Inventor · disambiguated record
Thomas Ritzdorf
Also filed as: RITZDORF THOMAS · RITZDORF THOMAS L · RITZDORF THOMAS LEE
38 granted patents·32 pending applications·1,514 citations·filing 1997–2014
98Inventor score
Top patents by PatentIndex Score
70 records- 0199US6565729B2Method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2000·Granted May 20, 2003·435 cites·59 claims
- 0298US6428673B1Apparatus and method for electrochemical processing of a microelectronic workpiece, capable of modifying processing based on metrologySEMITOOL INC·Filed 2000·Granted Aug 6, 2002·102 cites·17 claims
- 0394US7332066B2Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2005·Granted Feb 19, 2008·19 cites·38 claims
- 0493US6334937B1Apparatus for high deposition rate solder electroplating on a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Jan 1, 2002·104 cites·18 claims
- 0592US6270647B1Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operationsSEMITOOL INC·Filed 1999·Granted Aug 7, 2001·134 cites·15 claims
- 0692US6099712ASemiconductor plating bowl and method using anode shieldSEMITOOL INC·Filed 1997·Granted Aug 8, 2000·83 cites·11 claims
- 0791US7160421B2Turning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Jan 9, 2007·24 cites·32 claims
- 0891US6551479B1Apparatus for controlling and/or measuring additive concentration in an electroplating bathSEMITOOL INC·Filed 2000·Granted Apr 22, 2003·46 cites·16 claims
- 0990US6508920B1Apparatus for low-temperature annealing of metallization microstructures in the production of a microelectronic deviceSEMITOOL INC·Filed 1999·Granted Jan 21, 2003·88 cites·53 claims
- 1089US7189318B2Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Mar 13, 2007·16 cites·22 claims
- 1189US6592736B2Methods and apparatus for controlling an amount of a chemical constituent of an electrochemical bathSEMITOOL INC·Filed 2002·Granted Jul 15, 2003·46 cites·57 claims
- 1287US6921468B2Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operationsSEMITOOL INC·Filed 2001·Granted Jul 26, 2005·40 cites·8 claims
- 1386US6921467B2Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpiecesSEMITOOL INC·Filed 2001·Granted Jul 26, 2005·37 cites·44 claims
- 1484US6365033B1Methods for controlling and/or measuring additive concentration in an electroplating bathSEMITOOF INC·Filed 1999·Granted Apr 2, 2002·63 cites·68 claims
- 1582US6806186B2Submicron metallization using electrochemical depositionSEMITOOL INC·Filed 2001·Granted Oct 19, 2004·21 cites·22 claims
- 1680US7438788B2Apparatus and methods for electrochemical processing of microelectronic workpiecesSEMITOOL INC·Filed 2005·Granted Oct 21, 2008·2 cites·14 claims
- 1780US6747734B1Apparatus and method for processing a microelectronic workpiece using metrologySEMITOOL INC·Filed 2000·Granted Jun 8, 2004·21 cites·48 claims
- 1878US9326489B2Training devices for domestic animalsRITZDORF THOMAS LEE·Filed 2014·Granted May 3, 2016·6 cites·9 claims
- 1978US7300562B2Platinum alloy using electrochemical depositionSEMITOOL INC·Filed 2003·Granted Nov 27, 2007·9 cites·8 claims
- 2078US7102763B2Methods and apparatus for processing microelectronic workpieces using metrologySEMITOOL INC·Filed 2001·Granted Sep 5, 2006·22 cites·69 claims
- 2177US6599412B1In-situ cleaning processes for semiconductor electroplating electrodesSEMITOOL INC·Filed 1997·Granted Jul 29, 2003·42 cites·9 claims
- 2276US6753251B2Method for filling recessed micro-structures with metallization in the production of a microelectronic deviceSEMITOOL INC·Filed 2002·Granted Jun 22, 2004·14 cites·43 claims
- 2375US7264698B2Apparatus and methods for electrochemical processing of microelectronic workpiecesSEMITOOL INC·Filed 2001·Granted Sep 4, 2007·11 cites·26 claims
- 2473US7229543B2Apparatus for controlling and/or measuring additive concentration in an electroplating bathSEMITOOL INC·Filed 2003·Granted Jun 12, 2007·8 cites·32 claims
- 2573US7115196B2Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2003·Granted Oct 3, 2006·11 cites·12 claims
