Inventor · disambiguated record
Salvador P. Umotoy
Also filed as: UMOTOY SALVADOR · UMOTOY SALVADOR P
44 granted patents·11 pending applications·11,634 citations·filing 1986–2017
99Inventor score
Top patents by PatentIndex Score
55 records- 0199US6878206B2Lid assembly for a processing system to facilitate sequential deposition techniquesAPPLIED MATERIALS INC·Filed 2001·Granted Apr 12, 2005·715 cites·23 claims
- 0299US5362526APlasma-enhanced CVD process using TEOS for depositing silicon oxideAPPLIED MATERIALS INC·Filed 1991·Granted Nov 8, 1994·484 cites·15 claims
- 0399US5000113AThermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1986·Granted Mar 19, 1991·1.1k cites·19 claims
- 0499US4892753AProcess for PECVD of silicon oxide using TEOS decompositionAPPLIED MATERIALS INC·Filed 1988·Granted Jan 9, 1990·503 cites·12 claims
- 0599US4872947ACVD of silicon oxide using TEOS decomposition and in-situ planarization processAPPLIED MATERIALS INC·Filed 1988·Granted Oct 10, 1989·522 cites·14 claims
- 0698US6603269B1Resonant chamber applicator for remote plasma sourceAPPLIED MATERIALS INC·Filed 2000·Granted Aug 5, 2003·252 cites·7 claims
- 0798US6589352B1Self aligning non contact shadow ring process kitAPPLIED MATERIALS INC·Filed 1999·Granted Jul 8, 2003·566 cites·26 claims
- 0898US6461435B1Showerhead with reduced contact areaAPPLIED MATERIALS INC·Filed 2000·Granted Oct 8, 2002·600 cites·22 claims
- 0998US6379466B1Temperature controlled gas distribution plateAPPLIED MATERIALS INC·Filed 1994·Granted Apr 30, 2002·468 cites·2 claims
- 1098US6302964B1One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Oct 16, 2001·986 cites·15 claims
- 1198US6167834B1Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1992·Granted Jan 2, 2001·367 cites·5 claims
- 1298US6086677ADual gas faceplate for a showerhead in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Jul 11, 2000·1.1k cites·20 claims
- 1398US5766365ARemovable ring for controlling edge deposition in substrate processing apparatusAPPLIED MATERIALS INC·Filed 1995·Granted Jun 16, 1998·435 cites·16 claims
- 1497US6302965B1Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfacesAPPLIED MATERIALS INC·Filed 2000·Granted Oct 16, 2001·209 cites·16 claims
- 1597US5888304AHeater with shadow ring and purge above wafer surfaceAPPLIED MATERIALS INC·Filed 1996·Granted Mar 30, 1999·374 cites·28 claims
- 1696US8291857B2Apparatuses and methods for atomic layer depositionLAM HYMAN·Filed 2009·Granted Oct 23, 2012·375 cites·16 claims
- 1796US6375748B1Method and apparatus for preventing edge depositionAPPLIED MATERIALS INC·Filed 1999·Granted Apr 23, 2002·293 cites·24 claims
- 1896US6364954B2High temperature chemical vapor deposition chamberAPPLIED MATERIALS INC·Filed 1998·Granted Apr 2, 2002·342 cites·16 claims
- 1996US6079356AReactor optimized for chemical vapor deposition of titaniumAPPLIED MATERIALS INC·Filed 1998·Granted Jun 27, 2000·766 cites·23 claims
- 2095US8293015B2Apparatuses and methods for atomic layer depositionLAM HYMAN W H·Filed 2011·Granted Oct 23, 2012·21 cites·4 claims
- 2195US7175713B2Apparatus for cyclical deposition of thin filmsAPPLIED MATERIALS INC·Filed 2003·Granted Feb 13, 2007·110 cites·11 claims
- 2294US10280509B2Lid assembly for a processing system to facilitate sequential deposition techniquesAPPLIED MATERIALS INC·Filed 2017·Granted May 7, 2019·6 cites·18 claims
- 2394US6827815B2Showerhead assembly for a processing chamberAPPLIED MATERIALS INC·Filed 2002·Granted Dec 7, 2004·133 cites·20 claims
- 2494US5354715AThermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1992·Granted Oct 11, 1994·132 cites·16 claims
- 2592US8342119B2Self aligning non contact shadow ring process kitAPPLIED MATERIALS INC·Filed 2007·Granted Jan 1, 2013·11 cites·2 claims
- 2692US5906683ALid assembly for semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1996·Granted May 25, 1999·129 cites·24 claims
- 2791US6730175B2Ceramic substrate supportAPPLIED MATERIALS INC·Filed 2002·Granted May 4, 2004·76 cites·30 claims
- 2890US6223447B1Fastening device for a purge ringAPPLIED MATERIALS INC·Filed 2000·Granted May 1, 2001·50 cites·20 claims
- 2990US6206971B1Integrated temperature controlled exhaust and cold trap assemblyAPPLIED MATERIALS INC·Filed 1999·Granted Mar 27, 2001·90 cites·17 claims
- 3090US5755886AApparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processingAPPLIED MATERIALS INC·Filed 1995·Granted May 26, 1998·91 cites·28 claims
- 3188US7905959B2Lid assembly for a processing system to facilitate sequential deposition techniquesAPPLIED MATERIALS INC·Filed 2004·Granted Mar 15, 2011·27 cites·20 claims
- 3288USRE36623EProcess for PECVD of silicon oxide using TEOS decompositionAPPLIED MATERIALS INC·Filed 1996·Granted Mar 21, 2000·79 cites·13 claims
- 3387US8747556B2Apparatuses and methods for atomic layer depositionLAM HYMAN W H·Filed 2012·Granted Jun 10, 2014·3 cites·15 claims
- 3487US7705275B2Substrate support having brazed plates and resistance heaterAPPLIED MATERIALS INC·Filed 2006·Granted Apr 27, 2010·25 cites·13 claims
- 3586US6521292B1Substrate support including purge ring having inner edge aligned to wafer edgeAPPLIED MATERIALS INC·Filed 2000·Granted Feb 18, 2003·46 cites·19 claims
- 3686US5871811AMethod for protecting against deposition on a selected region of a substrateAPPLIED MATERIALS INC·Filed 1995·Granted Feb 16, 1999·69 cites·45 claims
- 3782US6503331B1Tungsten chamber with stationary heaterAPPLIED MATERIALS INC·Filed 2000·Granted Jan 7, 2003·18 cites·23 claims
- 3881US6517592B2Cold trap assemblyAPPLIED MATERIALS INC·Filed 2000·Granted Feb 11, 2003·21 cites·12 claims
- 3980US9017776B2Apparatuses and methods for atomic layer depositionAPPLIED MATERIALS INC·Filed 2012·Granted Apr 28, 2015·1 cites·6 claims
- 4079US6767176B2Lift pin actuating mechanism for semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2001·Granted Jul 27, 2004·22 cites·9 claims
- 4174US8123860B2Apparatus for cyclical depositing of thin filmsTHAKUR RANDHIR P S·Filed 2008·Granted Feb 28, 2012·4 cites·14 claims
- 4272US8231431B2Solar panel edge deletion moduleGAJARIA DHRUV·Filed 2009·Granted Jul 31, 2012·7 cites·19 claims
- 4371US9587310B2Lid assembly for a processing system to facilitate sequential deposition techniquesAPPLIED MATERIALS INC·Filed 2014·Granted Mar 7, 2017·1 cites·20 claims
- 4470US8821637B2Temperature controlled lid assembly for tungsten nitride depositionGELATOS AVGERINOS V·Filed 2008·Granted Sep 2, 2014·3 cites·14 claims
- 4561US2014076234A1Multi chamber processing systemAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 4658US2009205703A1Apparatus and method of mounting and supporting a solar panelAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4751US2007095285A1Apparatus for cyclical depositing of thin filmsTHAKUR RANDHIR P·Filed 2006·Application pending·0 cites
- 4851US2011114020A1Lid assembly for a processing system to facilitate sequential deposition techniquesTZU GWO-CHUAN·Filed 2011·Application pending·0 cites
- 4945US2006021703A1Dual gas faceplate for a showerhead in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 5045US2004003780A1Self aligning non contact shadow ring process kitAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →