Inventor · disambiguated record
Riichiro Takahashi
Also filed as: TAKAHASHI RIICHIRO
11 granted patents·5 pending applications·73 citations·filing 2002–2009
90Inventor score
Top patents by PatentIndex Score
16 records- 0186US7727853B2Processing method, manufacturing method of semiconductor device, and processing apparatusTOSHIBA KK·Filed 2008·Granted Jun 1, 2010·10 cites·6 claims
- 0275US6742944B2Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2002·Granted Jun 1, 2004·13 cites·12 claims
- 0374US7399578B2Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2006·Granted Jul 15, 2008·3 cites·5 claims
- 0474US7018481B2Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzleTOSHIBA KK·Filed 2003·Granted Mar 28, 2006·13 cites·12 claims
- 0569US7288466B2Processing method, manufacturing method of semiconductor device, and processing apparatusTOSHIBA KK·Filed 2003·Granted Oct 30, 2007·11 cites·22 claims
- 0662US6842281B2Observation device, ultraviolet microscope and observation methodNIKON CORP·Filed 2002·Granted Jan 11, 2005·8 cites·20 claims
- 0762US6709531B2Chemical liquid processing apparatus for processing a substrate and the method thereofTOSHIBA KK·Filed 2003·Granted Mar 23, 2004·6 cites·11 claims
- 0858US2010104988A1Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzleTOSHIBA KK·Filed 2009·Application pending·0 cites
- 0957US7669608B2Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzleTOSHIBA KK·Filed 2004·Granted Mar 2, 2010·4 cites·12 claims
- 1052US2008035851A1Processing method, manufacturing method of semiconductor device, and processing apparatusTOSHIBA KK·Filed 2007·Application pending·0 cites
- 1152US2008050677A1Processing method, manufacturing method of semiconductor device, and processing apparatusTOSHIBA KK·Filed 2007·Application pending·0 cites
- 1251US2006151015A1Chemical liquid processing apparatus for processing a substrate and the method thereofTOSHIBA KK·Filed 2006·Application pending·0 cites
- 1350US7067033B2Chemical liquid processing apparatus for processing a substrateTOSHIBA KK·Filed 2004·Granted Jun 27, 2006·2 cites·7 claims
- 1449US6818387B2Method of forming a patternTOSHIBA KK·Filed 2002·Granted Nov 16, 2004·2 cites·15 claims
- 1548US7097960B2Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2004·Granted Aug 29, 2006·1 cites·6 claims
- 1637US2003219660A1Pattern forming methodFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →