Inventor · disambiguated record
Brian T. West
Also filed as: WEST BRIAN · WEST BRIAN T
43 granted patents·10 pending applications·387 citations·filing 2002–2021
98Inventor score
Top patents by PatentIndex Score
53 records- 0196US11011356B2Sputtering target with backside cooling groovesAPPLIED MATERIALS INC·Filed 2020·Granted May 18, 2021·3 cites·20 claims
- 0296US10662520B2Method for recycling substrate process componentsAPPLIED MATERIALS INC·Filed 2017·Granted May 26, 2020·10 cites·17 claims
- 0396US9240308B2Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing systemAPPLIED MATERIALS INC·Filed 2014·Granted Jan 19, 2016·17 cites·11 claims
- 0494US9230780B2Hall effect enhanced capacitively coupled plasma sourceAPPLIED MATERIALS INC·Filed 2014·Granted Jan 5, 2016·14 cites·20 claims
- 0594US7759475B2Enzyme expression methods and compositionsPLEXXIKON INC·Filed 2009·Granted Jul 20, 2010·24 cites·24 claims
- 0694US7517970B2Nucleic acids encoding kinase and phosphatase enzymes, expression vectors and cells containing samePLEXXIKON INC·Filed 2004·Granted Apr 14, 2009·51 cites·26 claims
- 0793US9552967B2Abatement system having a plasma sourceAPPLIED MATERIALS INC·Filed 2016·Granted Jan 24, 2017·7 cites·16 claims
- 0892US9767990B2Apparatus for treating a gas in a conduitAPPLIED MATERIALS INC·Filed 2016·Granted Sep 19, 2017·9 cites·20 claims
- 0992US9378928B2Apparatus for treating a gas in a conduitAPPLIED MATERIALS INC·Filed 2014·Granted Jun 28, 2016·15 cites·20 claims
- 1092US6812471B2Method of surface texturizingAPPLIED MATERIALS INC·Filed 2003·Granted Nov 2, 2004·67 cites·46 claims
- 1188US9779920B2Sputtering target with backside cooling groovesAPPLIED MATERIALS INC·Filed 2014·Granted Oct 3, 2017·5 cites·23 claims
- 1288US9543124B2Capacitively coupled plasma source for abating compounds produced in semiconductor processesAPPLIED MATERIALS INC·Filed 2015·Granted Jan 10, 2017·4 cites·20 claims
- 1388US6713188B2Clean aluminum alloy for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2003·Granted Mar 30, 2004·27 cites·33 claims
- 1486US9754771B2Encapsulated magnetronAPPLIED MATERIALS INC·Filed 2014·Granted Sep 5, 2017·6 cites·14 claims
- 1585US9749688B1Systems and methods for determining multi-platform media ratingsDISNEY ENTPR INC·Filed 2016·Granted Aug 29, 2017·10 cites·20 claims
- 1685US9096927B2Cooling ring for physical vapor deposition chamber targetWEST BRIAN·Filed 2012·Granted Aug 4, 2015·8 cites·20 claims
- 1785US7993470B2Fabricating and cleaning chamber components having textured surfacesAPPLIED MATERIALS INC·Filed 2008·Granted Aug 9, 2011·8 cites·21 claims
- 1884US8828182B2Process chamber gas flow improvementsDETMAR STANLEY·Filed 2011·Granted Sep 9, 2014·9 cites·16 claims
- 1984US7618769B2Textured chamber surfaceAPPLIED MATERIALS INC·Filed 2004·Granted Nov 17, 2009·21 cites·13 claims
- 2083US10153143B2Smart chamber and smart chamber componentsAPPLIED MATERIALS INC·Filed 2015·Granted Dec 11, 2018·3 cites·20 claims
- 2183US9790589B2Gas cooled substrate support for stabilized high temperature depositionAPPLIED MATERIALS INC·Filed 2015·Granted Oct 17, 2017·3 cites·20 claims
- 2283US7048814B2Halogen-resistant, anodized aluminum for use in semiconductor processing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted May 23, 2006·16 cites·4 claims
- 2380US8142989B2Textured chamber surfaceBRUECKNER KARL·Filed 2009·Granted Mar 27, 2012·5 cites·8 claims
- 2479US10714321B2Sputtering target with backside cooling groovesAPPLIED MATERIALS INC·Filed 2018·Granted Jul 14, 2020·1 cites·20 claims
- 2579US9779917B2Process chamber gas flow improvementsAPPLIED MATERIALS INC·Filed 2014·Granted Oct 3, 2017·3 cites·14 claims
- 2678US10049863B2Sputtering target with backside cooling groovesAPPLIED MATERIALS INC·Filed 2017·Granted Aug 14, 2018·1 cites·20 claims
- 2777US9668373B2Substrate support chuck cooling for deposition chamberAPPLIED MATERIALS INC·Filed 2014·Granted May 30, 2017·4 cites·11 claims
- 2875US11251067B2Pedestal lift for semiconductor processing chambersAPPLIED MATERIALS INC·Filed 2019·Granted Feb 15, 2022·2 cites·21 claims
- 2975US7264679B2Cleaning of chamber componentsAPPLIED MATERIALS INC·Filed 2004·Granted Sep 4, 2007·15 cites·24 claims
- 3074US10781518B2Gas cooled electrostatic chuck (ESC) having a gas channel formed therein and coupled to a gas box on both ends of the gas channelAPPLIED MATERIALS INC·Filed 2014·Granted Sep 22, 2020·3 cites·17 claims
- 3174US10344375B2Gas cooled substrate support for stabilized high temperature depositionAPPLIED MATERIALS INC·Filed 2017·Granted Jul 9, 2019·1 cites·20 claims
- 3267US2014102369A1Plasma sprayed deposition ring isolatorAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3366US10867776B2Physical vapor deposition in-chamber electro-magnetAPPLIED MATERIALS INC·Filed 2018·Granted Dec 15, 2020·1 cites·19 claims
- 3464US11469080B1Magnetron assembly having coolant guide for enhanced target coolingAPPLIED MATERIALS INC·Filed 2021·Granted Oct 11, 2022·0 cites·20 claims
- 3563US2014076354A1Removing residues from substrate processing componentsQUANTUM GLOBAL TECH LLC·Filed 2013·Application pending·0 cites
- 3662US10930479B2Smart chamber and smart chamber componentsAPPLIED MATERIALS INC·Filed 2018·Granted Feb 23, 2021·0 cites·11 claims
- 3762US7033447B2Halogen-resistant, anodized aluminum for use in semiconductor processing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Apr 25, 2006·8 cites·2 claims
- 3861US11072852B2Pre-conditioned chamber componentsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 27, 2021·0 cites·20 claims
- 3960US7185760B2Non-contact protective packaging for surface-sensitive articlesAPPLIED MATERIALS INC·Filed 2003·Granted Mar 6, 2007·6 cites·3 claims
- 4058US10176973B2Method of cooling a composition using a hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing systemAPPLIED MATERIALS INC·Filed 2017·Granted Jan 8, 2019·0 cites·12 claims
- 4158US2012107520A1Removing Residues from Substrate Processing ComponentsWEST BRIAN T·Filed 2012·Application pending·0 cites
- 4258US2008196661A1Plasma sprayed deposition ring isolatorWEST BRIAN·Filed 2007·Application pending·0 cites
- 4358US2008092806A1Removing residues from substrate processing componentsAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4453US2008038481A1Fabricating and cleaning chamber components having textured surfacesAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 4551US11056372B2Low temperature biasable substrate supportAPPLIED MATERIALS INC·Filed 2019·Granted Jul 6, 2021·0 cites·18 claims
- 4650US11981989B2Automated temperature controlled substrate supportAPPLIED MATERIALS INC·Filed 2021·Granted May 14, 2024·0 cites·20 claims
- 4750US9865489B2Substrate support chuck cooling for deposition chamberAPPLIED MATERIALS INC·Filed 2017·Granted Jan 9, 2018·0 cites·18 claims
- 4850US2010108641A1Lavacoat pre-clean and pre-heatAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4948US2006188742A1Chamber component having grooved surfaceAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 5042US2006105182A1Erosion resistant textured chamber surfaceAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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