Inventor · disambiguated record
Jeffrey I. Turner
Also filed as: TURNER JEFFREY I · TURNER JEFFREY IVAN
7 granted patents·6 pending applications·320 citations·filing 1997–2023
88Inventor score
Top patents by PatentIndex Score
13 records- 0192US6270647B1Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operationsSEMITOOL INC·Filed 1999·Granted Aug 7, 2001·134 cites·15 claims
- 0292US6099712ASemiconductor plating bowl and method using anode shieldSEMITOOL INC·Filed 1997·Granted Aug 8, 2000·83 cites·11 claims
- 0388US8968533B2Electroplating processor with geometric electrolyte flow pathHARRIS RANDY A·Filed 2012·Granted Mar 3, 2015·4 cites·15 claims
- 0487US6921468B2Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operationsSEMITOOL INC·Filed 2001·Granted Jul 26, 2005·40 cites·8 claims
- 0577US6599412B1In-situ cleaning processes for semiconductor electroplating electrodesSEMITOOL INC·Filed 1997·Granted Jul 29, 2003·42 cites·9 claims
- 0668US2015075976A1Electroplating processor with geometric electrolyte flow pathAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 0762US6776892B1Semiconductor plating system workpiece support having workpiece engaging electrode with pre-conditioned contact faceSEMITOOL INC·Filed 2000·Granted Aug 17, 2004·7 cites·4 claims
- 0858US2025201631A1Apparatus and Methods for Bonding MaterialsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0956US6454926B1Semiconductor plating system workpiece support having workpiece-engaging electrode with submerged conductive current transfer areasSEMITOOL INC·Filed 1997·Granted Sep 24, 2002·10 cites·44 claims
- 1052US2007215481A1In-situ cleaning processes for semiconductor electroplating electrodesGRAHAM LYNDON W·Filed 2007·Application pending·0 cites
- 1148US2003029732A1Semiconductor plating system workpiece support having workpiece-engaging electrode with submerged conductive current transfer areasFiled 2002·Application pending·0 cites
- 1241US2003201190A1In-situ cleaning processes for semiconductor electroplating electrodesFiled 2003·Application pending·0 cites
- 1339US2002017456A1Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operationsFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →