US2010267318A1PendingUtilityA1

Polishing pad with projecting portion

Assignee: DUBOUST ALAINPriority: Oct 3, 2003Filed: Jun 25, 2010Published: Oct 21, 2010
Est. expiryOct 3, 2023(expired)· nominal 20-yr term from priority
B24D 11/02B24B 37/22B24B 37/046B24B 37/26B24B 37/205B24B 37/013
49
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

A polishing pad include a polishing layer having a polishing surface and a backing layer on a side of the polishing layer opposite the polishing surface. An outer edge of the polishing layer overhangs an outer edge of the backing layer.

Claims

exact text as granted — not AI-modified
1 . A polishing pad, comprising:
 a polishing layer having a polishing surface; and   a backing layer on a side of the polishing layer opposite the polishing surface, wherein an outer edge of the polishing layer overhangs an outer edge of the backing layer.   
     
     
         2 . The polishing pad of  claim 1 , wherein the polishing layer and backing layer are substantially circular, and wherein a diameter of the backing layer is less than a diameter of the polishing layer. 
     
     
         3 . The polishing pad of  claim 1 , wherein the backing layer is more compressible than the polishing layer. 
     
     
         4 . The polishing pad of  claim 1 , wherein the outer edge of the polishing layer overhangs the outer edge of the backing layer by about one-quarter inch. 
     
     
         5 . The polishing pad of  claim 1 , wherein the polishing layer and backing layer are secured by an adhesive. 
     
     
         6 . The polishing pad of  claim 1 , wherein the polishing layer comprises polyurethane with embedded hollow microspheres. 
     
     
         7 . The polishing pad of  claim 1 , wherein the backing layer comprises polyurethane impregnated polyester felt.

Join the waitlist — get patent alerts

Track US2010267318A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.