Inventor · disambiguated record
Martin A. Hilkene
Also filed as: HILKENE MARTIN · HILKENE MARTIN A
28 granted patents·21 pending applications·47 citations·filing 2007–2024
94Inventor score
Files withAPPLIED MATERIALS INC39SANTHANAM KARTIK3HILKENE MARTIN A2BENCHER CHRISTOPHER D1GOUK ROMAN1
Top patents by PatentIndex Score
49 records- 0192US9390930B2Surface stabilization process to reduce dopant diffusionAPPLIED MATERIALS INC·Filed 2012·Granted Jul 12, 2016·14 cites·25 claims
- 0290US11735447B2Enhanced process and hardware architecture to detect and correct realtime product substratesAPPLIED MATERIALS INC·Filed 2020·Granted Aug 22, 2023·2 cites·20 claims
- 0385US8354035B2Method for removing implanted photo resist from hard disk drive substratesAPPLIED MATERIALS INC·Filed 2010·Granted Jan 15, 2013·4 cites·19 claims
- 0483US11171023B2Diode laser for wafer heating for EPI processesAPPLIED MATERIALS INC·Filed 2016·Granted Nov 9, 2021·4 cites·20 claims
- 0581US11860973B2Method and system for foreline deposition diagnostics and controlAPPLIED MATERIALS INC·Filed 2020·Granted Jan 2, 2024·1 cites·20 claims
- 0680US8586952B2Temperature control of a substrate during a plasma ion implantation process for patterned disc media applicationsHILKENE MARTIN A·Filed 2010·Granted Nov 19, 2013·5 cites·17 claims
- 0779US9852902B2Material deposition for high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2014·Granted Dec 26, 2017·3 cites·14 claims
- 0875US7659184B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2008·Granted Feb 9, 2010·3 cites·13 claims
- 0973US2024318351A1Multi-thermal cvd chambers with shared gas delivery and exhaust systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1071US8673162B2Methods for substrate surface planarization during magnetic patterning by plasma immersion ion implantationGOUK ROMAN·Filed 2010·Granted Mar 18, 2014·3 cites·10 claims
- 1169US8658242B2Resist fortification for magnetic media patterningBENCHER CHRISTOPHER D·Filed 2011·Granted Feb 25, 2014·2 cites·16 claims
- 1269US7807984B2Ion implantersAPPLIED MATERIALS INC·Filed 2008·Granted Oct 5, 2010·2 cites·20 claims
- 1368US12072267B2Method and hardware for post maintenance vacuum recovery systemAPPLIED MATERIALS INC·Filed 2021·Granted Aug 27, 2024·0 cites·20 claims
- 1467US8003500B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2009·Granted Aug 23, 2011·1 cites·7 claims
- 1566US12422357B2Chamber moisture control using narrow optical filters measuring emission linesAPPLIED MATERIALS INC·Filed 2023·Granted Sep 23, 2025·0 cites·10 claims
- 1666US10233538B2Demagnetization of magnetic media by C doping for HDD patterned media applicationAPPLIED MATERIALS INC·Filed 2016·Granted Mar 19, 2019·0 cites·20 claims
- 1764US9376746B2Demagnetization of magnetic media by C doping for HDD patterned media applicationHILKENE MARTIN A·Filed 2012·Granted Jun 28, 2016·0 cites·9 claims
- 1864US7989329B2Removal of surface dopants from a substrateAPPLIED MATERIALS INC·Filed 2007·Granted Aug 2, 2011·1 cites·12 claims
- 1964US7872247B2Ion beam guide tubeAPPLIED MATERIALS INC·Filed 2007·Granted Jan 18, 2011·2 cites·13 claims
- 2063US12037701B2Multi-thermal CVD chambers with shared gas delivery and exhaust systemAPPLIED MATERIALS INC·Filed 2021·Granted Jul 16, 2024·0 cites·16 claims
- 2161US12449309B2Methods for detection using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2020·Granted Oct 21, 2025·0 cites·20 claims
- 2259US9646642B2Resist fortification for magnetic media patterningAPPLIED MATERIALS INC·Filed 2014·Granted May 9, 2017·0 cites·9 claims
- 2357US2024321564A1Indirect plasma health monitoringAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2456US10276369B2Material deposition for high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2017·Granted Apr 30, 2019·0 cites·8 claims
- 2555US2025062107A1Method and system for monitoring radical species flux of plasmaAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2653US11635338B2Rapid chamber vacuum leak check hardware and maintenance routineAPPLIED MATERIALS INC·Filed 2020·Granted Apr 25, 2023·0 cites·20 claims
- 2753US2025329560A1Automated machine learning waferless chamber conditioning process for thermal semiconductor process chambersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2852US10500614B2Temperature controlled remote plasma clean for exhaust deposit removalAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·0 cites·9 claims
- 2952US2023187169A1Method to measure radical ion flux using a modified pirani vacuum gauge architectureAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3051US2023178346A1Scanning radical sensor usable for model trainingAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3150US7968401B2Reducing photoresist layer degradation in plasma immersion ion implantationAPPLIED MATERIALS INC·Filed 2009·Granted Jun 28, 2011·0 cites·20 claims
- 3249US2017206922A1Resist fortification for magnetic media patterningAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 3349US2013017315A1Methods and apparatus for controlling power distribution in substrate processing systemsAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 3449US2023163001A1Method to eliminate first wafer effects on semiconductor process chambersAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3548US2013014894A1Methods and apparatus for controlling power distribution in substrate processing systemsAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 3647US2022093428A1Atomic oxygen detection in semiconductor processing chambersAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3746US2020373195A1Processing chamber for thermal processesAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3846US2022084842A1Antifragile systems for semiconductor processing equipment using multiple special sensors and algorithmsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3946US2011256691A1Removal of surface dopants from a substrateRAMASWAMY KARTIK·Filed 2011·Application pending·0 cites
- 4044US2014273461A1Carbon film hardmask stress reduction by hydrogen ion implantationAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4143US2014273524A1Plasma Doping Of Silicon-Containing FilmsNGUYEN VICTOR·Filed 2014·Application pending·0 cites
- 4242US9553174B2Conversion process utilized for manufacturing advanced 3D features for semiconductor device applicationsAPPLIED MATERIALS INC·Filed 2015·Granted Jan 24, 2017·0 cites·20 claims
- 4341US8492177B2Methods for quantitative measurement of a plasma immersion processYAO DAPING·Filed 2011·Granted Jul 23, 2013·0 cites·18 claims
- 4440US2013288469A1Methods and apparatus for implanting a dopant materialAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 4539US2011104393A1Plasma ion implantation process for patterned disc media applicationsAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4639US2011127156A1Chamber for processing hard disk drive substratesAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4737US8501605B2Methods and apparatus for conformal dopingSANTHANAM KARTIK·Filed 2011·Granted Aug 6, 2013·0 cites·18 claims
- 4832US2012302048A1Pre or post-implant plasma treatment for plasma immersed ion implantation processSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 4932US2012088356A1Integrated platform for in-situ doping and activation of substratesSANTHANAM KARTIK·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →