Inventor · disambiguated record
Abhijit Basu Mallick
Also filed as: MALLICK ABHIJIT · MALLICK ABHIJIT B · MALLICK ABHIJIT BASU
217 granted patents·97 pending applications·4,655 citations·filing 2006–2025
99Inventor score
Files withAPPLIED MATERIALS INC290MALLICK ABHIJIT BASU6MICROMATERIALS LLC6WANG LINLIN3UNDERWOOD BRIAN S2
Top patents by PatentIndex Score
314 records- 0199US9583333B2Low temperature silicon nitride films using remote plasma CVD technologyAPPLIED MATERIALS INC·Filed 2014·Granted Feb 28, 2017·339 cites·12 claims
- 0298US10886172B2Methods for wordline separation in 3D-NAND devicesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 5, 2021·8 cites·20 claims
- 0398US10083834B2Methods of forming self-aligned viasAPPLIED MATERIALS INC·Filed 2017·Granted Sep 25, 2018·64 cites·15 claims
- 0498US9514932B2Flowable carbon for semiconductor processingAPPLIED MAT·Filed 2013·Granted Dec 6, 2016·479 cites·20 claims
- 0598US9362107B2Flowable low-k dielectric gapfill treatmentAPPLIED MATERIALS INC·Filed 2014·Granted Jun 7, 2016·430 cites·14 claims
- 0698US8871656B2Flowable films using alternative silicon precursorsAPPLIED MATERIALS INC·Filed 2013·Granted Oct 28, 2014·49 cites·9 claims
- 0798US8465903B2Radiation patternable CVD filmWEIDMAN TIMOTHY W·Filed 2011·Granted Jun 18, 2013·450 cites·20 claims
- 0898US8466073B2Capping layer for reduced outgassingWANG LINLIN·Filed 2012·Granted Jun 18, 2013·146 cites·19 claims
- 0998US8242031B2High quality silicon oxide films by remote plasma CVD from disilane precursorsMALLICK ABHIJIT BASU·Filed 2010·Granted Aug 14, 2012·570 cites·8 claims
- 1098US8211808B2Silicon-selective dry etch for carbon-containing filmsSAPRE KEDAR·Filed 2009·Granted Jul 3, 2012·225 cites·30 claims
- 1198US7867923B2High quality silicon oxide films by remote plasma CVD from disilane precursorsAPPLIED MATERIALS INC·Filed 2007·Granted Jan 11, 2011·106 cites·16 claims
- 1298US7825044B2Curing methods for silicon dioxide multi-layersAPPLIED MATERIALS INC·Filed 2010·Granted Nov 2, 2010·55 cites·20 claims
- 1398US7745352B2Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp II processAPPLIED MATERIALS INC·Filed 2007·Granted Jun 29, 2010·57 cites·19 claims
- 1498US7541297B2Method and system for improving dielectric film quality for void free gap fillAPPLIED MATERIALS INC·Filed 2007·Granted Jun 2, 2009·664 cites·7 claims
- 1598US7498273B2Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processesAPPLIED MATERIALS INC·Filed 2006·Granted Mar 3, 2009·105 cites·37 claims
- 1697US10636669B2Seam healing using high pressure annealAPPLIED MATERIALS INC·Filed 2019·Granted Apr 28, 2020·15 cites·20 claims
- 1797US10319600B1Thermal silicon etchAPPLIED MATERIALS INC·Filed 2018·Granted Jun 11, 2019·34 cites·20 claims
- 1897US10319604B2Methods for self-aligned patterningAPPLIED MATERIALS INC·Filed 2017·Granted Jun 11, 2019·20 cites·19 claims
- 1997US10319636B2Deposition and treatment of films for patterningAPPLIED MATERIALS INC·Filed 2017·Granted Jun 11, 2019·21 cites·16 claims
- 2097US10017856B1Flowable gapfill using solventsAPPLIED MATERIALS INC·Filed 2017·Granted Jul 10, 2018·340 cites·10 claims
- 2197US9412613B2Development of high etch selective hardmask material by ion implantation into amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2014·Granted Aug 9, 2016·54 cites·10 claims
- 2297US7943531B2Methods for forming a silicon oxide layer over a substrateAPPLIED MATERIALS INC·Filed 2007·Granted May 17, 2011·67 cites·26 claims
- 2396US10529585B2Dry stripping of boron carbide hardmaskAPPLIED MATERIALS INC·Filed 2018·Granted Jan 7, 2020·19 cites·20 claims
- 2496US10354916B2Methods for wordline separation in 3D-NAND devicesAPPLIED MATERIALS INC·Filed 2018·Granted Jul 16, 2019·12 cites·20 claims
- 2595US10622251B2Methods for wordline separation in 3D-NAND devicesAPPLIED MATERIALS INC·Filed 2019·Granted Apr 14, 2020·8 cites·13 claims
- 2695US10607841B2Silicide films through selective depositionAPPLIED MATERIALS INC·Filed 2018·Granted Mar 31, 2020·4 cites·20 claims
- 2795US10480074B2Apparatus for radical-based deposition of dielectric filmsAPPLIED MATERIALS INC·Filed 2017·Granted Nov 19, 2019·15 cites·20 claims
- 2895US8304351B2In-situ ozone cure for radical-component CVDWANG LINLIN·Filed 2010·Granted Nov 6, 2012·26 cites·18 claims
- 2994US11550222B2Dose reduction of patterned metal oxide photoresistsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·3 cites·20 claims
- 3094US10886140B23D NAND etchAPPLIED MATERIALS INC·Filed 2019·Granted Jan 5, 2021·9 cites·19 claims
- 3194US10236197B2Processing system containing an isolation region separating a deposition chamber from a treatment chamberAPPLIED MATERIALS INC·Filed 2015·Granted Mar 19, 2019·11 cites·20 claims
- 3293US11545354B2Molecular layer deposition method and systemAPPLIED MATERIALS INC·Filed 2020·Granted Jan 3, 2023·3 cites·20 claims
- 3393US10410869B2CVD based oxide-metal multi structure for 3D NAND memory devicesAPPLIED MATERIALS INC·Filed 2017·Granted Sep 10, 2019·8 cites·17 claims
- 3493US10192775B2Methods for gapfill in high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2017·Granted Jan 29, 2019·7 cites·13 claims
- 3591US11557466B2Tuneable uniformity control utilizing rotational magnetic housingAPPLIED MATERIALS INC·Filed 2020·Granted Jan 17, 2023·2 cites·15 claims
- 3691US10636659B2Selective deposition for simplified process flow of pillar formationAPPLIED MATERIALS INC·Filed 2018·Granted Apr 28, 2020·7 cites·9 claims
- 3791US10460933B2Two-step process for gapfilling high aspect ratio trenches with amorphous silicon filmAPPLIED MATERIALS INC·Filed 2018·Granted Oct 29, 2019·5 cites·20 claims
- 3891US9508545B2Selectively lateral growth of silicon oxide thin filmAPPLIED MATERIALS INC·Filed 2015·Granted Nov 29, 2016·6 cites·12 claims
- 3991US9390914B2Wet oxidation process performed on a dielectric material formed from a flowable CVD processWANG LINLIN·Filed 2012·Granted Jul 12, 2016·10 cites·7 claims
- 4090US11615966B2Flowable film formation and treatmentsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·19 claims
- 4190US10626495B2Bottom-up growth of silicon oxide and silicon nitride using sequential deposition-etch-treat processingAPPLIED MATERIALS INC·Filed 2018·Granted Apr 21, 2020·2 cites·20 claims
- 4290US10424507B2Fully self-aligned viaMICROMATERIALS LLC·Filed 2017·Granted Sep 24, 2019·5 cites·13 claims
- 4390US9840777B2Apparatus for radical-based deposition of dielectric filmsAPPLIED MATERIALS INC·Filed 2014·Granted Dec 12, 2017·4 cites·20 claims
- 4490US8753985B2Molecular layer deposition of silicon carbideAPPLIED MATERIALS INC·Filed 2012·Granted Jun 17, 2014·11 cites·18 claims
- 4589US11946134B2In situ nucleation for nanocrystalline diamond film depositionAPPLIED MATERIALS INC·Filed 2022·Granted Apr 2, 2024·1 cites·14 claims
- 4689US10745282B2Diamond-like carbon filmAPPLIED MATERIALS INC·Filed 2018·Granted Aug 18, 2020·4 cites·13 claims
- 4788US10559465B2Pre-treatment approach to improve continuity of ultra-thin amorphous silicon film on silicon oxideAPPLIED MATERIALS INC·Filed 2018·Granted Feb 11, 2020·5 cites·20 claims
- 4888US10410872B2Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask applicationAPPLIED MATERIALS INC·Filed 2017·Granted Sep 10, 2019·5 cites·16 claims
- 4988US9991118B2Hybrid carbon hardmask for lateral hardmask recess reductionAPPLIED MATERIALS INC·Filed 2017·Granted Jun 5, 2018·4 cites·19 claims
- 5088US9865459B2Plasma treatment to improve adhesion between hardmask film and silicon oxide filmAPPLIED MATERIALS INC·Filed 2016·Granted Jan 9, 2018·5 cites·21 claims
Showing the top 50 of 314 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →