Inventor · disambiguated record
Yongsik Moon
Also filed as: MOON YONGSIK
7 granted patents·3 pending applications·63 citations·filing 2001–2024
84Inventor score
Files withAPPLIED MATERIALS INC3DUBOUST ALAIN2GLOBALFOUNDRIES INC2CHOI JIHONG1EHWA DIAMOND INDUSTRIAL COMPANY LTD1
Top patents by PatentIndex Score
10 records- 0187US9153693B2FinFET gate with insulated vias and method of making sameGLOBALFOUNDRIES INC·Filed 2013·Granted Oct 6, 2015·9 cites·17 claims
- 0283US8066552B2Multi-layer polishing pad for low-pressure polishingDUBOUST ALAIN·Filed 2005·Granted Nov 29, 2011·10 cites·31 claims
- 0382US7070480B2Method and apparatus for polishing substratesAPPLIED MATERIALS INC·Filed 2002·Granted Jul 4, 2006·24 cites·13 claims
- 0471US6790768B2Methods and apparatus for polishing substrates comprising conductive and dielectric materials with reduced topographical defectsAPPLIED MATERIALS INC·Filed 2001·Granted Sep 14, 2004·13 cites·40 claims
- 0565US2025058430A1Cmp conditioning disc and method of manufacturing the cmp conditioning discEHWA DIAMOND INDUSTRIAL COMPANY LTD·Filed 2024·Application pending·0 cites
- 0659US6960521B2Method and apparatus for polishing metal and dielectric substratesAPPLIED MATERIALS INC·Filed 2004·Granted Nov 1, 2005·6 cites·34 claims
- 0758US8241927B2Methods relating to capacitive monitoring of layer characteristics during back end-of the-line processingCHOI JIHONG·Filed 2009·Granted Aug 14, 2012·1 cites·20 claims
- 0849US2010267318A1Polishing pad with projecting portionDUBOUST ALAIN·Filed 2010·Application pending·0 cites
- 0942US8962407B2Method and device to achieve self-stop and precise gate heightYU HONG·Filed 2012·Granted Feb 24, 2015·0 cites·14 claims
- 1042US2015093877A1Method for manufacturing a semiconductor device by stopping planarization of insulating material on finsGLOBALFOUNDRIES INC·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →