US2010267318A1PendingUtilityA1
Polishing pad with projecting portion
Est. expiryOct 3, 2023(expired)· nominal 20-yr term from priority
B24D 11/02B24B 37/22B24B 37/046B24B 37/26B24B 37/205B24B 37/013
49
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Claims
Abstract
A polishing pad include a polishing layer having a polishing surface and a backing layer on a side of the polishing layer opposite the polishing surface. An outer edge of the polishing layer overhangs an outer edge of the backing layer.
Claims
exact text as granted — not AI-modified1 . A polishing pad, comprising:
a polishing layer having a polishing surface; and a backing layer on a side of the polishing layer opposite the polishing surface, wherein an outer edge of the polishing layer overhangs an outer edge of the backing layer.
2 . The polishing pad of claim 1 , wherein the polishing layer and backing layer are substantially circular, and wherein a diameter of the backing layer is less than a diameter of the polishing layer.
3 . The polishing pad of claim 1 , wherein the backing layer is more compressible than the polishing layer.
4 . The polishing pad of claim 1 , wherein the outer edge of the polishing layer overhangs the outer edge of the backing layer by about one-quarter inch.
5 . The polishing pad of claim 1 , wherein the polishing layer and backing layer are secured by an adhesive.
6 . The polishing pad of claim 1 , wherein the polishing layer comprises polyurethane with embedded hollow microspheres.
7 . The polishing pad of claim 1 , wherein the backing layer comprises polyurethane impregnated polyester felt.Join the waitlist — get patent alerts
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