Inventor · disambiguated record
Nitin K. Ingle
Also filed as: INGLE NITIN · INGLE NITIN K · INGLE NITIN KRISHNARAO
224 granted patents·55 pending applications·20,949 citations·filing 2000–2025
99Inventor score
Files withAPPLIED MATERIALS INC228LIANG JINGMEI9MICROMATERIALS LLC7ZHANG JINGCHUN5MALLICK ABHIJIT BASU3
Top patents by PatentIndex Score
279 records- 0199US10062578B2Methods for etch of metal and metal-oxide filmsAPPLIED MATERIALS INC·Filed 2015·Granted Aug 28, 2018·94 cites·20 claims
- 0299US10049891B1Selective in situ cobalt residue removalAPPLIED MATERIALS INC·Filed 2017·Granted Aug 14, 2018·101 cites·19 claims
- 0399US9960045B1Charge-trap layer separation and word-line isolation for enhanced 3-D NAND structureAPPLIED MATERIALS INC·Filed 2017·Granted May 1, 2018·113 cites·15 claims
- 0499US9842744B2Methods for etch of SiN filmsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 12, 2017·113 cites·10 claims
- 0599US9837284B2Oxide etch selectivity enhancementAPPLIED MATERIALS INC·Filed 2017·Granted Dec 5, 2017·112 cites·12 claims
- 0699US9773695B2Integrated bit-line airgap formation and gate stack post cleanAPPLIED MATERIALS INC·Filed 2016·Granted Sep 26, 2017·113 cites·15 claims
- 0799US9754800B2Selective etch for silicon filmsAPPLIED MATERIALS INC·Filed 2016·Granted Sep 5, 2017·110 cites·20 claims
- 0899US9613822B2Oxide etch selectivity enhancementAPPLIED MATERIALS INC·Filed 2014·Granted Apr 4, 2017·128 cites·12 claims
- 0999US9607856B2Selective titanium nitride removalAPPLIED MATERIALS INC·Filed 2015·Granted Mar 28, 2017·126 cites·18 claims
- 1099US9583333B2Low temperature silicon nitride films using remote plasma CVD technologyAPPLIED MATERIALS INC·Filed 2014·Granted Feb 28, 2017·339 cites·12 claims
- 1199US9520303B2Aluminum selective etchAPPLIED MATERIALS INC·Filed 2014·Granted Dec 13, 2016·131 cites·14 claims
- 1299US9478432B2Silicon oxide selective removalAPPLIED MATERIALS INC·Filed 2014·Granted Oct 25, 2016·129 cites·15 claims
- 1399US9449846B2Vertical gate separationAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·133 cites·15 claims
- 1499US9418858B2Selective etch of silicon by way of metastable hydrogen terminationAPPLIED MATERIALS INC·Filed 2014·Granted Aug 16, 2016·138 cites·20 claims
- 1599US9396989B2Air gaps between copper linesAPPLIED MATERIALS INC·Filed 2014·Granted Jul 19, 2016·144 cites·15 claims
- 1699US9390937B2Silicon-carbon-nitride selective etchAPPLIED MATERIALS INC·Filed 2013·Granted Jul 12, 2016·132 cites·20 claims
- 1799US9343327B2Methods for etch of sin filmsAPPLIED MATERIALS INC·Filed 2015·Granted May 17, 2016·147 cites·16 claims
- 1899US9190293B2Even tungsten etch for high aspect ratio trenchesAPPLIED MATERIALS INC·Filed 2014·Granted Nov 17, 2015·251 cites·14 claims
- 1999US9165786B1Integrated oxide and nitride recess for better channel contact in 3D architecturesAPPLIED MATERIALS INC·Filed 2014·Granted Oct 20, 2015·184 cites·15 claims
- 2099US9159606B1Metal air gapAPPLIED MATERIALS INC·Filed 2014·Granted Oct 13, 2015·201 cites·15 claims
- 2199US9136273B1Flash gate air gapAPPLIED MATERIALS INC·Filed 2014·Granted Sep 15, 2015·184 cites·15 claims
- 2299US9093390B2Conformal oxide dry etchAPPLIED MATERIALS INC·Filed 2014·Granted Jul 28, 2015·185 cites·17 claims
- 2399US9040422B2Selective titanium nitride removalAPPLIED MATERIALS INC·Filed 2013·Granted May 26, 2015·194 cites·19 claims
- 2499US8801952B1Conformal oxide dry etchAPPLIED MATERIALS INC·Filed 2013·Granted Aug 12, 2014·191 cites·18 claims
- 2599US8765574B2Dry etch processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 1, 2014·182 cites·17 claims
- 2698US10062579B2Selective SiN lateral recessAPPLIED MATERIALS INC·Filed 2016·Granted Aug 28, 2018·95 cites·18 claims
- 2798US10043674B1Germanium etching systems and methodsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 7, 2018·102 cites·20 claims
- 2898US9991134B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2014·Granted Jun 5, 2018·100 cites·17 claims
- 2998US9947549B1Cobalt-containing material removalAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·103 cites·20 claims
- 3098US9887096B2Differential silicon oxide etchAPPLIED MATERIALS INC·Filed 2015·Granted Feb 6, 2018·113 cites·17 claims
- 3198US9831097B2Methods for selective etching of a silicon material using HF gas without nitrogen etchantsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 28, 2017·100 cites·18 claims
- 3298US9721789B1Saving ion-damaged spacersAPPLIED MATERIALS INC·Filed 2016·Granted Aug 1, 2017·117 cites·18 claims
- 3398US9711366B2Selective etch for metal-containing materialsAPPLIED MATERIALS INC·Filed 2016·Granted Jul 18, 2017·115 cites·13 claims
- 3498US9704723B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted Jul 11, 2017·114 cites·17 claims
- 3598US9659792B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted May 23, 2017·125 cites·13 claims
- 3698US9576809B2Etch suppression with germaniumAPPLIED MATERIALS INC·Filed 2014·Granted Feb 21, 2017·131 cites·4 claims
- 3798US9576788B2Cleaning high aspect ratio viasAPPLIED MATERIALS INC·Filed 2015·Granted Feb 21, 2017·99 cites·12 claims
- 3898US9576815B2Gas-phase silicon nitride selective etchAPPLIED MATERIALS INC·Filed 2015·Granted Feb 21, 2017·34 cites·16 claims
- 3998US9553102B2Tungsten separationAPPLIED MATERIALS INC·Filed 2014·Granted Jan 24, 2017·46 cites·13 claims
- 4098US9514932B2Flowable carbon for semiconductor processingAPPLIED MAT·Filed 2013·Granted Dec 6, 2016·479 cites·20 claims
- 4198US9502258B2Anisotropic gap etchAPPLIED MATERIALS INC·Filed 2014·Granted Nov 22, 2016·129 cites·14 claims
- 4298US9496167B2Integrated bit-line airgap formation and gate stack post cleanAPPLIED MATERIALS INC·Filed 2014·Granted Nov 15, 2016·132 cites·5 claims
- 4398US9478434B2Chlorine-based hardmask removalAPPLIED MATERIALS INC·Filed 2014·Granted Oct 25, 2016·134 cites·14 claims
- 4498US9472417B2Plasma-free metal etchAPPLIED MATERIALS INC·Filed 2014·Granted Oct 18, 2016·138 cites·9 claims
- 4598US9449850B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·135 cites·18 claims
- 4698US9449845B2Selective titanium nitride etchingAPPLIED MATERIALS INC·Filed 2014·Granted Sep 20, 2016·138 cites·19 claims
- 4798US9449843B1Selectively etching metals and metal nitrides conformallyAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·399 cites·15 claims
- 4898US9437451B2Radical-component oxide etchAPPLIED MATERIALS INC·Filed 2015·Granted Sep 6, 2016·134 cites·19 claims
- 4998US9412608B2Dry-etch for selective tungsten removalAPPLIED MATERIALS INC·Filed 2015·Granted Aug 9, 2016·134 cites·17 claims
- 5098US9406523B2Highly selective doped oxide removal methodAPPLIED MATERIALS INC·Filed 2014·Granted Aug 2, 2016·135 cites·15 claims
Showing the top 50 of 279 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →