Inventor · disambiguated record
Derek R. Witty
Also filed as: WITTY DEREK · WITTY DEREK R
39 granted patents·25 pending applications·2,300 citations·filing 1996–2024
98Inventor score
Top patents by PatentIndex Score
64 records- 0198US8445075B2Method to minimize wet etch undercuts and provide pore sealing of extreme low k (k<2.5) dielectricsXU HUIWEN·Filed 2010·Granted May 21, 2013·517 cites·10 claims
- 0298US8138104B2Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cureBALSEANU MIHAELA·Filed 2007·Granted Mar 20, 2012·479 cites·18 claims
- 0398US7018941B2Post treatment of low k dielectric filmsAPPLIED MATERIALS INC·Filed 2004·Granted Mar 28, 2006·674 cites·20 claims
- 0497US7871926B2Methods and systems for forming at least one dielectric layerAPPLIED MATERIALS INC·Filed 2007·Granted Jan 18, 2011·77 cites·17 claims
- 0596US9721784B2Ultra-conformal carbon film depositionAPPLIED MATERIALS INC·Filed 2014·Granted Aug 1, 2017·29 cites·16 claims
- 0695US7112541B2In-situ oxide capping after CVD low k depositionAPPLIED MATERIALS INC·Filed 2004·Granted Sep 26, 2006·64 cites·20 claims
- 0795US6465051B1Method of operating high density plasma CVD reactor with combined inductive and capacitive couplingAPPLIED MATERIALS INC·Filed 1996·Granted Oct 15, 2002·221 cites·28 claims
- 0892US8148269B2Boron nitride and boron-nitride derived materials deposition methodBALSEANU MIHAELA·Filed 2009·Granted Apr 3, 2012·22 cites·5 claims
- 0992US7425716B2Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to a large area electron beamAPPLIED MATERIALS INC·Filed 2006·Granted Sep 16, 2008·14 cites·27 claims
- 1089US10074534B2Ultra-conformal carbon film depositionAPPLIED MATERIALS INC·Filed 2017·Granted Sep 11, 2018·5 cites·9 claims
- 1189US7867578B2Method for depositing an amorphous carbon film with improved density and step coverageAPPLIED MATERIALS INC·Filed 2006·Granted Jan 11, 2011·12 cites·14 claims
- 1287US8337950B2Method for depositing boron-rich films for lithographic mask applicationsNGUYEN VICTOR·Filed 2010·Granted Dec 25, 2012·9 cites·17 claims
- 1386US8084105B2Method of depositing boron nitride and boron nitride-derived materialsHUH JEONG-UK·Filed 2007·Granted Dec 27, 2011·8 cites·17 claims
- 1486US7670924B2Air gap integration schemeAPPLIED MATERIALS INC·Filed 2008·Granted Mar 2, 2010·22 cites·18 claims
- 1585US8586487B2Low temperature plasma enhanced chemical vapor deposition of conformal silicon carbon nitride and silicon nitride filmsNGUYEN VICTOR·Filed 2012·Granted Nov 19, 2013·7 cites·20 claims
- 1685US8389376B2Air gap integration schemeDEMOS ALEXANDROS T·Filed 2010·Granted Mar 5, 2013·4 cites·20 claims
- 1785US7501354B2Formation of low K material utilizing process having readily cleaned by-productsAPPLIED MATERIALS INC·Filed 2005·Granted Mar 10, 2009·6 cites·10 claims
- 1884US8282734B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsPADHI DEENESH·Filed 2008·Granted Oct 9, 2012·6 cites·8 claims
- 1984US7166544B2Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursorsAPPLIED MATERIALS INC·Filed 2004·Granted Jan 23, 2007·20 cites·22 claims
- 2083US7790635B2Method to increase the compressive stress of PECVD dielectric filmsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 7, 2010·8 cites·24 claims
- 2183US7704816B2Boron derived materials deposition methodAPPLIED MATERIALS INC·Filed 2008·Granted Apr 27, 2010·8 cites·12 claims
- 2282US7611996B2Multi-stage curing of low K nano-porous filmsAPPLIED MATERIALS INC·Filed 2005·Granted Nov 3, 2009·10 cites·7 claims
- 2382US7547643B2Techniques promoting adhesion of porous low K film to underlying barrier layerAPPLIED MATERIALS INC·Filed 2005·Granted Jun 16, 2009·6 cites·17 claims
- 2481US8679987B2Deposition of an amorphous carbon layer with high film density and high etch selectivityREILLY PATRICK·Filed 2012·Granted Mar 25, 2014·7 cites·20 claims
- 2581US7816205B2Method of forming non-volatile memory having charge trap layer with compositional gradientAPPLIED MATERIALS INC·Filed 2008·Granted Oct 19, 2010·5 cites·21 claims
- 2679US7514125B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2007·Granted Apr 7, 2009·2 cites·7 claims
- 2777US6413871B2Nitrogen treatment of polished halogen-doped silicon glassAPPLIED MATERIALS INC·Filed 1999·Granted Jul 2, 2002·40 cites·18 claims
- 2874US9984868B2PEALD of films comprising silicon nitrideNGUYEN VICTOR·Filed 2014·Granted May 29, 2018·3 cites·11 claims
- 2973US8563090B2Boron film interface engineeringBALSEANU MIHAELA·Filed 2009·Granted Oct 22, 2013·5 cites·11 claims
- 3071US8252653B2Method of forming a non-volatile memory having a silicon nitride charge trap layerBALSEANU MIHAELA·Filed 2008·Granted Aug 28, 2012·2 cites·23 claims
- 3167US2024139900A1Acoustic carrier head monitoringAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3266US9337072B2Apparatus and method for substrate clamping in a plasma chamberBALASUBRAMANIAN GANESH·Filed 2010·Granted May 10, 2016·2 cites·12 claims
- 3366US8758638B2Copper oxide removal techniquesYE WEIFENG·Filed 2011·Granted Jun 24, 2014·3 cites·24 claims
- 3466US7964442B2Methods to obtain low k dielectric barrier with superior etch resistivityAPPLIED MATERIALS INC·Filed 2007·Granted Jun 21, 2011·2 cites·3 claims
- 3563US8598020B2Plasma-enhanced chemical vapor deposition of crystalline germaniumNGUYEN VICTOR·Filed 2010·Granted Dec 3, 2013·1 cites·29 claims
- 3662US7802538B2Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursorsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 28, 2010·0 cites·13 claims
- 3762US2022193858A1Adaptive slurry dispense systemAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3861US2012204795A1Methods to improve the in-film defectivity of pecvd amorphous carbon filmsPADHI DEENESH·Filed 2012·Application pending·0 cites
- 3959US2025319570A1Contact cleaning units in cmp polisherAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4058US10236182B2Conformal amorphous carbon for spacer and spacer protection applicationsAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·0 cites·10 claims
- 4158US8501568B2Method of forming flash memory with ultraviolet treatmentBALSEANU MIHAELA·Filed 2008·Granted Aug 6, 2013·0 cites·20 claims
- 4255US9570303B2Conformal amorphous carbon for spacer and spacer protection applicationsAPPLIED MATERIALS INC·Filed 2015·Granted Feb 14, 2017·0 cites·17 claims
- 4355US2014349490A1Conformal amorphous carbon for spacer and spacer protection applicationsAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 4453US2008254233A1Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processesLEE KWANGDUK DOUGLAS·Filed 2007·Application pending·0 cites
- 4552US2008084650A1Apparatus and method for substrate clamping in a plasma chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 4652US2008099920A1Multi-stage curing of low k nano-porous filmsAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 4752US2013189845A1Conformal amorphous carbon for spacer and spacer protection applicationsKIM SUNGJIN·Filed 2012·Application pending·0 cites
- 4851US2007287301A1Method to minimize wet etch undercuts and provide pore sealing of extreme low k (k<2.5) dielectricsXU HUIWEN·Filed 2007·Application pending·0 cites
- 4951US2009107626A1Adhesion improvement of dielectric barrier to copper by the addition of thin interface layerAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 5048US2012196450A1Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ uv cureBALSEANU MIHAELA·Filed 2012·Application pending·0 cites
Showing the top 50 of 64 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →