Inventor · disambiguated record
Kai-Erik Elers
Also filed as: ELERS KAI · ELERS KAI-ERIK
50 granted patents·2 pending applications·8,696 citations·filing 2000–2019
99Inventor score
Top patents by PatentIndex Score
52 records- 0199US7727864B2Controlled composition using plasma-enhanced atomic layer depositionASM INC·Filed 2006·Granted Jun 1, 2010·527 cites·32 claims
- 0299US7611751B2Vapor deposition of metal carbide filmsASM INC·Filed 2006·Granted Nov 3, 2009·606 cites·65 claims
- 0399US7410666B2Metal nitride carbide deposition by ALDASM INT·Filed 2005·Granted Aug 12, 2008·503 cites·27 claims
- 0499US7144809B2Production of elemental films using a boron-containing reducing agentASM INT·Filed 2004·Granted Dec 5, 2006·450 cites·33 claims
- 0599US6986914B2Metal nitride deposition by ALD with reduction pulseASM INT·Filed 2002·Granted Jan 17, 2006·503 cites·41 claims
- 0699US6821889B2Production of elemental thin films using a boron-containing reducing agentASM INT·Filed 2002·Granted Nov 23, 2004·349 cites·54 claims
- 0799US6482740B2Method of growing electrical conductors by reducing metal oxide film with organic compound containing -OH, -CHO, or -COOHASM MICROCHEMISTRY OY·Filed 2001·Granted Nov 19, 2002·562 cites·26 claims
- 0899US6482262B1Deposition of transition metal carbidesASM MICROCHEMISTRY OY·Filed 2000·Granted Nov 19, 2002·328 cites·29 claims
- 0999US6475276B1Production of elemental thin films using a boron-containing reducing agentASM MICROCHEMISTRY OY·Filed 2000·Granted Nov 5, 2002·864 cites·40 claims
- 1098US7955979B2Method of growing electrical conductorsASM INT·Filed 2008·Granted Jun 7, 2011·88 cites·15 claims
- 1198US7241677B2Process for producing integrated circuits including reduction using gaseous organic compoundsASM INT·Filed 2005·Granted Jul 10, 2007·119 cites·32 claims
- 1298US6921712B2Process for producing integrated circuits including reduction using gaseous organic compoundsASM INTERNAT NV·Filed 2001·Granted Jul 26, 2005·153 cites·30 claims
- 1398US6887795B2Method of growing electrical conductorsASM INT·Filed 2002·Granted May 3, 2005·158 cites·32 claims
- 1498US6820570B2Atomic layer deposition reactorASM INT·Filed 2002·Granted Nov 23, 2004·647 cites·13 claims
- 1598US6727169B1Method of making conformal lining layers for damascene metallizationASM INT·Filed 2000·Granted Apr 27, 2004·225 cites·42 claims
- 1698US6599572B2Process for growing metalloid thin films utilizing boron-containing reducing agentsASM MICROCHEMISTRY OY·Filed 2001·Granted Jul 29, 2003·233 cites·10 claims
- 1798US6391785B1Method for bottomless deposition of barrier layers in integrated circuit metallization schemesIMEC INTER UNI MICRO ELECTR·Filed 2000·Granted May 21, 2002·584 cites·32 claims
- 1897US7494927B2Method of growing electrical conductorsASM INT·Filed 2003·Granted Feb 24, 2009·127 cites·45 claims
- 1997US6902763B1Method for depositing nanolaminate thin films on sensitive surfacesASM INT·Filed 2000·Granted Jun 7, 2005·191 cites·21 claims
- 2097US6800552B2Deposition of transition metal carbidesASM INT·Filed 2002·Granted Oct 5, 2004·91 cites·35 claims
- 2197US6767582B1Method of modifying source chemicals in an ald processASM INTERNAT NV·Filed 2000·Granted Jul 27, 2004·129 cites·22 claims
- 2297US6759325B2Sealing porous structuresASM MICROCHEMISTRY OY·Filed 2002·Granted Jul 6, 2004·169 cites·29 claims
- 2397US6664192B2Method for bottomless deposition of barrier layers in integrated circuit metallization schemesIMEC INTER UNI MICRO ELECTR·Filed 2002·Granted Dec 16, 2003·77 cites·32 claims
