Inventor · disambiguated record
Takako Takehara
Also filed as: TAKEHARA TAKAKO
19 granted patents·9 pending applications·236 citations·filing 1994–2009
95Inventor score
Files withAPPLIED MATERIALS INC20APPLIED KOMATSU TECHNOLOGY INC3APPLIED TECHNOLOGY INC1KURITA SHINICHI1TAKEHARA TAKAKO1
Top patents by PatentIndex Score
28 records- 0194US7432201B2Hybrid PVD-CVD systemAPPLIED MATERIALS INC·Filed 2005·Granted Oct 7, 2008·32 cites·22 claims
- 0288US6451390B1Deposition of TEOS oxide using pulsed RF plasmaAPPLIED MATERIALS INC·Filed 2000·Granted Sep 17, 2002·27 cites·5 claims
- 0382US7655542B2Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic deviceAPPLIED MATERIALS INC·Filed 2006·Granted Feb 2, 2010·6 cites·34 claims
- 0481US7086918B2Low temperature process for passivation applicationsAPPLIED MATERIALS INC·Filed 2002·Granted Aug 8, 2006·34 cites·29 claims
- 0576US7915114B2Low temperature process for TFT fabricationAPPLIED MATERIALS INC·Filed 2007·Granted Mar 29, 2011·6 cites·22 claims
- 0673US6962732B2Process for controlling thin film uniformity and products produced therebyAPPLIED MATERIALS INC·Filed 2001·Granted Nov 8, 2005·10 cites·39 claims
- 0770US5441768AMulti-step chemical vapor deposition method for thin film transistorsAPPLIED MATERIALS INC·Filed 1994·Granted Aug 15, 1995·28 cites·17 claims
- 0868US8114484B2Plasma enhanced chemical vapor deposition technology for large-size processingYANG YA-TANG·Filed 2007·Granted Feb 14, 2012·3 cites·24 claims
- 0968US6610374B2Method of annealing large area glass substratesAPPLIED MATERIALS INC·Filed 2001·Granted Aug 26, 2003·11 cites·14 claims
- 1068US6610354B2Plasma display panel with a low k dielectric layerAPPLIED MATERIALS INC·Filed 2001·Granted Aug 26, 2003·6 cites·37 claims
- 1159US7923354B2Methods for depositing a microcrystalline silicon film for a photovoltaic deviceAPPLIED MATERIALS INC·Filed 2009·Granted Apr 12, 2011·0 cites·20 claims
- 1258US7648892B2Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic deviceAPPLIED MATERIALS INC·Filed 2008·Granted Jan 19, 2010·0 cites·16 claims
- 1356US6172322B1Annealing an amorphous film using microwave energyAPPLIED TECHNOLOGY INC·Filed 1997·Granted Jan 9, 2001·25 cites·3 claims
- 1456US2010075453A1System architecture and method for solar panel formationAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 1556US2005233155A1Process for controlling thin film uniformity and products produced therebyAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1655US7300829B2Low temperature process for TFT fabricationAPPLIED MATERIALS INC·Filed 2003·Granted Nov 27, 2007·6 cites·30 claims
- 1755US7122962B2Plasma display panel with a low K dielectric layerAPPLIED MATERIALS INC·Filed 2003·Granted Oct 17, 2006·2 cites·32 claims
- 1854US6827987B2Method of reducing an electrostatic charge on a substrate during a PECVD processAPPLIED MATERIALS INC·Filed 2001·Granted Dec 7, 2004·1 cites·29 claims
- 1954US6294219B1Method of annealing large area glass substratesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Sep 25, 2001·17 cites·7 claims
- 2051US2007281090A1System architecture and method for solar panel formationKURITA SHINICHI·Filed 2007·Application pending·0 cites
- 2150US2007254112A1Apparatus and method for high utilization of process chambers of a cluster system through staggered plasma cleaningAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2247US6352910B1Method of depositing amorphous silicon based films having controlled conductivityAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Mar 5, 2002·13 cites·61 claims
- 2346US5567476AMulti-step chemical vapor deposition method for thin film transistorsAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted Oct 22, 1996·9 cites·4 claims
- 2445US2002192475A1Deposition of TEOS oxide using pulsed RF plasmaFiled 2002·Application pending·0 cites
- 2544US2008025821A1Octagon transfer chamberAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2641US2007017445A1Hybrid PVD-CVD systemTAKEHARA TAKAKO·Filed 2005·Application pending·0 cites
- 2740US2007048451A1Substrate movement and process chamber schedulingAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2839US2002115269A1Method of depositing amorphous silicon based films having controlled conductivityAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
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