Inventor · disambiguated record
Anzhong Chang
Also filed as: CHANG ANZHONG · CHANG ANZHONG ANDREW
33 granted patents·18 pending applications·1,653 citations·filing 1999–2025
98Inventor score
Top patents by PatentIndex Score
51 records- 0198US8361892B2Multiple precursor showerhead with by-pass portsAPPLIED MATERIALS INC·Filed 2010·Granted Jan 29, 2013·125 cites·20 claims
- 0298US6461435B1Showerhead with reduced contact areaAPPLIED MATERIALS INC·Filed 2000·Granted Oct 8, 2002·600 cites·22 claims
- 0397US8679956B2Multiple precursor showerhead with by-pass portsAPPLIED MATERIALS INC·Filed 2013·Granted Mar 25, 2014·23 cites·16 claims
- 0496US6660126B2Lid assembly for a processing system to facilitate sequential deposition techniquesAPPLIED MATERIALS INC·Filed 2001·Granted Dec 9, 2003·128 cites·28 claims
- 0596US6375748B1Method and apparatus for preventing edge depositionAPPLIED MATERIALS INC·Filed 1999·Granted Apr 23, 2002·293 cites·24 claims
- 0695US6734020B2Valve control system for atomic layer deposition chamberAPPLIED MATERIALS INC·Filed 2001·Granted May 11, 2004·135 cites·11 claims
- 0793US10062598B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2015·Granted Aug 28, 2018·7 cites·12 claims
- 0893US6596085B1Methods and apparatus for improved vaporization of deposition material in a substrate processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Jul 22, 2003·71 cites·6 claims
- 0993US2025364306A1Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1092US9845550B2Upper dome with injection assemblyAPPLIED MATERIALS INC·Filed 2015·Granted Dec 19, 2017·7 cites·20 claims
- 1192US6494955B1Ceramic substrate supportAPPLIED MATERIALS INC·Filed 2000·Granted Dec 17, 2002·82 cites·35 claims
- 1290US10930543B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2018·Granted Feb 23, 2021·4 cites·17 claims
- 1389US10130958B2Showerhead assembly with gas injection distribution devicesTAM ALEXANDER·Filed 2010·Granted Nov 20, 2018·9 cites·15 claims
- 1487US9322097B2EPI base ringAPPLIED MATERIALS INC·Filed 2013·Granted Apr 26, 2016·7 cites·14 claims
- 1586US12400904B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2023·Granted Aug 26, 2025·0 cites·20 claims
- 1686US8183132B2Methods for fabricating group III nitride structures with a cluster toolNIJHAWAN SANDEEP·Filed 2010·Granted May 22, 2012·12 cites·23 claims
- 1786US6299692B1Head for vaporizing and flowing various precursor materials onto semiconductor wafers during chemical vapor depositionAPPLIED MATERIALS INC·Filed 2000·Granted Oct 9, 2001·29 cites·15 claims
- 1884US8491720B2HVPE precursor source hardwareISHIKAWA TETSUYA·Filed 2009·Granted Jul 23, 2013·4 cites·20 claims
- 1983US8568529B2HVPE chamber hardwareISHIKAWA TETSUYA·Filed 2009·Granted Oct 29, 2013·4 cites·11 claims
- 2083US7214297B2Substrate support element for an electrochemical plating cellAPPLIED MATERIALS INC·Filed 2004·Granted May 8, 2007·30 cites·16 claims
- 2182US10119192B2EPI base ringAPPLIED MATERIALS INC·Filed 2016·Granted Nov 6, 2018·3 cites·15 claims
- 2282US9768043B2Quartz upper and lower domesAPPLIED MATERIALS INC·Filed 2013·Granted Sep 19, 2017·4 cites·19 claims
- 2381US10727093B2Light pipe window structure for low pressure thermal processesAPPLIED MATERIALS INC·Filed 2015·Granted Jul 28, 2020·3 cites·16 claims
- 2480US10269614B2Susceptor design to reduce edge thermal peakAPPLIED MATERIALS INC·Filed 2015·Granted Apr 23, 2019·3 cites·15 claims
- 2579US7201803B2Valve control system for atomic layer deposition chamberAPPLIED MATERIALS INC·Filed 2003·Granted Apr 10, 2007·21 cites·6 claims
- 2675US11848226B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·0 cites·7 claims
- 2774US10458040B2Upper dome with injection assemblyAPPLIED MATERIALS INC·Filed 2017·Granted Oct 29, 2019·1 cites·20 claims
- 2871USD716240SLower chamber linerAPPLIED MATERIALS INC·Filed 2013·Granted Oct 28, 2014·16 cites·1 claims
- 2969USD711331SUpper chamber linerAPPLIED MATERIALS INC·Filed 2013·Granted Aug 19, 2014·15 cites·1 claims
- 3068US8910644B2Method and apparatus for inducing turbulent flow of a processing chamber cleaning gasCHUNG HUA·Filed 2011·Granted Dec 16, 2014·2 cites·14 claims
- 3164USD664170SCleaning plate for inducing turbulent flow of a processing chamber cleaning glassCHUNG HUA·Filed 2011·Granted Jul 24, 2012·14 cites·1 claims
- 3261US11495479B2Light pipe window structure for thermal chamber applications and processesAPPLIED MATERIALS INC·Filed 2019·Granted Nov 8, 2022·0 cites·20 claims
- 3357US10410890B2Light pipe window structure for thermal chamber applications and processesAPPLIED MATERIALS INC·Filed 2014·Granted Sep 10, 2019·0 cites·17 claims
- 3451US2011256692A1Multiple precursor concentric delivery showerheadAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3551US2011253044A1Showerhead assembly with metrology port purgeAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3650US2018005856A1Quartz upper and lower domesAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 3750US2012012049A1Hvpe chamberHSU WEI-YUNG·Filed 2011·Application pending·0 cites
- 3847US2016071749A1Upper dome for epi chamberAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3946US2016033070A1Recursive pumping memberAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4045US2008099181A1Method to cool a bake plate using an actively chilled transfer shuttleSOKUDO CO LTD·Filed 2007·Application pending·0 cites
- 4145US2008236787A1Method to cool bake plates in a track lithography toolSOKUDO CO LTD·Filed 2007·Application pending·0 cites
- 4243US2007254494A1Faceplate with rapid temperature changeAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4341US2016068955A1Honeycomb multi-zone gas distribution plateAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 4441US2003019428A1Chemical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 4541US2003140857A1Apparatus and method for low pressure CVD deposition of tungsten and tungsten nitrideAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 4640US2002121241A1Processing chamber and method of distributing process fluids therein to facilitate sequential deposition of filmsFiled 2001·Application pending·0 cites
- 4739US2003017268A1.method of cvd titanium nitride film deposition for increased titanium nitride film uniformityAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 4838US2005284751A1Electrochemical plating cell with a counter electrode in an isolated anolyte compartmentKOVARSKY NICOLAY·Filed 2004·Application pending·0 cites
- 4938US2004026255A1Insoluble anode loop in copper electrodeposition cell for interconnect formationAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 5033USD664172SDome assembly for a deposition chamberISHIKAWA TETSUYA·Filed 2009·Granted Jul 24, 2012·1 cites·1 claims
Showing the top 50 of 51 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →