US2006105182A1PendingUtilityA1

Erosion resistant textured chamber surface

Assignee: APPLIED MATERIALS INCPriority: Nov 16, 2004Filed: Nov 16, 2004Published: May 18, 2006
Est. expiryNov 16, 2024(expired)· nominal 20-yr term from priority
H10P 72/7616H10P 72/7614C23C 14/564C23C 16/4404H01J 37/16H01J 37/32504H01J 37/32862H01J 37/32871H01J 2237/022Y10T428/24Y10T428/31678
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Claims

Abstract

A component for a substrate processing chamber has a structure having an overlying metal coating. The metal coating has a plurality of electron beam textured features that are formed by scanning an electron beam across a surface of the metal coating. The electron beam textured features include a plurality of depressions and protuberances on the surface that are capable of accumulating process deposits during processing of a substrate to reduce contamination of the substrate. The component having the metal coating provides improved processing results, and exhibits reduced erosion during cleaning processes performed to remove process deposits from the component.

Claims

exact text as granted — not AI-modified
1 . A component for a substrate processing chamber, the component comprising: 
 (a) a component structure;    (b) a metal coating on the component structure; and    (c) electron beam textured features on the metal coating, the electron beam textured features comprising a plurality of depressions and protuberances,    whereby the component provides improved erosion resistance in the substrate processing chamber.    
   
   
       2 . A component according to  claim 1  wherein the metal coating comprises at least one of stainless steel, copper, nickel, tantalum and titanium.  
   
   
       3 . A component according to  claim 2  wherein the metal coating comprises a sprayed coating that is formed by at least partially melting coating material and propelling the coating material onto the component structure.  
   
   
       4 . A component according to  claim 1  wherein the metal coating has a thickness of from about 120 micrometers to about 2600 micrometers.  
   
   
       5 . A component according to  claim 1  wherein the electron beam textured features comprise depressions having (i) a depth of from about 20 micrometers to about 1600 micrometers, and (ii) a surface diameter of from about 120 micrometers to about 2600 micrometers, and protuberances comprising a height of from about 50 micrometers to about 1600 micrometers.  
   
   
       6 . A component according to  claim 1  wherein the component comprises at least one of a chamber enclosure wall, a chamber shield, a target, a target rim, a cover ring, a deposition ring, a support ring, an insulator ring, a coil, a coil support, a shutter disk, a clamp shield, and a portion of a substrate support.  
   
   
       7 . A substrate processing chamber comprising the component of  claim 1 , the chamber comprising a substrate support, gas delivery system, gas energizer and exhaust.  
   
   
       8 . A process kit for a substrate processing chamber, the process kit comprising: 
 (a) a ring adapted to at least partially surround a substrate in the processing chamber, the ring comprising a metallic material;    (b) a stainless steel coating on the ring; and    (c) electron beam textured features on the stainless steel coating, the electron beam textured features comprising a plurality of depressions and protuberances,    whereby the process kit provides improved erosion resistance in the substrate processing chamber.    
   
   
       9 . A component according to  claim 8  wherein the electron beam textured features comprise depressions having (i) a depth of from about 20 micrometers to about 1600 micrometers, and (ii) a surface diameter of from about 120 micrometers to about 2600 micrometers, and protuberances comprising a height of from about 50 micrometers to about 1600 micrometers.  
   
   
       10 . A component according to  claim 8  wherein the ring comprises a metallic material comprising at least one of titanium, stainless steel, copper, tantalum and aluminum.  
   
   
       11 . A process chamber shield for a substrate processing chamber, the shield comprising: 
 (a) a shield structure adapted to at least partially shield a process chamber wall, the shield structure comprising a metallic material;    (b) a stainless steel coating on the shield structure; and    (c) electron beam textured features on the stainless steel coating, the electron beam textured features comprising a plurality of depressions and protuberances,    whereby the process chamber shield provides improved erosion resistance in the substrate processing chamber.    
   
   
       12 . A component according to  claim 11  wherein the electron beam textured features comprise depressions having (i) a depth of from about 20 micrometers to about 1600 micrometers, and (ii) a surface diameter of from about 120 micrometers to about 2600 micrometers, and protuberances comprising a height of from about 50 micrometers to about 1600 micrometers.  
   
   
       13 . A component according to  claim 11  wherein the shield structure comprises a metallic material comprising at least one of titanium, stainless steel, copper, tantalum and aluminum.  
   
   
       14 . A method of fabricating a component for a substrate processing chamber, the method comprising: 
 (a) providing a component structure;    (b) forming a metal coating on the component structure, the metal coating having a surface; and    (c) scanning an electron beam across the surface to form a plurality of electron beam textured features comprising depressions and protuberances in the surface.    
   
   
       15 . A method according to  claim 14  wherein (b) comprises forming a metal coating comprising at least one of stainless steel, copper, nickel, tantalum and titanium.  
   
   
       16 . A method according to  claim 14  wherein (b) comprises spraying a metal coating on the component structure by at least partially melting coating material and propelling the coating material onto the structure.  
   
   
       17 . A method according to  claim 14  wherein (b) comprises forming a metal coating having a thickness of from about 120 micrometers to about 2600 micrometers.  
   
   
       18 . A method according to  claim 14  wherein (c) comprises scanning an electron beam across the surface to form a plurality of electron beam textured features comprising depressions having (i) a depth of from about 20 micrometers to about 1600 micrometers, and (ii) a surface diameter of from about 120 micrometers to about 2600 micrometers, and protuberances having a height of from about 50 micrometers to about 1600 micrometers.

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