- 2671US7161689B2Apparatus and method for processing a microelectronic workpiece using metrologySEMITOOL INC·Filed 2003·Granted Jan 9, 2007·12 cites·17 claims
- 2771US7020537B2Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Mar 28, 2006·12 cites·11 claims
- 2867US9234293B2Electrolytic copper process using anion permeable barrierAPPLIED MATERIALS INC·Filed 2014·Granted Jan 12, 2016·1 cites·12 claims
- 2967US7144805B2Method of submicron metallization using electrochemical deposition of recesses including a first deposition at a first current density and a second deposition at an increased current densitySEMITOOL INC·Filed 2004·Granted Dec 5, 2006·8 cites·29 claims
- 3067US2007089991A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2006·Application pending·0 cites
- 3166US2007221502A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2007·Application pending·0 cites
- 3263US6936153B1Semiconductor plating system workpiece support having workpiece-engaging electrode with pre-conditioned contact faceSEMITOOL INC·Filed 1997·Granted Aug 30, 2005·24 cites·13 claims
- 3363US2005167273A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceFiled 2005·Application pending·0 cites
- 3463US2005167274A1Tuning electrodes used in a reactor for electrochemically processing a microelectronics workpieceFiled 2005·Application pending·0 cites
- 3562US7244677B2Method for filling recessed micro-structures with metallization in the production of a microelectronic deviceSEMITOOL INC·Filed 1998·Granted Jul 17, 2007·16 cites·30 claims
- 3662US6776892B1Semiconductor plating system workpiece support having workpiece engaging electrode with pre-conditioned contact faceSEMITOOL INC·Filed 2000·Granted Aug 17, 2004·7 cites·4 claims
- 3759US7462269B2Method for low temperature annealing of metallization micro-structures in the production of a microelectronic deviceSEMITOOL INC·Filed 2001·Granted Dec 9, 2008·5 cites·33 claims
- 3859USRE38931EMethods for controlling and/or measuring additive concentration in an electroplating bathSEMITOOL INC·Filed 2003·Granted Jan 10, 2006·3 cites·68 claims
- 3958US6669834B2Method for high deposition rate solder electroplating on a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Dec 30, 2003·2 cites·52 claims
- 4058US2005189227A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceFiled 2005·Application pending·0 cites
- 4156US6454926B1Semiconductor plating system workpiece support having workpiece-engaging electrode with submerged conductive current transfer areasSEMITOOL INC·Filed 1997·Granted Sep 24, 2002·10 cites·44 claims
- 4256US2004188259A1Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpieceFiled 2004·Application pending·0 cites
- 4355US2005000818A1Method, chemistry, and apparatus for noble metal electroplating on a microelectronic workpieceSEMITOOL INC·Filed 2004·Application pending·0 cites
- 4454US2010116671A1Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2006·Application pending·0 cites
- 4553US6994776B2Method and apparatus for low temperature annealing of metallization micro-structure in the production of a microelectronic deviceSEMITOOL INC·Filed 2001·Granted Feb 7, 2006·5 cites·6 claims
- 4652US2007114133A1Method for filling recessed micro-structures with metallization in the production of a microelectronic deviceSEMITOOL INC·Filed 2006·Application pending·0 cites
- 4752US2007215481A1In-situ cleaning processes for semiconductor electroplating electrodesGRAHAM LYNDON W·Filed 2007·Application pending·0 cites
- 4851US2005205409A1Apparatus and methods for electrochemical processing of microelectronic workpiecesHANSON KYLE M·Filed 2005·Application pending·0 cites
- 4951US2008217165A9Apparatus and methods for electrochemical processing of microelectronic workpiecesHANSON KYLE M·Filed 2005·Application pending·0 cites
- 5051US2006208272A1Method for filling recessed micro-structures with metallization in the production of a microelectronic deviceSEMITOOL INC·Filed 2006·Application pending·0 cites
Showing the top 50 of 70 patent records by PatentIndex Score.
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