- 2496US9831094B2Enhanced thin film depositionASM INT NV·Filed 2015·Granted Nov 28, 2017·13 cites·14 claims
- 2596US8536058B2Method of growing electrical conductorsKOSTAMO JUHANA·Filed 2011·Granted Sep 17, 2013·80 cites·22 claims
- 2696US7749871B2Method for depositing nanolaminate thin films on sensitive surfacesASM INT·Filed 2005·Granted Jul 6, 2010·34 cites·4 claims
- 2796US7485340B2Production of elemental films using a boron-containing reducing agentASM INT·Filed 2006·Granted Feb 3, 2009·26 cites·23 claims
- 2895US7608549B2Method of forming non-conformal layersASM INC·Filed 2006·Granted Oct 27, 2009·40 cites·26 claims
- 2995US6863727B1Method of depositing transition metal nitride thin filmsASM INT·Filed 2000·Granted Mar 8, 2005·87 cites·32 claims
- 3095US6852635B2Method for bottomless deposition of barrier layers in integrated circuit metallization schemesINTERUNIVERSITAIR NIZROELECMIC·Filed 2003·Granted Feb 8, 2005·137 cites·25 claims
- 3194US8993055B2Enhanced thin film depositionRAHTU ANTTI·Filed 2006·Granted Mar 31, 2015·28 cites·33 claims
- 3294US6878628B2In situ reduction of copper oxide prior to silicon carbide depositionASM INTERNAT NV·Filed 2001·Granted Apr 12, 2005·159 cites·21 claims
- 3394US6794287B2Process for growing metal or metal carbide thin films utilizing boron-containing reducing agentsASM INTERNAT NV·Filed 2003·Granted Sep 21, 2004·81 cites·15 claims
- 3494US6679951B2Metal anneal with oxidation preventionASM INTENAT N V·Filed 2001·Granted Jan 20, 2004·126 cites·36 claims
- 3593US8334218B2Method of forming non-conformal layersVAN NOOTEN SEBASTIAN E·Filed 2009·Granted Dec 18, 2012·58 cites·15 claims
- 3692US7595270B2Passivated stoichiometric metal nitride filmsASM INC·Filed 2007·Granted Sep 29, 2009·17 cites·45 claims
- 3790US10964534B2Enhanced thin film depositionASM INT NV·Filed 2019·Granted Mar 30, 2021·3 cites·20 claims
- 3889US8268409B2Plasma-enhanced deposition of metal carbide filmsELERS KAI-ERIK·Filed 2007·Granted Sep 18, 2012·14 cites·40 claims
- 3988US7329590B2Method for depositing nanolaminate thin films on sensitive surfacesASM INT·Filed 2004·Granted Feb 12, 2008·35 cites·19 claims
- 4085US10297444B2Enhanced thin film depositionASM INT NV·Filed 2017·Granted May 21, 2019·2 cites·20 claims
- 4182US7598170B2Plasma-enhanced ALD of tantalum nitride filmsASM INC·Filed 2007·Granted Oct 6, 2009·4 cites·19 claims
- 4282US7018917B2Multilayer metallizationASM INT·Filed 2003·Granted Mar 28, 2006·32 cites·38 claims
- 4378US7102235B2Conformal lining layers for damascene metallizationASM INT·Filed 2003·Granted Sep 5, 2006·17 cites·31 claims
- 4474US7670944B2Conformal lining layers for damascene metallizationASM INT·Filed 2006·Granted Mar 2, 2010·3 cites·16 claims
- 4572US7034397B2Oxygen bridge structures and methods to form oxygen bridge structuresASM INTERNATIONL N V·Filed 2003·Granted Apr 25, 2006·15 cites·17 claims
- 4671US9127351B2Enhanced thin film depositionASM INT·Filed 2013·Granted Sep 8, 2015·1 cites·22 claims
- 4762US8809195B2Etching high-k materialsELERS KAI-ERIK·Filed 2008·Granted Aug 19, 2014·1 cites·37 claims
- 4858US9217200B2Modification of nanoimprint lithography templates by atomic layer depositionHAUKKA SUVI P·Filed 2007·Granted Dec 22, 2015·0 cites·26 claims
- 4952US7465658B2Oxygen bridge structures and methods to form oxygen bridge structuresASM INC·Filed 2006·Granted Dec 16, 2008·0 cites·5 claims
- 5050US2005092249A1Atomic layer deposition reactorFiled 2004·Application pending·0 cites
Showing the top 50 of 52 patent records by PatentIndex Score.
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