Inventor · disambiguated record
Hamid Noorbakhsh
Also filed as: NOORBAKHSH HAMID
53 granted patents·15 pending applications·1,577 citations·filing 1995–2021
99Inventor score
Files withAPPLIED MATERIALS INC59LAM RES CORP2MAHADESWARASWAMY CHETAN2APPLIED MATERIAL INC1NOORBAKHSH HAMID1
Top patents by PatentIndex Score
68 records- 0198US6586886B1Gas distribution plate electrode for a plasma reactorAPPLIED MATERIALS INC·Filed 2001·Granted Jul 1, 2003·115 cites·46 claims
- 0297US11488806B2L-motion slit door for substrate processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Nov 1, 2022·4 cites·11 claims
- 0397US6983892B2Gas distribution showerhead for semiconductor processingAPPLIED MATERIALS INC·Filed 2004·Granted Jan 10, 2006·190 cites·19 claims
- 0496US10373810B2Showerhead having an extended detachable gas distribution plateAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·15 cites·20 claims
- 0596US9394615B2Plasma resistant ceramic coated conductive articleAPPLIED MATERIALS INC·Filed 2012·Granted Jul 19, 2016·43 cites·20 claims
- 0696US6716302B2Dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2002·Granted Apr 6, 2004·91 cites·18 claims
- 0796US6364957B1Support assembly with thermal expansion compensationAPPLIED MATERIALS INC·Filed 2000·Granted Apr 2, 2002·368 cites·55 claims
- 0895US10378108B2Showerhead with reduced backside plasma ignitionAPPLIED MATERIALS INC·Filed 2016·Granted Aug 13, 2019·6 cites·20 claims
- 0995US6562189B1Plasma reactor with a tri-magnet plasma confinement apparatusAPPLIED MATERIALS INC·Filed 2000·Granted May 13, 2003·69 cites·64 claims
- 1095US6481886B1Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Nov 19, 2002·92 cites·24 claims
- 1194US10954595B2High power showerhead with recursive gas flow distributionAPPLIED MATERIALS INC·Filed 2019·Granted Mar 23, 2021·4 cites·18 claims
- 1294US10847347B2Edge ring assembly for a substrate support in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted Nov 24, 2020·12 cites·16 claims
- 1394US9412579B2Methods and apparatus for controlling substrate uniformityAPPLIED MATERIALS INC·Filed 2013·Granted Aug 9, 2016·16 cites·15 claims
- 1494US6797639B2Dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2002·Granted Sep 28, 2004·63 cites·30 claims
- 1593US9666466B2Electrostatic chuck having thermally isolated zones with minimal crosstalkAPPLIED MATERIALS INC·Filed 2014·Granted May 30, 2017·10 cites·20 claims
- 1693US6432259B1Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution platesAPPLIED MATERIALS INC·Filed 1999·Granted Aug 13, 2002·104 cites·101 claims
- 1792US10745807B2Showerhead with reduced backside plasma ignitionAPPLIED MATERIALS INC·Filed 2019·Granted Aug 18, 2020·3 cites·20 claims
- 1891US9911579B2Showerhead having a detachable high resistivity gas distribution plateAPPLIED MATERIALS INC·Filed 2015·Granted Mar 6, 2018·6 cites·16 claims
- 1991US8880227B2Component temperature control by coolant flow control and heater duty cycle controlMAHADESWARASWAMY CHETAN·Filed 2011·Granted Nov 4, 2014·11 cites·21 claims
- 2091US6320736B1Chuck having pressurized zones of heat transfer gasAPPLIED MATERIALS INC·Filed 1999·Granted Nov 20, 2001·122 cites·37 claims
- 2190US10177050B2Methods and apparatus for controlling substrate uniformityAPPLIED MATERIALS INC·Filed 2016·Granted Jan 8, 2019·5 cites·12 claims
- 2290US9610591B2Showerhead having a detachable gas distribution plateAPPLIED MATERIALS INC·Filed 2013·Granted Apr 4, 2017·8 cites·20 claims
- 2387US10607816B2Showerhead having a detachable high resistivity gas distribution plateAPPLIED MATERIALS INC·Filed 2018·Granted Mar 31, 2020·3 cites·20 claims
- 2487US9540731B2Reconfigurable multi-zone gas delivery hardware for substrate processing showerheadsNOORBAKHSH HAMID·Filed 2010·Granted Jan 10, 2017·14 cites·16 claims
- 2587US6677712B2Gas distribution plate electrode for a plasma receptorAPPLIED MATERIALS INC·Filed 2003·Granted Jan 13, 2004·22 cites·14 claims
- 2686US9909213B2Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactorsAPPLIED MATERIALS INC·Filed 2014·Granted Mar 6, 2018·3 cites·19 claims
- 2784US11130142B2Showerhead having a detachable gas distribution plateAPPLIED MATERIALS INC·Filed 2020·Granted Sep 28, 2021·1 cites·20 claims
- 2883US10625277B2Showerhead having a detachable gas distribution plateAPPLIED MATERIALS INC·Filed 2017·Granted Apr 21, 2020·2 cites·20 claims
- 2982US10790120B2Showerhead having a detachable high resistivity gas distribution plateAPPLIED MATERIALS INC·Filed 2020·Granted Sep 29, 2020·1 cites·15 claims
- 3082US9338871B2Feedforward temperature control for plasma processing apparatusMAHADESWARASWAMY CHETAN·Filed 2010·Granted May 10, 2016·5 cites·14 claims
- 3180US10943808B2Ceramic electrostatic chuck having a V-shape seal bandAPPLIED MATERIALS INC·Filed 2016·Granted Mar 9, 2021·2 cites·20 claims
- 3280US10504765B2Electrostatic chuck assembly having a dielectric fillerAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·2 cites·20 claims
- 3380US6303895B1Method and apparatus for controlling a temperature of a waferLAM RES CORP·Filed 2000·Granted Oct 16, 2001·21 cites·19 claims
- 3480US6140612AControlling the temperature of a wafer by varying the pressure of gas between the underside of the wafer and the chuckLAM RES CORP·Filed 1995·Granted Oct 31, 2000·54 cites·19 claims
- 3578US10886107B2Extended detachable gas distribution plate and showerhead incorporating sameAPPLIED MATERIALS INC·Filed 2019·Granted Jan 5, 2021·1 cites·19 claims
- 3678US6605177B2Substrate support with gas feed-through and methodAPPLIED MATERIAL INC·Filed 2002·Granted Aug 12, 2003·15 cites·11 claims
- 3777US6831742B1Monitoring substrate processing using reflected radiationAPPLIED MATERIALS INC·Filed 2000·Granted Dec 14, 2004·17 cites·99 claims
- 3877US6500299B1Chamber having improved gas feed-through and methodAPPLIED MATERIALS INC·Filed 1999·Granted Dec 31, 2002·37 cites·19 claims
- 3976US10636629B2Split slit liner doorAPPLIED MATERIALS INC·Filed 2017·Granted Apr 28, 2020·2 cites·20 claims
- 4076US9991148B2Electrostatic chuck having thermally isolated zones with minimal crosstalkAPPLIED MATERIALS INC·Filed 2017·Granted Jun 5, 2018·1 cites·20 claims
- 4176US6863835B1Magnetic barrier for plasma in chamber exhaustFiled 2000·Granted Mar 8, 2005·10 cites·33 claims
- 4269US10854425B2Feedforward temperature control for plasma processing apparatusAPPLIED MATERIALS INC·Filed 2016·Granted Dec 1, 2020·1 cites·8 claims
- 4367US2018142354A1Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactorsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4466US10697061B2Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly coolingAPPLIED MATERIALS INC·Filed 2017·Granted Jun 30, 2020·1 cites·5 claims
- 4564US6773544B2Magnetic barrier for plasma in chamber exhaustFiled 2001·Granted Aug 10, 2004·5 cites·17 claims
- 4663US12125688B2L-motion slit door for substrate processing chamberAPPLIED MATERIALS INC·Filed 2021·Granted Oct 22, 2024·0 cites·20 claims
- 4763US10930540B2Electrostatic chuck assembly having a dielectric fillerAPPLIED MATERIALS INC·Filed 2019·Granted Feb 23, 2021·0 cites·9 claims
- 4863US2021043428A1Edge ring assembly for a substrate support in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4962US2021183680A1V-shape seal band for a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 5061US10304715B2Electrostatic chuck having thermally isolated zones with minimal crosstalkAPPLIED MATERIALS INC·Filed 2018·Granted May 28, 2019·0 cites·20 claims
Showing the top 50 of 68 patent records by PatentIndex Score.
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