Inventor · disambiguated record
Mei Sun
Also filed as: SUN MEI · SUN MEI H
43 granted patents·2 pending applications·2,372 citations·filing 1985–2019
98Inventor score
Top patents by PatentIndex Score
45 records- 0196US8033190B2Process condition sensing wafer and data analysis systemKLA TENCOR TECH CORP·Filed 2010·Granted Oct 11, 2011·22 cites·15 claims
- 0296US4986671AThree-parameter optical fiber sensor and systemLUXTRON CORP·Filed 1989·Granted Jan 22, 1991·722 cites·44 claims
- 0396US4752141AFiberoptic sensing of temperature and/or other physical parametersLUXTRON CORP·Filed 1986·Granted Jun 21, 1988·154 cites·24 claims
- 0496US4652143AOptical temperature measurement techniquesLUXTRON CORP·Filed 1985·Granted Mar 24, 1987·118 cites·30 claims
- 0594US10460966B2Encapsulated instrumented substrate apparatus for acquiring measurement parameters in high temperature process applicationsKLA TENCOR CORP·Filed 2016·Granted Oct 29, 2019·13 cites·46 claims
- 0694US6010538AIn situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication linkLUXTRON CORP·Filed 1996·Granted Jan 4, 2000·216 cites·44 claims
- 0793US7855549B2Integrated process condition sensing wafer and data analysis systemKLA TENCOR CORP·Filed 2006·Granted Dec 21, 2010·23 cites·4 claims
- 0893US7135852B2Integrated process condition sensing wafer and data analysis systemSENSARRAY CORP·Filed 2004·Granted Nov 14, 2006·79 cites·31 claims
- 0992US6190040B1Apparatus for sensing temperature on a substrate in an integrated circuit fabrication toolSENSARRAY CORP·Filed 1999·Granted Feb 20, 2001·132 cites·33 claims
- 1092US5107445AModular luminescence-based measuring system using fast digital signal processingLUXTRON CORP·Filed 1990·Granted Apr 21, 1992·89 cites·22 claims
- 1191US4883354AFiberoptic sensing of temperature and/or other physical parametersLUXTRON CORP·Filed 1988·Granted Nov 28, 1989·53 cites·20 claims
- 1290US7757574B2Process condition sensing wafer and data analysis systemKLA TENCOR CORP·Filed 2005·Granted Jul 20, 2010·13 cites·11 claims
- 1390US4988212AFiberoptic sensing of temperature and/or other physical parametersLUXTRON CORP·Filed 1989·Granted Jan 29, 1991·74 cites·4 claims
- 1490US4789992AOptical temperature measurement techniquesLUXTRON CORP·Filed 1987·Granted Dec 6, 1988·84 cites·38 claims
- 1589US6325536B1Integrated wafer temperature sensorsSENSARRAY CORP·Filed 1998·Granted Dec 4, 2001·108 cites·41 claims
- 1688US6616332B1Optical techniques for measuring parameters such as temperature across a surfaceSENSARRAY CORP·Filed 1999·Granted Sep 9, 2003·106 cites·19 claims
- 1788US4859079AOptical system using a luminescent material sensor for measuring very high temperaturesLUXTRON CORP·Filed 1988·Granted Aug 22, 1989·57 cites·14 claims
- 1886US9222842B2High temperature sensor wafer for in-situ measurements in active plasmaSUN MEI·Filed 2013·Granted Dec 29, 2015·9 cites·57 claims
- 1985US8889021B2Process condition sensing device and method for plasma chamberJENSEN EARL·Filed 2010·Granted Nov 18, 2014·6 cites·11 claims
- 2085US8104342B2Process condition measuring deviceSUN MEI H·Filed 2008·Granted Jan 31, 2012·16 cites·37 claims
- 2184US5351268AModular luminescence-based measuring system using fast digital signal processingLUXTRON CORP·Filed 1991·Granted Sep 27, 1994·51 cites·17 claims
- 2282US9823121B2Method and system for measuring radiation and temperature exposure of wafers along a fabrication process lineKLA TENCOR CORP·Filed 2015·Granted Nov 21, 2017·3 cites·52 claims
- 2382US4626110ATechnique for optically measuring the temperature of an ultrasonically heated objectLUXTRON CORP·Filed 1985·Granted Dec 2, 1986·44 cites·15 claims
- 2480US9964440B2Wafer level spectrometerKLA TENCOR CORP·Filed 2015·Granted May 8, 2018·2 cites·32 claims
- 2580US7698952B2Pressure sensing deviceKLA TENCOR CORP·Filed 2007·Granted Apr 20, 2010·13 cites·25 claims
- 2679US10720350B2Etch-resistant coating on sensor wafers for in-situ measurementNGUYEN ANDREW·Filed 2010·Granted Jul 21, 2020·6 cites·16 claims
- 2777US9719867B2Method and system for measuring heat fluxKLA TENCOR CORP·Filed 2014·Granted Aug 1, 2017·5 cites·25 claims
- 2877US5110216AFiberoptic techniques for measuring the magnitude of local microwave fields and powerLUXTRON CORP·Filed 1990·Granted May 5, 1992·40 cites·53 claims
- 2975US7924408B2Temperature effects on overlay accuracyKLA TENCOR TECH CORP·Filed 2007·Granted Apr 12, 2011·4 cites·17 claims
- 3074US10777393B2Process condition sensing device and method for plasma chamberKLA TENCOR CORP·Filed 2017·Granted Sep 15, 2020·1 cites·13 claims
- 3174US7497134B2Process condition measuring device and method for measuring shear force on a surface of a substrate that undergoes a polishing or planarization processKLA TENCOR CORP·Filed 2007·Granted Mar 3, 2009·10 cites·21 claims
- 3273US10215626B2Method and system for measuring radiation and temperature exposure of wafers along a fabrication process lineKLA TENCOR CORP·Filed 2017·Granted Feb 26, 2019·1 cites·23 claims
- 3372US4785824AOptical fiber probe for measuring the temperature of an ultrasonically heated objectLUXTRON CORP·Filed 1987·Granted Nov 22, 1988·31 cites·17 claims
- 3471US6915589B2Sensor positioning systems and methodsSENSARRAY CORP·Filed 2003·Granted Jul 12, 2005·16 cites·27 claims
- 3570US9360302B2Film thickness monitorJENSEN EARL·Filed 2012·Granted Jun 7, 2016·3 cites·18 claims
- 3669US9140604B2Wafer level spectrometerJENSEN EARL·Filed 2012·Granted Sep 22, 2015·2 cites·32 claims
- 3766US9134186B2Process condition measuring device (PCMD) and method for measuring process conditions in a workpiece processing tool configured to process production workpiecesSUN MEI·Filed 2011·Granted Sep 15, 2015·2 cites·52 claims
- 3866US5414266AMeasuring system employing a luminescent sensor and methods of designing the systemLUXTRON CORP·Filed 1993·Granted May 9, 1995·29 cites·5 claims
- 3964US8604361B2Component package for maintaining safe operating temperature of componentsSUN MEI·Filed 2010·Granted Dec 10, 2013·3 cites·28 claims
- 4063US8681493B2Heat shield module for substrate-like metrology deviceVISHAL VAIBHAW·Filed 2011·Granted Mar 25, 2014·2 cites·32 claims
- 4158US11823925B2Encapsulated instrumented substrate apparatus for acquiring measurement parameters in high temperature process applicationsKLA TENCOR CORP·Filed 2019·Granted Nov 21, 2023·0 cites·38 claims
- 4255US2015020972A1Process condition sensing device and method for plasma chamberKLA TENCOR CORP·Filed 2014·Application pending·0 cites
- 4346US2013029433A1Process condition measuring deviceKLA TENCOR CORP·Filed 2012·Application pending·0 cites
- 4440US5109595AMethod of making a fiberoptic sensor of a microwave fieldLUXTRON CORP·Filed 1991·Granted May 5, 1992·10 cites·7 claims
- 4539US11150140B2Instrumented substrate apparatus for acquiring measurement parameters in high temperature process applicationsKLA TENCOR CORP·Filed 2016·Granted Oct 19, 2021·0 cites·34 claims
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