Inventor · disambiguated record
Brian K. Hatcher
Also filed as: HATCHER BRIAN · HATCHER BRIAN K
12 granted patents·20 pending applications·1,209 citations·filing 1997–2023
93Inventor score
Files withAPPLIED MATERIALS INC22BELEN RODOLFO P3PATERSON ALEXANDER3HATCHER BRIAN K1INTERMOLECULAR INC1
Top patents by PatentIndex Score
32 records- 0198US6379575B1Treatment of etching chambers using activated cleaning gasAPPLIED MATERIALS INC·Filed 1997·Granted Apr 30, 2002·375 cites·47 claims
- 0297US7264688B1Plasma reactor apparatus with independent capacitive and toroidal plasma sourcesAPPLIED MATERIALS INC·Filed 2006·Granted Sep 4, 2007·73 cites·16 claims
- 0396US7645357B2Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequencyAPPLIED MATERIALS INC·Filed 2006·Granted Jan 12, 2010·40 cites·12 claims
- 0496US6367410B1Closed-loop dome thermal control apparatus for a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1997·Granted Apr 9, 2002·620 cites·29 claims
- 0593US7780864B2Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distributionAPPLIED MATERIALS INC·Filed 2006·Granted Aug 24, 2010·21 cites·17 claims
- 0692US7674394B2Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distributionAPPLIED MATERIALS INC·Filed 2007·Granted Mar 9, 2010·17 cites·21 claims
- 0789US8066895B2Method to control uniformity using tri-zone showerheadBELEN RODOLFO P·Filed 2008·Granted Nov 29, 2011·18 cites·23 claims
- 0886US7777152B2High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuckAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·26 cites·15 claims
- 0983US8236133B2Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension biasKATZ DAN·Filed 2008·Granted Aug 7, 2012·13 cites·9 claims
- 1079US7727413B2Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion densityAPPLIED MATERIALS INC·Filed 2006·Granted Jun 1, 2010·5 cites·14 claims
- 1158US2008193673A1Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrodeAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1258US2008178805A1Mid-chamber gas distribution plate, tuned plasma flow control grid and electrodeAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1356US8017526B2Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch processAPPLIED MATERIALS INC·Filed 2007·Granted Sep 13, 2011·1 cites·17 claims
- 1456US2024379329A1High efficiency microwave plasma applicatorAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1553US2008023443A1Alternating asymmetrical plasma generation in a process chamberPATERSON ALEXANDER·Filed 2007·Application pending·0 cites
- 1653US2013166088A1Combinatorial High Power Coaxial Switching MatrixINTERMOLECULAR INC·Filed 2013·Application pending·0 cites
- 1753US2024153795A1Modular microwave source with integrated optical sensorsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1849US2008230008A1Plasma species and uniformity control through pulsed vhf operationPATERSON ALEXANDER·Filed 2007·Application pending·0 cites
- 1949US2008236490A1Plasma reactor with an overhead inductive antenna and an overhead gas distribution showerheadPATERSON ALEXANDER·Filed 2007·Application pending·0 cites
- 2049US2005241762A1Alternating asymmetrical plasma generation in a process chamberAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2147US2007246161A1Plasma reactor apparatus with a toroidal plasma source and a VHF capacitively coupled plasma source with variable frequencyAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2247US2007245960A1Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion densityAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2347US2007246163A1Plasma reactor apparatus with independent capacitive and inductive plasma sourcesAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2447US2009274590A1Plasma reactor electrostatic chuck having a coaxial rf feed and multizone ac heater power transmission through the coaxial feedAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2547US2007246162A1Plasma reactor apparatus with an inductive plasma source and a VHF capacitively coupled plasma source with variable frequencyAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2647US2007245958A1Dual plasma source process using a variable frequency capacitively coupled source for controlling ion radial distributionAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2747US2007245961A1Dual plasma source process using a variable frequency capacitively coupled source for controlling plasma ion dissociationAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2846US8858766B2Combinatorial high power coaxial switching matrixHATCHER BRIAN K·Filed 2011·Granted Oct 14, 2014·0 cites·13 claims
- 2946US2013168231A1Method For Sputter Deposition And RF Plasma Sputter Etch Combinatorial ProcessingYang hong sheng·Filed 2011·Application pending·0 cites
- 3043US2007246443A1Process using combined capacitively and inductively coupled plasma process for controlling plasma ion dissociationAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3142US2009156011A1Method of controlling CD bias and CD microloading by changing the ceiling-to-wafer gap in a plasma reactorBELEN RODOLFO P·Filed 2007·Application pending·0 cites
- 3242US2008149592A1Plasma etch process for controlling line edge roughnessBELEN RODOLFO P·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →