Inventor · disambiguated record
Abaneshwar Prasad
Also filed as: PRASAD ABANESHWAR
19 granted patents·10 pending applications·676 citations·filing 2002–2019
96Inventor score
Files withCABOT MICROELECTRONICS CORP24PRASAD ABANESHWAR2CABOT MICROELECTRONIC CORP1INT PAPER CO1NEWELL KELLY1
Top patents by PatentIndex Score
29 records- 0198US6913517B2Microporous polishing padsCABOT MICROELECTRONICS CORP·Filed 2002·Granted Jul 5, 2005·89 cites·32 claims
- 0297US7267607B2Transparent microporous materials for CMPCABOT MICROELECTRONICS CORP·Filed 2005·Granted Sep 11, 2007·37 cites·13 claims
- 0396US7699684B2CMP porous pad with component-filled poresCABOT MICROELECTRONICS CORP·Filed 2007·Granted Apr 20, 2010·36 cites·11 claims
- 0495US7311862B2Method for manufacturing microporous CMP materials having controlled pore sizeCABOT MICROELECTRONICS CORP·Filed 2005·Granted Dec 25, 2007·34 cites·10 claims
- 0594US7435161B2Multi-layer polishing pad material for CMPCABOT MICROELECTRONICS CORP·Filed 2005·Granted Oct 14, 2008·31 cites·14 claims
- 0693US6884156B2Multi-layer polishing pad material for CMPCABOT MICROELECTRONICS CORP·Filed 2003·Granted Apr 26, 2005·77 cites·38 claims
- 0792US6935931B2Microporous polishing padsCABOT MICROELECTRONICS CORP·Filed 2004·Granted Aug 30, 2005·44 cites·15 claims
- 0890US6998166B2Polishing pad with oriented pore structureCABOT MICROELECTRONICS CORP·Filed 2003·Granted Feb 14, 2006·42 cites·16 claims
- 0989US6896593B2Microporous polishing padsCABOT MICROELECTRONIC CORP·Filed 2004·Granted May 24, 2005·41 cites·16 claims
- 1088US8075372B2Polishing pad with microporous regionsPRASAD ABANESHWAR·Filed 2004·Granted Dec 13, 2011·39 cites·37 claims
- 1188US7435165B2Transparent microporous materials for CMPCABOT MICROELECTRONICS CORP·Filed 2002·Granted Oct 14, 2008·40 cites·15 claims
- 1287US7264641B2Polishing pad comprising biodegradable polymerCABOT MICROELECTRONICS CORP·Filed 2003·Granted Sep 4, 2007·38 cites·6 claims
- 1386US7195544B2CMP porous pad with component-filled poresCABOT MICROELECTRONICS CORP·Filed 2004·Granted Mar 27, 2007·29 cites·32 claims
- 1485US7204742B2Polishing pad comprising hydrophobic region and endpoint detection portCABOT MICROELECTRONICS CORP·Filed 2004·Granted Apr 17, 2007·31 cites·21 claims
- 1583US6960120B2CMP pad with composite transparent windowCABOT MICROELECTRONICS CORP·Filed 2003·Granted Nov 1, 2005·28 cites·43 claims
- 1681US7059936B2Low surface energy CMP padCABOT MICROELECTRONICS CORP·Filed 2004·Granted Jun 13, 2006·23 cites·40 claims
- 1778US6899598B2Microporous polishing padsCABOT MICROELECTRONICS CORP·Filed 2004·Granted May 31, 2005·14 cites·10 claims
- 1865US9156125B2Polishing pad with light-stable light-transmitting regionPRASAD ABANESHWAR·Filed 2012·Granted Oct 13, 2015·1 cites·25 claims
- 1959US7686994B2Method of preparing a conductive filmCABOT MICROELECTRONICS CORP·Filed 2005·Granted Mar 30, 2010·2 cites·16 claims
- 2055US2008057845A1Method for manufacturing microporous CMP materials having controlled pore sizeCABOT MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 2148US2021024731A1Cellulose fiber polymer composites with high fiber dispersion and related methods of makingINT PAPER CO·Filed 2019·Application pending·0 cites
- 2245US2005153634A1Negative poisson's ratio material-containing CMP polishing padCABOT MICROELECTRONICS CORP·Filed 2004·Application pending·0 cites
- 2344US2004171339A1Microporous polishing padsCABOT MICROELECTRONICS CORP·Filed 2004·Application pending·0 cites
- 2443US2008274674A1Stacked polishing pad for high temperature applicationsCABOT MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 2541US2006286906A1Polishing pad comprising magnetically sensitive particles and method for the use thereofCABOT MICROELECTRONICS CORP·Filed 2005·Application pending·0 cites
- 2639US2005276967A1Surface textured microporous polishing padsCABOT MICROELECTRONICS CORP·Filed 2005·Application pending·0 cites
- 2738US2005101228A1Polishing pad comprising biodegradable polymerCABOT MICROELECTRONICS CORP·Filed 2003·Application pending·0 cites
- 2836US2013237136A1Polishing pad comprising transmissive regionNEWELL KELLY·Filed 2011·Application pending·0 cites
- 2934US2017036320A1Cmp polishing pad with columnar structure and methods related theretoCABOT MICROELECTRONICS CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →