US2005101228A1PendingUtilityA1

Polishing pad comprising biodegradable polymer

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Assignee: CABOT MICROELECTRONICS CORPPriority: Nov 10, 2003Filed: Nov 10, 2003Published: May 12, 2005
Est. expiryNov 10, 2023(expired)· nominal 20-yr term from priority
Inventors:Abaneshwar Prasad
B24B 37/205B24B 37/24B24B 37/22
38
PatentIndex Score
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Claims

Abstract

The invention is directed to a polishing pad for use in chemical-mechanical polishing comprising a biodegradable polymer. The biodegradable polymer comprises a repeat unit selected from the group consisting of glycolic acid, lactic acid, hydroxyalkanoic acids, hydroxybutyric acid, hydroxyvaleric acid, caprolactone, p-dioxanone, trimethylene carbonate, butylene succinate, butylene adipate, monosaccharides, dicarboxylic acid anhydrides, enantiomers thereof, and combinations thereof. The invention is further directed to methods of its use.

Claims

exact text as granted — not AI-modified
1 . A polishing pad for use in chemical-mechanical polishing comprising a substantially transparent portion and a biodegradable polymer, wherein the biodegradable polymer comprises a repeat unit selected from the group consisting of glycolic acid, lactic acid, hydroxy alkanoic acids, hydroxybutyric acid, hydroxyvaleric acid, caprolactone, p-dioxanone, trimethylene carbonate, butylene succinate, butylene adipate, monosaccharides, dicarboxylic acid anhydrides, enantiomers thereof, and combinations thereof.  
     
     
         2 . The polishing pad of  claim 1 , wherein the biodegradable polymer comprises a repeat unit selected from the group consisting of L-lactic acid, D-lactic acid, or a combination thereof.  
     
     
         3 . The polishing pad of  claim 1 , wherein the biodegradable polymer is cross-linked.  
     
     
         4 . The polishing pad of  claim 1 , wherein the biodegradable polymer is selected from the group consisting of polyglycolide, polycaprolactone, poly(dioxanone), poly(trimethylene carbonate), polyglyconate, polyhydroxybutyrate, polyhydroxyvalerate, polysaccharides, poly(1,4-butylene succinate), poly(1,4-butylene adipate), polyanhydrides, polyorthoesters, and combinations thereof.  
     
     
         5 . The polishing pad of  claim 1 , wherein the biodegradable polymer is selected from the group consisting of DL-polylactide, D-polylactide, L-polylactide, poly(DL-lactide-co-glycolide), poly(ethylene glycol-co-lactide), poly(L-lactide-co-caprolactone-co-glycolide), and combinations thereof.  
     
     
         6 . The polishing pad of  claim 1 , wherein the substantially transparent portion has a light transmittance of about 10% or more at a wavelength in the range of about 200 nm to about 10,000 nm.  
     
     
         7 . The polishing pad of  claim 1 , wherein the substantially transparent portion comprises the biodegradable polymer.  
     
     
         8 . The polishing pad of  claim 1 , wherein the polishing pad further comprises abrasive particles.  
     
     
         9 . The polishing pad of  claim 8 , wherein the abrasive particles are selected from metal oxide particles, boron nitride particles, diamond particles, ceramic particles, and combinations thereof.  
     
     
         10 . The polishing pad of  claim 8 , wherein the abrasive particles are disposed on a polishing surface of the polishing pad or are dispersed throughout the body of the polishing pad.  
     
     
         11 . The polishing pad of  claim 1 , wherein the biodegradable polymer is present as a nonwoven web.  
     
     
         12 . The polishing pad of  claim 11 , wherein the nonwoven web is coated with abrasive particles, fillers, UV-absorbers, heat stabilizers, oxidation stabilizers, or a combination thereof.  
     
     
         13 . The polishing pad of  claim 11 , wherein agglomerated abrasive particles are adhered to the nonwoven web with a binder.  
     
     
         14 . The polishing pad of  claim 11 , wherein the polishing pad comprises a polishing layer and a subpad layer, and the nonwoven web comprising the biodegradable polymer is present in a subpad layer.  
     
     
         15 . The polishing pad of  claim 1 , further comprising a polymer resin selected from the group consisting of thermoplastic elastomers, thermoplastic polyurethanes, thermoplastic polyolefins, polycarbonates, polyvinylalcohols, nylons, elastomeric rubbers, elastomeric polyethylenes, polytetrafluoroethylenes, polyethyleneterephthalates, polyimides, polyaramides, polyarylenes, polystyrenes, polymethylmethacrylic acids, polyethylene oxides, rubbers, copolymers thereof, and mixtures thereof.  
     
     
         16 . The polishing pad of  claim 1 , wherein the polishing pad is porous.  
     
     
         17 . A method of polishing a workpiece comprising 
 (i) providing a workpiece to be polished,    (ii) contacting the workpiece with a polishing system comprising the polishing pad of  claim 1  and a polishing composition, and    (iii) moving the polishing pad relative to the workpiece with the polishing composition therebetween to abrade the workpiece and thereby polish the workpiece.    
     
     
         18 . The method of  claim 17 , wherein the workpiece comprises a metal layer.  
     
     
         19 . The method of  claim 18 , wherein the metal layer comprises a metal selected from the group consisting of tantalum, aluminum, tungsten, titanium, platinum, iridium, rhodium, ruthenium, gold, silver, nickel, alloys thereof, oxides thereof, and combinations thereof.  
     
     
         20 . The method of  claim 18 , wherein the metal layer comprises copper.  
     
     
         21 . The method of  claim 20 , wherein the biodegradable polymer is a homopolymer, block copolymer, graft copolymer, or random copolymer comprising a repeat unit selected from the group consisting of glycolic acid, lactic acid, hydroxyalkanoic acids, hydroxybutyric acid, hydroxyvaleric acid, caprolactone, p-dioxanone, trimethylene carbonate, butylene succinate, butylene adipate, monosaccharides, dicarboxylic acid anhydrides, enantiomers thereof, and combinations thereof.  
     
     
         22 . The method of  claim 21 , wherein the biodegradable polymer comprises a repeat unit selected from the group consisting of L-lactic acid, D-lactic acid, or a combination thereof.  
     
     
         23 . The method of  claim 21 , wherein the biodegradable polymer is cross-linked.  
     
     
         24 . The method of  claim 23 , further comprising abrasive particles.  
     
     
         25 . The method of  claim 20 , further comprising a polymer resin selected from thermoplastic elastomers, thermoplastic polyurethanes, thermoplastic polyolefins, polycarbonates, polyvinylalcohols, nylons, elastomeric rubbers, elastomeric polyethylenes, polytetrafluoroethylenes, polyethyleneterephthalates, polyimides, polyaramides, polyarylenes, polystyrenes, polymethylmethacrylic acids, polyethylene oxides, rubbers, copolymers thereof, and mixtures thereof.  
     
     
         26 . The method of  claim 17 , wherein the polishing composition comprises about 2 wt. % or less complexing agent.  
     
     
         27 . The method of  claim 26 , wherein the polishing composition comprises about 0.1 wt. % or less complexing agent.

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