Plasma foreline thermal reactor system
Abstract
The present disclosure relates to methods and apparatus for treating vacuum processing system exhaust gases. In addition, methods and apparatus for maintenance of foreline plasma reactor subsystems are disclosed. In some embodiments, an apparatus for treating an exhaust gas in a foreline of a vacuum processing system includes a plasma source coupled with a foreline of a process chamber, a treatment agent source coupled with the plasma source, and a downstream trap to cool an exhaust stream and trap particles in the exhaust stream. In some embodiments, multiple foreline plasma reactor subsystems are used with a vacuum processing system, and one foreline plasma reactor subsystem can be isolated and maintained (e.g., cleaned) while exhaust gas treatment continues in another foreline plasma reactor subsystem and processing continues in the vacuum processing system.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A foreline plasma reactor subsystem for treating exhaust gases of a vacuum processing chamber, comprising:
a plasma source having a first inlet configured to couple with the vacuum processing chamber; and a downstream trap coupled with an outlet of the plasma source.
2 . The foreline plasma reactor subsystem of claim 1 , further comprising:
a treatment agent source having an outlet coupled with a second inlet of the plasma source.
3 . The foreline plasma reactor subsystem of claim 2 , wherein the treatment agent source supplies oxygen to the plasma source.
4 . The foreline plasma reactor subsystem of claim 2 , wherein the downstream trap comprises coils for cooling the exhaust gases.
5 . The foreline plasma reactor subsystem of claim 1 , wherein the downstream trap comprises coils for cooling the exhaust gases.
6 . The foreline plasma reactor subsystem of claim 1 , wherein the downstream trap comprises cooled collection plates for cooling the exhaust gases.
7 . A foreline plasma reactor subsystem for treating exhaust gases of a vacuum processing chamber, comprising:
a plasma source coupled with the vacuum processing chamber; a first valve operable to isolate the plasma source from the vacuum processing chamber; a maintenance purge gas supply coupled with the plasma source; a downstream trap coupled with an outlet of the plasma source; a second valve operable to isolate the downstream trap from a vacuum pump; and a maintenance vent valve operable to allow gases from the downstream trap to bypass the vacuum pump and flow directly to an abatement subsystem.
8 . The foreline plasma reactor subsystem of claim 7 , further comprising:
a treatment agent source having an outlet coupled with an inlet of the plasma source.
9 . The foreline plasma reactor subsystem of claim 8 , wherein the treatment agent source supplies oxygen to the plasma source.
10 . The foreline plasma reactor subsystem of claim 8 , wherein the downstream trap comprises coils for cooling the exhaust gases.
11 . The foreline plasma reactor subsystem of claim 7 , wherein the downstream trap comprises coils for cooling the exhaust gases.
12 . The foreline plasma reactor subsystem of claim 7 , wherein the downstream trap comprises cooled collection plates for cooling the exhaust gases.
13 . The foreline plasma reactor subsystem of claim 7 , wherein the maintenance purge gas supply supplies nitrogen to the foreline plasma reactor subsystem.
14 . A foreline plasma reactor system for treating exhaust gases of a vacuum processing system, comprising:
a first valve operable to direct exhaust gases into one of at least two foreline plasma reactor subsystems, wherein each foreline plasma reactor subsystem comprises
a plasma source coupled with the valve,
a downstream trap coupled with the plasma source,
a maintenance purge gas supply coupled with the plasma source, and
a maintenance vent valve operable to allow gases from the downstream trap to bypass a vacuum pump of the vacuum processing system and flow directly to an abatement subsystem of the vacuum processing system; and
a second valve downstream of each foreline plasma reactor subsystem operable to isolate each foreline plasma reactor subsystem from the vacuum pump.
15 . The foreline plasma reactor system of claim 14 , further comprising:
at least one treatment agent source having an outlet coupled with an inlet of the plasma source of at least one of the at least two foreline plasma reactor subsystems.
16 . The foreline plasma reactor system of claim 15 , wherein the treatment agent source supplies oxygen to the plasma source.
17 . The foreline plasma reactor system of claim 15 , wherein the downstream trap of at least one of the at least two foreline plasma reactor subsystems comprises coils for cooling the exhaust gases.
18 . The foreline plasma reactor system of claim 14 , wherein the downstream trap of at least one of the at least two foreline plasma reactor subsystems comprises coils for cooling the exhaust gases.
19 . The foreline plasma reactor system of claim 14 , wherein the downstream trap of at least one of the at least two foreline plasma reactor subsystems comprises cooled collection plates for cooling the exhaust gases.
20 . The foreline plasma reactor system of claim 14 , wherein the maintenance purge gas supply of each of the at least two foreline plasma reactor subsystems supplies nitrogen to the corresponding foreline plasma reactor subsystem.Join the waitlist — get patent alerts
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