Assignee
KLA TENCOR CORP
US·1,518 granted patents·75 pending applications·21,663 citations·filing 1995–2022
Top patents by PatentIndex Score
1,593 records- 0199US8929406B2193NM laser and inspection systemKLA TENCOR CORP·Filed 2014·Granted Jan 6, 2015·63 cites·26 claims
- 0299US6462818B1Overlay alignment mark designKLA TENCOR CORP·Filed 2000·Granted Oct 8, 2002·192 cites·32 claims
- 0399US6433541B1In-situ metalization monitoring using eddy current measurements during the process for removing the filmKLA TENCOR CORP·Filed 2000·Granted Aug 13, 2002·161 cites·21 claims
- 0499US6201601B1Sample inspection systemKLA TENCOR CORP·Filed 1997·Granted Mar 13, 2001·359 cites·51 claims
- 0598US10748730B2Photocathode including field emitter array on a silicon substrate with boron layerKLA TENCOR CORP·Filed 2016·Granted Aug 18, 2020·16 cites·27 claims
- 0698US10527951B2Compound imaging metrology targetsKLA TENCOR CORP·Filed 2016·Granted Jan 7, 2020·18 cites·21 claims
- 0798US10352695B2X-ray scatterometry metrology for high aspect ratio structuresKLA TENCOR CORP·Filed 2016·Granted Jul 16, 2019·68 cites·21 claims
- 0898US10324050B2Measurement system optimization for X-ray based metrologyKLA TENCOR CORP·Filed 2016·Granted Jun 18, 2019·32 cites·20 claims
- 0998US10228320B1Achieving a small pattern placement error in metrology targetsKLA—TENCOR CORP·Filed 2015·Granted Mar 12, 2019·17 cites·17 claims
- 1098US10043261B2Generating simulated output for a specimenKLA TENCOR CORP·Filed 2017·Granted Aug 7, 2018·32 cites·28 claims
- 1198US9518916B1Compressive sensing for metrologyKLA TENCOR CORP·Filed 2014·Granted Dec 13, 2016·38 cites·29 claims
- 1298US9470639B1Optical metrology with reduced sensitivity to grating anomaliesKLA TENCOR CORP·Filed 2016·Granted Oct 18, 2016·31 cites·20 claims
- 1398US7933026B2High resolution monitoring of CD variationsKLA TENCOR CORP·Filed 2009·Granted Apr 26, 2011·178 cites·7 claims
- 1498US7929667B1High brightness X-ray metrologyKLA TENCOR CORP·Filed 2009·Granted Apr 19, 2011·191 cites·18 claims
- 1598US7897942B1Dynamic tracking of wafer motion and distortion during lithographyKLA TENCOR CORP·Filed 2008·Granted Mar 1, 2011·56 cites·28 claims
- 1698US7826071B2Parametric profiling using optical spectroscopic systemsKLA TENCOR CORP·Filed 2007·Granted Nov 2, 2010·114 cites·24 claims
- 1798US7478019B2Multiple tool and structure analysisKLA TENCOR CORP·Filed 2005·Granted Jan 13, 2009·225 cites·30 claims
- 1898US6886153B1Design driven inspection or measurement for semiconductor using recipeKLA TENCOR CORP·Filed 2001·Granted Apr 26, 2005·135 cites·23 claims
- 1998US6707540B1In-situ metalization monitoring using eddy current and optical measurementsKLA TENCOR CORP·Filed 2000·Granted Mar 16, 2004·162 cites·38 claims
- 2098US6611330B2System for measuring polarimetric spectrum and other properties of a sampleKLA TENCOR CORP·Filed 2001·Granted Aug 26, 2003·120 cites·249 claims
- 2198US6081325AOptical scanning system for surface inspectionKLA TENCOR CORP·Filed 1997·Granted Jun 27, 2000·279 cites·67 claims
- 2298US5883710AScanning system for inspecting anomalies on surfacesKLA TENCOR CORP·Filed 1995·Granted Mar 16, 1999·209 cites·46 claims
- 2397US11248905B2Machine learning in metrology measurementsKLA TENCOR CORP·Filed 2017·Granted Feb 15, 2022·8 cites·20 claims
- 2497US10895541B2Systems and methods for combined x-ray reflectometry and photoelectron spectroscopyKLA TENCOR CORP·Filed 2018·Granted Jan 19, 2021·21 cites·20 claims
- 2597US10775323B2Full beam metrology for X-ray scatterometry systemsKLA TENCOR CORP·Filed 2017·Granted Sep 15, 2020·19 cites·21 claims
- 2697US10727142B2Process monitoring of deep structures with X-ray scatterometryKLA TENCOR CORP·Filed 2018·Granted Jul 28, 2020·17 cites·13 claims
- 2797US10197389B2Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fieldsKLA TENCOR CORP·Filed 2016·Granted Feb 5, 2019·19 cites·23 claims
- 2897US10101676B2Spectroscopic beam profile overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Oct 16, 2018·15 cites·20 claims
- 2997US10095122B1Systems and methods for fabricating metrology targets with sub-resolution featuresKLA TENCOR CORP·Filed 2016·Granted Oct 9, 2018·18 cites·18 claims
- 3097US10072921B2Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive elementKLA TENCOR CORP·Filed 2015·Granted Sep 11, 2018·17 cites·19 claims
- 3197US10013518B2Model building and analysis engine for combined X-ray and optical metrologyKLA TENCOR CORP·Filed 2013·Granted Jul 3, 2018·29 cites·20 claims
- 3297US9885962B2Methods and apparatus for measuring semiconductor device overlay using X-ray metrologyKLA TENCOR CORP·Filed 2014·Granted Feb 6, 2018·35 cites·22 claims
- 3397US9874526B2Methods and apparatus for polarized wafer inspectionKLA TENCOR CORP·Filed 2017·Granted Jan 23, 2018·17 cites·22 claims
- 3497US9826614B1Compac X-ray source for semiconductor metrologyKLA TENCOR CORP·Filed 2014·Granted Nov 21, 2017·22 cites·20 claims
- 3597US9818887B2Back-illuminated sensor with boron layerKLA TENCOR CORP·Filed 2016·Granted Nov 14, 2017·11 cites·15 claims
- 3697US9784690B2Apparatus, techniques, and target designs for measuring semiconductor parametersKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·14 cites·20 claims
- 3797US9778213B2Metrology tool with combined XRF and SAXS capabilitiesKLA TENCOR CORP·Filed 2014·Granted Oct 3, 2017·39 cites·20 claims
- 3897US9660409B2Low noise, high stability, deep ultra-violet, continuous wave laserKLA TENCOR CORP·Filed 2016·Granted May 23, 2017·11 cites·11 claims
- 3997US9529182B2193nm laser and inspection systemKLA TENCOR CORP·Filed 2014·Granted Dec 27, 2016·33 cites·3 claims
- 4097US9494535B2Scatterometry-based imaging and critical dimension metrologyKLA TENCOR CORP·Filed 2015·Granted Nov 15, 2016·23 cites·25 claims
- 4197US9496425B2Back-illuminated sensor with boron layerKLA TENCOR CORP·Filed 2013·Granted Nov 15, 2016·29 cites·26 claims
- 4297US9476698B2Periodic patterns and technique to control misalignment between two layersKLA TENCOR CORP·Filed 2015·Granted Oct 25, 2016·22 cites·13 claims
- 4397US9478402B2Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensorKLA TENCOR CORP·Filed 2014·Granted Oct 25, 2016·20 cites·10 claims
- 4497US9461435B2Alleviation of laser-induced damage in optical materials by suppression of transient color centers formation and control of phonon populationKLA TENCOR CORP·Filed 2015·Granted Oct 4, 2016·13 cites·11 claims
- 4597US9347879B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR CORP·Filed 2015·Granted May 24, 2016·17 cites·21 claims
- 4697US9222895B2Generalized virtual inspectorKLA TENCOR CORP·Filed 2014·Granted Dec 29, 2015·96 cites·43 claims
- 4797US9182219B1Overlay measurement based on moire effect between structured illumination and overlay targetKLA TENCOR CORP·Filed 2014·Granted Nov 10, 2015·23 cites·20 claims
- 4897US9151940B2Semiconductor inspection and metrology system using laser pulse multiplierKLA TENCOR CORP·Filed 2012·Granted Oct 6, 2015·32 cites·16 claims
- 4997US9092846B2Detecting defects on a wafer using defect-specific and multi-channel informationKLA TENCOR CORP·Filed 2014·Granted Jul 28, 2015·30 cites·56 claims
- 5097US8675188B2Method and system for determining one or more optical characteristics of structure of a semiconductor waferKLA TENCOR CORP·Filed 2013·Granted Mar 18, 2014·33 cites·29 claims
Showing the top 50 of 1,593 patent records by PatentIndex Score.
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