Inventor · disambiguated record
Takashi Shigeoka
Also filed as: SHIGEOKA TAKASHI
16 granted patents·18 pending applications·288 citations·filing 2000–2019
94Inventor score
Top patents by PatentIndex Score
34 records- 0194US6479801B1Temperature measuring method, temperature control method and processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 12, 2002·87 cites·7 claims
- 0293US6437290B1Heat treatment apparatus having a thin light-transmitting windowTOKYO ELECTRON LTD·Filed 2001·Granted Aug 20, 2002·48 cites·30 claims
- 0389US8907318B2Resistance change memorySONEHARA TAKESHI·Filed 2012·Granted Dec 9, 2014·6 cites·10 claims
- 0488US7717061B2Gas switching mechanism for plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted May 18, 2010·20 cites·9 claims
- 0585US8759806B2Semiconductor memory deviceYAMAGUCHI TAKESHI·Filed 2011·Granted Jun 24, 2014·7 cites·19 claims
- 0684US6876816B2Heating device, heat treatment apparatus having the heating device and method for controlling heat treatmentTOKYO ELECTRON LTD·Filed 2001·Granted Apr 5, 2005·30 cites·29 claims
- 0780US6891131B2Thermal processing systemTOKYO ELECTRON LTD·Filed 2001·Granted May 10, 2005·25 cites·11 claims
- 0870US6825615B2Lamp having a high-reflectance film for improving directivity of light and heat treatment apparatus having such a lampTOKYO ELECTRON LTD·Filed 2001·Granted Nov 30, 2004·14 cites·8 claims
- 0969US6641302B2Thermal process apparatus for a semiconductor substrateTOKYO ELECTRON LTD·Filed 2001·Granted Nov 4, 2003·13 cites·6 claims
- 1068US8576606B2Nonvolatile semiconductor memory deviceKUNITAKE TETSUJI·Filed 2011·Granted Nov 5, 2013·4 cites·10 claims
- 1168US6488407B1Radiation temperature measuring method and radiation temperature measuring systemTOKYO ELECTRON LTD·Filed 2000·Granted Dec 3, 2002·14 cites·4 claims
- 1266US6467952B2Virtual blackbody radiation system and radiation temperature measuring systemTOKYO ELECTRON LTD·Filed 2000·Granted Oct 22, 2002·12 cites·9 claims
- 1361US2007160757A1Processing methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1456US6860634B2Temperature measuring method, heat treating device and method, computer program, and radiation thermometerTOKYO ELECTRON LTD·Filed 2001·Granted Mar 1, 2005·6 cites·9 claims
- 1555US2009214758A1A processing method for processing a substrate placed on a placement stage in a process chamberTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1650US2010315857A1Resistance change memorySONEHARA TAKESHI·Filed 2010·Application pending·0 cites
- 1750US2009124080A1Semiconductor device that is advantageous in microfabrication and method of manufacturing the sameSHIGEOKA TAKASHI·Filed 2009·Application pending·0 cites
- 1848US2004250765A1Processing apparatusTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 1947US2015085562A1Resistance change memoryTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2046US6534749B2Thermal process apparatus for measuring accurate temperature by a radiation thermometerTOKYO ELECTRON LTD·Filed 2001·Granted Mar 18, 2003·1 cites·6 claims
- 2146US2007138593A1Semiconductor device that is advantageous in microfabrication and method of manufacturing the sameSHIGEOKA TAKASHI·Filed 2006·Application pending·0 cites
- 2245US2011233509A1Nonvolatile memory deviceTOSHIBA KK·Filed 2011·Application pending·0 cites
- 2344US2012217461A1Semiconductor memory device and method of manufacturing the sameKOBAYASHI SHIGEKI·Filed 2012·Application pending·0 cites
- 2443US10896891B2Semiconductor deviceTOSHIBA MEMORY CORP·Filed 2019·Granted Jan 19, 2021·0 cites·20 claims
- 2542US8075698B2Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processingKANNAN HIROSHI·Filed 2003·Granted Dec 13, 2011·1 cites·19 claims
- 2642US2004081757A1Substrate treatment device, substrate treatment method, and cleaning method for substrate treatment deviceTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 2742US2008290396A1Semiconductor memoryMATSUNAGA YASUHIKO·Filed 2008·Application pending·0 cites
- 2842US2006068104A1Thin-film formation in semiconductor device fabrication process and film deposition apparatusTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2942US2006154383A1Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 3039US2004042152A1Processing apparatus having a support member made of metal matrix composite between a process chamber and a title placement stageTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 3139US2008241385A1Method of Forming Thin Film, Thin Film Forming Apparatus, Program and Computer-Readable Information Recording MediumTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3238US2006091556A1Semiconductor device and its manufacturing methodSHIGEOKA TAKASHI·Filed 2005·Application pending·0 cites
- 3335US2011068314A1Semiconductor memory deviceTOSHIBA KK·Filed 2010·Application pending·0 cites
- 3434US2011233502A1Nonvolatile memory deviceTOSHIBA KK·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →