Fabricating and cleaning chamber components having textured surfaces

Abstract

A method of fabricating a substrate processing chamber component involves forming a component having a textured surface and sweeping a jet of pressurized fluid across the textured surface of the component. The jet of fluid is pressurized sufficiently high to dislodge substantially all the particles from the textured surface. The method can be applied to dislodge grit particles from textured exposed surfaces formed by electromagnetic energy beam scanning and grit blasting. The method can also be applied to remove loosely adhered coating particles from the textured surfaces of coated components.

1 . A method of fabricating a substrate processing chamber component, the method comprising: 
 (a) providing a component having a surface;    (b) scanning a beam of electromagnetic energy across the surface to form a textured surface;    (c) grit blasting the textured surface with grit particles; and    (d) sweeping a jet of pressurized fluid across the textured surface, the fluid being pressurized to at least 100 PSI, whereby grit particles are dislodged from the textured surface.    
   
   
       2 . A method according to  claim 1  wherein (d) comprises sweeping a jet of pressurized fluid comprising water.  
   
   
       3 . A method according to  claim 1  wherein (d) comprises sweeping a jet of pressurized fluid at an angle of from about 10 to about 90 degrees with respect to the textured surface.  
   
   
       4 . A method according to  claim 1  wherein (d) comprises sweeping a jet of pressurized fluid that fans out at an angle of from about zero degrees to about 45 degrees.  
   
   
       5 . A method according to  claim 1  wherein in (d) the fluid is pressurized to from about 1000 PSI to about 5000 PSI.  
   
   
       6 . A method according to  claim 1  wherein in (d) the fluid is pressurized to at least 1900 PSI.  
   
   
       7 . A method according to  claim 1  wherein (b) comprises scanning a beam of electromagnetic energy across the surface of the component to form a textured surface having depressions with diameters of from about 0.8 mm to about 3.5 mm.  
   
   
       8 . A method according to  claim 1  wherein (b) comprises scanning a beam of electromagnetic energy across the surface to form a first textured surface comprising depressions having diameters of from about 0.8 mm to about 3.5 mm.  
   
   
       9 . A method according to  claim 1  wherein (b) comprises scanning a beam of electromagnetic energy across the surface to form a first textured surface having a surface roughness average of from about 2500 microinches to about 4000 microinches.  
   
   
       10 . A method according to  claim 9  wherein (c) comprises grit blasting the first textured surface to form a second textured surface overlying the first textured surface, the second textured surface having a surface roughness average of from about 80 microinches to about 300 microinches.  
   
   
       11 . A method according to  claim 1  wherein (a) comprises spraying a coating on the surface of the component.  
   
   
       12 . A method according to  claim 11  comprising twin wire arc spraying a metal coating on the surface of the component.  
   
   
       13 . A method according to  claim 11  comprising plasma spraying a ceramic coating on the surface of the component.  
   
   
       14 . A method according to  claim 1  wherein the component comprises at least one of an enclosure wall, a chamber shield, a target, a cover ring, a deposition ring, a support ring, insulator ring, a coil, coil support, shutter disk, and a surface of the substrate support.  
   
   
       15 . A component fabricated by the method of  claim 14 , wherein the component comprises a textured surface that is substantially absent grit particles.  
   
   
       16 . A method of fabricating a substrate processing chamber component, the method comprising: 
 (a) providing a component having a surface;    (b) scanning a beam of electromagnetic energy across the surface to form a first textured surface having a surface roughness of from about 2500 microinches to about 4000 microinches;    (c) grit blasting the first textured surface with grit particles to form a second textured surface overlying the first textured surface, the second textured surface having a surface roughness average of from about 80 microinches to about 300 microinches; and    (d) sweeping a jet of pressurized water across the first and second textured surfaces of the component, wherein the jet of water is (i) pressurized to at least 1900 PSI, (ii) has an angle with respect to the surfaces of from about 10 degrees to about 90, and (iii) fans out at an angle of from about zero degrees to about 45 degrees, whereby grit particles are dislodged from the first and second textured surfaces.    
   
   
       17 . A method according to  claim 15  wherein the component comprises at least one of an enclosure wall, a chamber shield, a target, a cover ring, a deposition ring, a support ring, insulator ring, a coil, coil support, shutter disk, and a surface of the substrate support.  
   
   
       18 . A component fabricated by the method of  claim 17 , wherein the component comprises a textured surface that is substantially absent adhered or loose particles.