Inventor · disambiguated record
Andrei Veldman
Also filed as: VELDMAN ANDREI
23 granted patents·173 citations·filing 1998–2022
95Inventor score
Top patents by PatentIndex Score
23 records- 0197US10775323B2Full beam metrology for X-ray scatterometry systemsKLA TENCOR CORP·Filed 2017·Granted Sep 15, 2020·19 cites·21 claims
- 0297US9885962B2Methods and apparatus for measuring semiconductor device overlay using X-ray metrologyKLA TENCOR CORP·Filed 2014·Granted Feb 6, 2018·35 cites·22 claims
- 0394US7716003B1Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reductionKLA TENCOR TECH CORP·Filed 2007·Granted May 11, 2010·23 cites·14 claims
- 0492US11099137B2Visualization of three-dimensional semiconductor structuresKLA CORP·Filed 2020·Granted Aug 24, 2021·3 cites·21 claims
- 0591US11313816B2Full beam metrology for x-ray scatterometry systemsKLA CORP·Filed 2020·Granted Apr 26, 2022·2 cites·19 claims
- 0691US8798966B1Measuring critical dimensions of a semiconductor structureHENCH JOHN·Filed 2007·Granted Aug 5, 2014·38 cites·35 claims
- 0789US10712145B2Hybrid metrology for patterned wafer characterizationKLA TENCOR CORP·Filed 2017·Granted Jul 14, 2020·6 cites·20 claims
- 0888US9400246B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2012·Granted Jul 26, 2016·5 cites·24 claims
- 0985US10794839B2Visualization of three-dimensional semiconductor structuresKLA TENCOR CORP·Filed 2019·Granted Oct 6, 2020·4 cites·21 claims
- 1083US11073487B2Methods and systems for characterization of an x-ray beam with high spatial resolutionKLA TENCOR CORP·Filed 2018·Granted Jul 27, 2021·3 cites·35 claims
- 1183US10185303B2Optimizing computational efficiency by multiple truncation of spatial harmonicsKLA TENCOR CORP·Filed 2016·Granted Jan 22, 2019·2 cites·20 claims
- 1283US9255877B2Metrology system optimization for parameter trackingKLA TENCOR CORP·Filed 2014·Granted Feb 9, 2016·6 cites·20 claims
- 1383US7480047B1Time-domain computation of scattering spectra for use in spectroscopic metrologyKLA TENCOR CORP·Filed 2005·Granted Jan 20, 2009·8 cites·28 claims
- 1479US12320763B2Full beam metrology for x-ray scatterometry systemsKLA CORP·Filed 2022·Granted Jun 3, 2025·0 cites·20 claims
- 1573US11913874B2Optical metrology tool equipped with modulated illumination sourcesKLA CORP·Filed 2021·Granted Feb 27, 2024·0 cites·12 claims
- 1670US7826072B1Method for optimizing the configuration of a scatterometry measurement systemKLA TENCOR TECH CORP·Filed 2007·Granted Nov 2, 2010·6 cites·19 claims
- 1764US10215688B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2016·Granted Feb 26, 2019·0 cites·19 claims
- 1863US10969328B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2019·Granted Apr 6, 2021·0 cites·10 claims
- 1963US10677586B2Phase revealing optical and X-ray semiconductor metrologyKLA TENCOR CORP·Filed 2018·Granted Jun 9, 2020·0 cites·20 claims
- 2062US11086288B2Optimizing computational efficiency by multiple truncation of spatial harmonicsKLA TENCOR CORP·Filed 2018·Granted Aug 10, 2021·0 cites·21 claims
- 2142US8760649B1Model-based metrology using tesselation-based discretizationVELDMAN ANDREI·Filed 2008·Granted Jun 24, 2014·0 cites·22 claims
- 2242US6303931B1Method for determining a profile quality grade of an inspected featureAPPLIED MATERIALS INC·Filed 1998·Granted Oct 16, 2001·13 cites·53 claims
- 2338US9523800B2Computation efficiency by iterative spatial harmonics order truncationVELDMAN ANDREI·Filed 2010·Granted Dec 20, 2016·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →