Inventor · disambiguated record
Colin John Dickinson
Also filed as: DICKINSON COLIN · DICKINSON COLIN J · DICKINSON COLIN JOHN
23 granted patents·16 pending applications·143 citations·filing 2000–2025
95Inventor score
Files withAPPLIED MATERIALS INC30BOC GROUP INC4DICKINSON COLIN1DICKINSON COLIN J1DICKINSON COLIN JOHN1
Top patents by PatentIndex Score
39 records- 0196US9240308B2Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing systemAPPLIED MATERIALS INC·Filed 2014·Granted Jan 19, 2016·17 cites·11 claims
- 0294US9230780B2Hall effect enhanced capacitively coupled plasma sourceAPPLIED MATERIALS INC·Filed 2014·Granted Jan 5, 2016·14 cites·20 claims
- 0393US10685818B2Plasma abatement technology utilizing water vapor and oxygen reagentAPPLIED MATERIALS INC·Filed 2018·Granted Jun 16, 2020·6 cites·20 claims
- 0493US9649592B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2015·Granted May 16, 2017·11 cites·11 claims
- 0593US9552967B2Abatement system having a plasma sourceAPPLIED MATERIALS INC·Filed 2016·Granted Jan 24, 2017·7 cites·16 claims
- 0691US9597634B2Methods and apparatus for treating exhaust gas in a processing systemAPPLIED MATERIALS INC·Filed 2014·Granted Mar 21, 2017·9 cites·19 claims
- 0791US8747762B2Methods and apparatus for treating exhaust gas in a processing systemDICKINSON COLIN JOHN·Filed 2010·Granted Jun 10, 2014·16 cites·14 claims
- 0890US2025201539A1Plasma abatement technology utilizing water vapor and oxygen reagentAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0988US9543124B2Capacitively coupled plasma source for abating compounds produced in semiconductor processesAPPLIED MATERIALS INC·Filed 2015·Granted Jan 10, 2017·4 cites·20 claims
- 1088US6569307B2Object plating method and systemBOC GROUP INC·Filed 2000·Granted May 27, 2003·25 cites·45 claims
- 1187US10115571B2Reagent delivery system freeze prevention heat exchangerAPPLIED MATERIALS INC·Filed 2015·Granted Oct 30, 2018·5 cites·19 claims
- 1284US9867238B2Apparatus for treating an exhaust gas in a forelineAPPLIED MATERIALS INC·Filed 2013·Granted Jan 9, 2018·7 cites·13 claims
- 1379US2025166978A1Plasma abatement technology utilizing water vapor and oxygen reagentAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1477US10449486B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2017·Granted Oct 22, 2019·1 cites·12 claims
- 1574US11185815B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2018·Granted Nov 30, 2021·1 cites·16 claims
- 1674US10920315B2Plasma foreline thermal reactor systemAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·1 cites·20 claims
- 1773US12170192B2Plasma abatement system utilizing water vapor and oxygen reagentAPPLIED MATERIALS INC·Filed 2020·Granted Dec 17, 2024·0 cites·12 claims
- 1870US10625312B2Plasma abatement solids avoidance by use of oxygen plasma cleaning cycleAPPLIED MATERIALS INC·Filed 2017·Granted Apr 21, 2020·1 cites·16 claims
- 1970US6701972B2Vacuum load lock, system including vacuum load lock, and associated methodsBOC GROUP INC·Filed 2002·Granted Mar 9, 2004·14 cites·151 claims
- 2065US11110392B2Apparatus for treating exhaust gas in a processing systemAPPLIED MATERIALS INC·Filed 2019·Granted Sep 7, 2021·0 cites·10 claims
- 2165US2025010431A1Polishing fluid recovery and reuse system for semiconductor substrate processingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2262US12183559B2Apparatus for temperature control in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2021·Granted Dec 31, 2024·0 cites·20 claims
- 2362US2018226234A1Plasma abatement technology utilizing water vapor and oxygen reagentAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2459US10722840B2Methods for treating exhaust gas in a processing systemAPPLIED MATERIALS INC·Filed 2017·Granted Jul 28, 2020·0 cites·18 claims
- 2558US10176973B2Method of cooling a composition using a hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing systemAPPLIED MATERIALS INC·Filed 2017·Granted Jan 8, 2019·0 cites·12 claims
- 2658US2015252473A1Plasma foreline thermal reactor systemAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 2755US8053034B1High performance tank systemsDICKINSON COLIN·Filed 2009·Granted Nov 8, 2011·3 cites·8 claims
- 2852US2025332687A1Nozzle assembly for a fluid recovery systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2949US2023290614A1Heat shield assemblies for minimizing heat radiation to pump of process chamberAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3048US6890414B2Purification system and methodBOC GROUP INC·Filed 2001·Granted May 10, 2005·1 cites·73 claims
- 3147US2003205478A1Object plating method and systemBOC GROUP INC·Filed 2003·Application pending·0 cites
- 3242US2016276179A1Nitrogen oxide abatement in semiconductor fabricationAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3341US2014262033A1Gas sleeve for foreline plasma abatement systemAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3441US2016166868A1Plasma abatement using water vapor in conjunction with hydrogen or hydrogen containing gasesAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3541US2007077134A1Vacuum handler systems and processes for flexible automation of semiconductor fabricationDICKINSON COLIN J·Filed 2005·Application pending·0 cites
- 3638US2005145271A1Megasonic cleaning vessel using supercritical CO2Filed 2004·Application pending·0 cites
- 3738US2005145181A1Method and apparatus for high speed atomic layer depositionFiled 2003·Application pending·0 cites
- 3837US2010192773A1Abatement apparatus with scrubber conduitAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3937US2016089630A1Vacuum foreline reagent addition for fluorine abatementAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Colin John Dickinson files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →