Inventor · disambiguated record
Xiaoxiong Yuan
Also filed as: YUAN XIAOXIONG · YUAN XIAOXIONG JOHN
43 granted patents·27 pending applications·2,502 citations·filing 1999–2024
98Inventor score
Top patents by PatentIndex Score
70 records- 0198US7780789B2Vortex chamber lids for atomic layer depositionAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·458 cites·24 claims
- 0298US7520957B2Lid assembly for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Apr 21, 2009·162 cites·8 claims
- 0398US7396480B2Method for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Jul 8, 2008·285 cites·20 claims
- 0497US8846163B2Method for removing oxidesKAO CHIEN-TEH·Filed 2012·Granted Sep 30, 2014·190 cites·19 claims
- 0597US6302965B1Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfacesAPPLIED MATERIALS INC·Filed 2000·Granted Oct 16, 2001·209 cites·16 claims
- 0696US11555244B2High temperature dual chamber showerheadAPPLIED MATERIALS INC·Filed 2020·Granted Jan 17, 2023·4 cites·20 claims
- 0796US8291857B2Apparatuses and methods for atomic layer depositionLAM HYMAN·Filed 2009·Granted Oct 23, 2012·375 cites·16 claims
- 0896US6660126B2Lid assembly for a processing system to facilitate sequential deposition techniquesAPPLIED MATERIALS INC·Filed 2001·Granted Dec 9, 2003·128 cites·28 claims
- 0996US6375748B1Method and apparatus for preventing edge depositionAPPLIED MATERIALS INC·Filed 1999·Granted Apr 23, 2002·293 cites·24 claims
- 1095US8293015B2Apparatuses and methods for atomic layer depositionLAM HYMAN W H·Filed 2011·Granted Oct 23, 2012·21 cites·4 claims
- 1195US7767024B2Method for front end of line fabricationAPPPLIED MATERIALS INC·Filed 2008·Granted Aug 3, 2010·28 cites·28 claims
- 1292US9888528B2Substrate support with multiple heating zonesAPPLIED MATERIALS INC·Filed 2015·Granted Feb 6, 2018·11 cites·16 claims
- 1392US6494955B1Ceramic substrate supportAPPLIED MATERIALS INC·Filed 2000·Granted Dec 17, 2002·82 cites·35 claims
- 1491US9490150B2Substrate support for substrate backside contamination controlTZU GWO-CHUAN·Filed 2012·Granted Nov 8, 2016·17 cites·18 claims
- 1591US6730175B2Ceramic substrate supportAPPLIED MATERIALS INC·Filed 2002·Granted May 4, 2004·76 cites·30 claims
- 1691US6617553B2Multi-zone resistive heaterAPPLIED MATERIALS INC·Filed 2002·Granted Sep 9, 2003·59 cites·62 claims
- 1789US10593539B2Support assemblyKAO CHIEN TEH·Filed 2012·Granted Mar 17, 2020·5 cites·20 claims
- 1889US10407771B2Atomic layer deposition chamber with thermal lidAPPLIED MATERIALS INC·Filed 2014·Granted Sep 10, 2019·12 cites·18 claims
- 1989US9853579B2Rotatable heated electrostatic chuckAPPLIED MATERIALS INC·Filed 2014·Granted Dec 26, 2017·9 cites·20 claims
- 2089US8146896B2Chemical precursor ampoule for vapor deposition processesCUVALCI OLKAN·Filed 2008·Granted Apr 3, 2012·14 cites·25 claims
- 2188US9004006B2Process chamber lid design with built-in plasma source for short lifetime speciesKAO CHIEN-TEH·Filed 2011·Granted Apr 14, 2015·5 cites·18 claims
- 2287US8747556B2Apparatuses and methods for atomic layer depositionLAM HYMAN W H·Filed 2012·Granted Jun 10, 2014·3 cites·15 claims
- 2386US6299692B1Head for vaporizing and flowing various precursor materials onto semiconductor wafers during chemical vapor depositionAPPLIED MATERIALS INC·Filed 2000·Granted Oct 9, 2001·29 cites·15 claims
- 2485US8920564B2Methods and apparatus for thermal based substrate processing with variable temperature capabilityTZU GWO-CHUAN·Filed 2011·Granted Dec 30, 2014·4 cites·12 claims
- 2580US12249494B2Remote plasma cleaning of chambers for electronics manufacturing systemsAPPLIED MATERIALS INC·Filed 2023·Granted Mar 11, 2025·0 cites·20 claims
- 2680US10752990B2Apparatus and methods to remove residual precursor inside gas lines post-depositionAPPLIED MATERIALS INC·Filed 2017·Granted Aug 25, 2020·1 cites·16 claims
- 2780US9017776B2Apparatuses and methods for atomic layer depositionAPPLIED MATERIALS INC·Filed 2012·Granted Apr 28, 2015·1 cites·6 claims
- 2878US2021225640A1Support assemblyAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2975US10857655B2Substrate support plate with improved lift pin sealingAPPLIED MATERIALS INC·Filed 2013·Granted Dec 8, 2020·3 cites·19 claims
- 3075US9783889B2Apparatus for variable substrate temperature controlTZU GWO-CHUAN·Filed 2012·Granted Oct 10, 2017·1 cites·20 claims
- 3173US10508339B2Blocker plate for use in a substrate process chamberAPPLIED MATERIALS INC·Filed 2017·Granted Dec 17, 2019·1 cites·11 claims
- 3272USD1052548SGas diffuserAPPLIED MATERIALS INC·Filed 2023·Granted Nov 26, 2024·5 cites·1 claims
- 3371US9905443B2Reflective deposition rings and substrate processing chambers incorporating sameSUBRAMANI ANANTHA K·Filed 2012·Granted Feb 27, 2018·3 cites·18 claims
- 3471US2020006054A1Support assemblyAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3570US8821637B2Temperature controlled lid assembly for tungsten nitride depositionGELATOS AVGERINOS V·Filed 2008·Granted Sep 2, 2014·3 cites·14 claims
- 3669US9916994B2Substrate support with multi-piece sealing surfaceAPPLIED MATERIALS INC·Filed 2013·Granted Mar 13, 2018·2 cites·17 claims
- 3768US11854773B2Remote plasma cleaning of chambers for electronics manufacturing systemsAPPLIED MATERIALS INC·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 3867US11628456B2Apparatus for increasing flux from an ampouleAPPLIED MATERIALS INC·Filed 2021·Granted Apr 18, 2023·0 cites·20 claims
- 3966US2025346998A1Gas delivery network modelingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4064US9206512B2Gas distribution systemNGUYEN HANH D·Filed 2012·Granted Dec 8, 2015·3 cites·14 claims
- 4161US11421322B2Blocker plate for use in a substrate process chamberAPPLIED MATERIALS INC·Filed 2019·Granted Aug 23, 2022·0 cites·16 claims
- 4261US2014076234A1Multi chamber processing systemAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 4361US2009111280A1Method for removing oxidesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4460US2025051965A1Showerhead for fast delivery of incompatable precursorsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4559US12016092B2Gas distribution ceramic heater for deposition chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jun 18, 2024·0 cites·20 claims
- 4657US2015345019A1Method and apparatus for improving gas flow in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4756US12486576B2Shadow ring lift to improve wafer edge performanceAPPLIED MATERIALS INC·Filed 2021·Granted Dec 2, 2025·0 cites·19 claims
- 4856US11059061B2Apparatus for increasing flux from an ampouleAPPLIED MATERIALS INC·Filed 2018·Granted Jul 13, 2021·0 cites·29 claims
- 4956US2020230782A1Method and Apparatus for cleaning a substrateAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 5056US2024153790A1Process chamber with pressure charging and pulsing capabilityAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
Showing the top 50 of 70 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →