Inventor · disambiguated record
Tom Ritzdorf
Also filed as: RITZDORF TOM L
8 granted patents·11 pending applications·166 citations·filing 1999–2014
87Inventor score
Top patents by PatentIndex Score
19 records- 0193US6632292B1Selective treatment of microelectronic workpiece surfacesSEMITOOL INC·Filed 2000·Granted Oct 14, 2003·62 cites·24 claims
- 0285US7429537B2Methods and apparatus for rinsing and dryingSEMITOOL INC·Filed 2005·Granted Sep 30, 2008·11 cites·15 claims
- 0385US7399713B2Selective treatment of microelectric workpiece surfacesSEMITOOL INC·Filed 2003·Granted Jul 15, 2008·26 cites·42 claims
- 0485US6413436B1Selective treatment of the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Jul 2, 2002·61 cites·17 claims
- 0584US8961771B2Electrolytic process using cation permeable barrierBASKARAN RAJESH·Filed 2012·Granted Feb 24, 2015·2 cites·15 claims
- 0684US8236159B2Electrolytic process using cation permeable barrierBASKARAN RAJESH·Filed 2006·Granted Aug 7, 2012·3 cites·38 claims
- 0768US2014209472A1Electrolytic process using cation permeable barrierAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 0861US8123926B2Electrolytic copper process using anion permeable barrierBASKARAN RAJESH·Filed 2006·Granted Feb 28, 2012·1 cites·48 claims
- 0950US2006163072A1Electrolytic process using anion permeable barrierSEMITOOL INC·Filed 2005·Application pending·0 cites
- 1048US8852417B2Electrolytic process using anion permeable barrierBASKARAN RAJESH·Filed 2012·Granted Oct 7, 2014·0 cites·25 claims
- 1148US2006157355A1Electrolytic process using anion permeable barrierSEMITOOL INC·Filed 2005·Application pending·0 cites
- 1247US2005233589A1Processes for removing residue from a workpieceAEGERTER BRIAN K·Filed 2005·Application pending·0 cites
- 1347US2005217707A1Selective processing of microelectronic workpiece surfacesAEGERTER BRIAN K·Filed 2005·Application pending·0 cites
- 1442US2006260946A1Copper electrolytic process using cation permeable barrierSEMITOOL INC·Filed 2006·Application pending·0 cites
- 1542US2006189129A1Method for applying metal features onto barrier layers using ion permeable barriersSEMITOOL INC·Filed 2006·Application pending·0 cites
- 1641US2002144973A1Selective treatment of the surface of a microelectronic workpieceSEMITOOL INC·Filed 2002·Application pending·0 cites
- 1741US2002168863A1Selective treatment of the surface of a microelectronic workpieceSEMITOOL INC·Filed 2002·Application pending·0 cites
- 1841US2004035448A1Selective treatment of microelectronic workpiece surfacesFiled 2003·Application pending·0 cites
- 1939US2005020001A1Selective treatment of the surface of a microelectronic workpieceFiled 2004·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →