICH KATHERINA·Filed 2012·Granted Aug 26, 2014·2 cites·16 claims
- 2270US7175966B2Water and aqueous base soluble antireflective coating/hardmask materialsIBM·Filed 2003·Granted Feb 13, 2007·9 cites·40 claims
- 2369US7172849B2Antireflective hardmask and uses thereofIBM·Filed 2003·Granted Feb 6, 2007·10 cites·22 claims
- 2469US6730445B2Attenuated embedded phase shift photomask blanksIBM·Filed 2002·Granted May 4, 2004·8 cites·21 claims
- 2568US10580684B2Self-aligned single diffusion break for fully depleted silicon-on-insulator and method for producing the sameGLOBALFOUNDRIES INC·Filed 2018·Granted Mar 3, 2020·1 cites·7 claims
- 2667US6251569B1Forming a pattern of a negative photoresistIBM·Filed 1999·Granted Jun 26, 2001·23 cites·25 claims
- 2766US7497959B2Methods and structures for protecting one area while processing another area on a chipIBM·Filed 2004·Granted Mar 3, 2009·7 cites·10 claims
- 2866US7077903B2Etch selectivity enhancement for tunable etch resistant anti-reflective layerIBM·Filed 2003·Granted Jul 18, 2006·9 cites·20 claims
- 2964US8754530B2Self-aligned borderless contacts for high density electronic and memory device integrationBABICH KATHERINA E·Filed 2008·Granted Jun 17, 2014·3 cites·7 claims
- 3064US7485573B2Process of making a semiconductor device using multiple antireflective materialsIBM·Filed 2006·Granted Feb 3, 2009·1 cites·1 claims
- 3164US6858357B2Attenuated embedded phase shift photomask blanksIBM·Filed 2003·Granted Feb 22, 2005·5 cites·47 claims
- 3264US6682860B2Attenuated embedded phase shift photomask blanksIBM·Filed 2002·Granted Jan 27, 2004·7 cites·23 claims
- 3360US7611758B2Method of improving post-develop photoresist profile on a deposited dielectric filmTOKYO ELECTRON LTD·Filed 2003·Granted Nov 3, 2009·4 cites·18 claims
- 3460US6617086B2Forming a pattern of a negative photoresistIBM·Filed 2001·Granted Sep 9, 2003·5 cites·21 claims
- 3558US9472402B2Methods and structures for protecting one area while processing another area on a chipGLOBALFOUNDRIES INC·Filed 2014·Granted Oct 18, 2016·0 cites·7 claims
- 3658US8609322B2Process of making a lithographic structure using antireflective materialsANGELOPOULOS MARIE·Filed 2012·Granted Dec 17, 2013·0 cites·17 claims
- 3758US7361444B1Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereofIBM·Filed 1999·Granted Apr 22, 2008·22 cites·6 claims
- 3857US9059000B2Methods and structures for protecting one area while processing another area on a chipKIM DEOK-KEE·Filed 2008·Granted Jun 16, 2015·0 cites·17 claims
- 3957US7790593B2Method for tuning epitaxial growth by interfacial doping and structure including sameIBM·Filed 2007·Granted Sep 7, 2010·0 cites·20 claims
- 4056US2008187731A1Techniques for Patterning Features in Semiconductor DevicesIBM·Filed 2008·Application pending·0 cites
- 4155US2008093640A1Method for tuning epitaxial growth by interfacial doping and structure including sameIBM·Filed 2007·Application pending·0 cites
- 4254US7998871B2Mask forming and implanting methods using implant stopping layerIBM·Filed 2008·Granted Aug 16, 2011·0 cites·11 claims
- 4353US7736833B2Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereofIBM·Filed 2007·Granted Jun 15, 2010·3 cites·17 claims
- 4453US7329596B2Method for tuning epitaxial growth by interfacial doping and structure including sameIBM·Filed 2005·Granted Feb 12, 2008·0 cites·14 claims
- 4550US2010038715A1Thin body silicon-on-insulator transistor with borderless self-aligned contactsIBM·Filed 2008·Application pending·0 cites
- 4649US11094805B2Lateral heterojunction bipolar transistors with asymmetric junctionsGLOBALFOUNDRIES US INC·Filed 2020·Granted Aug 17, 2021·0 cites·20 claims
- 4749US6979518B2Attenuated embedded phase shift photomask blanksIBM·Filed 2003·Granted Dec 27, 2005·0 cites·21 claims
- 4848US9099537B2Selective nanotube growth inside vias using an ion beamBABICH KATHERINA E·Filed 2009·Granted Aug 4, 2015·0 cites·20 claims
- 4947US2007015082A1Process of making a lithographic structure using antireflective materialsIBM·Filed 2005·Application pending·0 cites
- 5046US2012299101A1Thin body silicon-on-insulator transistor with borderless self-aligned contactsBABICH KATHERINA E·Filed 2012·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →