Assignee
APPLIED MATERIAL INC
US·13 granted patents·5 pending applications·311 citations·filing 1997–2013
Top patents by PatentIndex Score
18 records- 0194US7077264B2Methods and apparatus for transporting substrate carriersAPPLIED MATERIAL INC·Filed 2004·Granted Jul 18, 2006·51 cites·37 claims
- 0293US8011381B2Balanced purge slit valveAPPLIED MATERIAL INC·Filed 2008·Granted Sep 6, 2011·22 cites·22 claims
- 0389US6478937B2Substrate holder system with substrate extension apparatus and associated methodAPPLIED MATERIAL INC·Filed 2001·Granted Nov 12, 2002·28 cites·28 claims
- 0487US7085622B2Vision systemAPPLIED MATERIAL INC·Filed 2002·Granted Aug 1, 2006·49 cites·21 claims
- 0587US7075165B2Embedded waveguide detectorsAPPLIED MATERIAL INC·Filed 2004·Granted Jul 11, 2006·31 cites·14 claims
- 0680US8835311B2High temperature tungsten metallization processAPPLIED MATERIAL INC·Filed 2013·Granted Sep 16, 2014·4 cites·19 claims
- 0779US7037859B2Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fillAPPLIED MATERIAL INC·Filed 2004·Granted May 2, 2006·16 cites·46 claims
- 0878US6605177B2Substrate support with gas feed-through and methodAPPLIED MATERIAL INC·Filed 2002·Granted Aug 12, 2003·15 cites·11 claims
- 0977US8382180B2Advanced FI blade for high temperature extractionAPPLIED MATERIAL INC·Filed 2008·Granted Feb 26, 2013·6 cites·6 claims
- 1071US6635114B2High temperature filter for CVD apparatusAPPLIED MATERIAL INC·Filed 1999·Granted Oct 21, 2003·34 cites·28 claims
- 1168US6103632AIn situ Etching of inorganic dielectric anti-reflective coating from a substrateAPPLIED MATERIAL INC·Filed 1997·Granted Aug 15, 2000·34 cites·16 claims
- 1264US6436207B1Manufacture of target for use in magnetron sputtering of nickel and like magnetic metals for forming metallization films having consistent uniformity through lifeAPPLIED MATERIAL INC·Filed 2000·Granted Aug 20, 2002·4 cites·28 claims
- 1354US6077404AReflow chamber and processAPPLIED MATERIAL INC·Filed 1998·Granted Jun 20, 2000·17 cites·14 claims
- 1451US2009162262A1Plasma reactor gas distribution plate having path splitting manifold side-by-side with showerheadAPPLIED MATERIAL INC·Filed 2007·Application pending·0 cites
- 1549US2006249701A1Methods and apparatus for sealing an opening of a processing chamberAPPLIED MATERIAL INC·Filed 2006·Application pending·0 cites
- 1644US2006249395A1Process and composition for electrochemical mechanical polishingAPPLIED MATERIAL INC·Filed 2006·Application pending·0 cites
- 1739US2013309785A1Rotational absorption spectra for semiconductor manufacturing process monitoring and controlAPPLIED MATERIAL INC·Filed 2013·Application pending·0 cites
- 1836US2003014155A1High temperature substrate transfer robotAPPLIED MATERIAL INC·Filed 2002·Application pending·0 cites
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