Inventor · disambiguated record
Paul Doyle
Also filed as: DOYLE PAUL · DOYLE PAUL A · DOYLE PAUL ANDREW
9 granted patents·3 pending applications·109 citations·filing 2007–2024
83Inventor score
Top patents by PatentIndex Score
12 records- 0197US7607647B2Stabilizing a substrate using a vacuum preload air bearing chuckKLA TENCOR TECH CORP·Filed 2007·Granted Oct 27, 2009·96 cites·41 claims
- 0283US8817250B2Air bearing for substrate inspection deviceDOYLE PAUL·Filed 2011·Granted Aug 26, 2014·6 cites·19 claims
- 0381US10451542B2Local purge within metrology and inspection systemsNANOMETRICS INC·Filed 2018·Granted Oct 22, 2019·5 cites·12 claims
- 0466US12433693B2Rotary and linear actuated robotic catheter steering systemSCHMITZ GREGORY P·Filed 2024·Granted Oct 7, 2025·0 cites·22 claims
- 0561US8995066B2Passive position compensation of a spindle, stage, or component exposed to a heat loadDOYLE PAUL·Filed 2011·Granted Mar 31, 2015·1 cites·12 claims
- 0661US8042254B1Method for improving edge handling chuck aerodynamicsKLA TENCOR CORP·Filed 2007·Granted Oct 25, 2011·1 cites·19 claims
- 0752US2011069306A1Referenced Inspection DeviceKLA TENCOR CORP·Filed 2009·Application pending·0 cites
- 0848US2020011786A1Local purge within metrology and inspection systemsNANOMETRICS INC·Filed 2019·Application pending·0 cites
- 0946US11280381B2Active damper for semiconductor metrology and inspection systemsONTO INNOVATION INC·Filed 2019·Granted Mar 22, 2022·0 cites·42 claims
- 1042US9810619B2Method and system for simultaneous tilt and height control of a substrate surface in an inspection systemKLA TENCOR CORP·Filed 2013·Granted Nov 7, 2017·0 cites·45 claims
- 1140US2013038866A1Air flow management in a system with high speed spinning chuckKLA TENCOR CORP·Filed 2012·Application pending·0 cites
- 1238US10784136B2FOUP purge shieldONTO INNOVATION INC·Filed 2018·Granted Sep 22, 2020·0 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when Paul Doyle files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →