Inventor · disambiguated record
Shoji Ikuhara
Also filed as: IKUHARA SHOJI
36 granted patents·17 pending applications·446 citations·filing 1987–2014
98Inventor score
Top patents by PatentIndex Score
53 records- 0194US7158848B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2006·Granted Jan 2, 2007·19 cites·2 claims
- 0293US7376479B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2006·Granted May 20, 2008·15 cites·2 claims
- 0392US7107115B2Method for controlling semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Sep 12, 2006·17 cites·2 claims
- 0492US6616759B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system thereforHITACHI LTD·Filed 2001·Granted Sep 9, 2003·58 cites·9 claims
- 0588US8038896B2Plasma processing method and apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Oct 18, 2011·12 cites·1 claims
- 0688US7601240B2Disturbance-free, recipe-controlled plasma processing system and methodHITACHI LTD·Filed 2006·Granted Oct 13, 2009·9 cites·2 claims
- 0786US6879867B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2001·Granted Apr 12, 2005·25 cites·19 claims
- 0883US8992721B2Plasma processing apparatusKAGOSHIMA AKIRA·Filed 2010·Granted Mar 31, 2015·7 cites·9 claims
- 0982US6733618B2Disturbance-free, recipe-controlled plasma processing system and methodHITACHI LTD·Filed 2001·Granted May 11, 2004·18 cites·9 claims
- 1082US4936967AMethod of detecting an end point of plasma treatmentHITACHI LTD·Filed 1987·Granted Jun 26, 1990·30 cites·4 claims
- 1180US7058467B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2004·Granted Jun 6, 2006·16 cites·2 claims
- 1279US7343217B2System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equationHITACHI LTD·Filed 2006·Granted Mar 11, 2008·4 cites·5 claims
- 1378US7330346B2Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Feb 12, 2008·6 cites·12 claims
- 1478US6745096B2Maintenance method and system for plasma processing apparatus etching and apparatusHITACHI LTD·Filed 2001·Granted Jun 1, 2004·18 cites·11 claims
- 1577US6706543B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a thereforHITACHI LTD·Filed 2002·Granted Mar 16, 2004·13 cites·7 claims
- 1676US6881352B2Disturbance-free, recipe-controlled plasma processing methodHITACHI LTD·Filed 2003·Granted Apr 19, 2005·12 cites·3 claims
- 1775US7058470B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system thereforHITACHI LTD·Filed 2004·Granted Jun 6, 2006·11 cites·9 claims
- 1875US7010374B2Method for controlling semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Mar 7, 2006·15 cites·12 claims
- 1973US6828165B2Semiconductor plasma processing apparatus with first and second processing state monitoring unitsHITACHI LTD·Filed 2003·Granted Dec 7, 2004·10 cites·3 claims
- 2073US6714832B1Operating method of vacuum processing system and vacuum processing systemHITACHI LTD·Filed 2000·Granted Mar 30, 2004·12 cites·9 claims
- 2171US6941185B2Operating method of vacuum processing system and vacuum processing systemHITACHI LTD·Filed 2002·Granted Sep 6, 2005·11 cites·18 claims
- 2271US6853872B2Operating method of vacuum processing system and vacuum processing systemHITACHI LTD·Filed 2002·Granted Feb 8, 2005·10 cites·10 claims
- 2371US6069096AOperating method of vacuum processing system and vacuum processing systemHITACHI LTD·Filed 1997·Granted May 30, 2000·40 cites·15 claims
- 2469US8083960B2Etching endpoint determination methodUCHIDA HIROSHIGE·Filed 2008·Granted Dec 27, 2011·4 cites·3 claims
- 2568US8282849B2Etching process state judgment method and system thereforMORISAWA TOSHIHIRO·Filed 2009·Granted Oct 9, 2012·3 cites·9 claims
- 2667US9230782B2Plasma processing method and apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Jan 5, 2016·1 cites·2 claims
- 2766US8900401B2Plasma processing method and apparatusIKEGAMI EIJI·Filed 2010·Granted Dec 2, 2014·2 cites·2 claims
- 2865US6776872B2Data processing apparatus for semiconductor processing apparatusHITACHI LTD·Filed 2002·Granted Aug 17, 2004·7 cites·8 claims
- 2964US6939435B1Plasma processing apparatus and processing methodHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 6, 2005·7 cites·16 claims
- 3063US6908529B2Plasma processing apparatus and methodHITACHI HIGH TECH CORP·Filed 2002·Granted Jun 21, 2005·8 cites·14 claims
- 3157US10262840B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Apr 16, 2019·0 cites·5 claims
- 3257US2009120580A1Disturbance-Free, Recipe-Controlled Plasma Processing System And MethodKAGOSHIMA AKIRA·Filed 2009·Application pending·0 cites
- 3356US6596551B1Etching end point judging method, etching end point judging device, and insulating film etching method using these methodsHITACHI LTD·Filed 1999·Granted Jul 22, 2003·17 cites·15 claims
- 3453US7062347B2Maintenance method and system for plasma processing apparatusHITACHI LTD·Filed 2003·Granted Jun 13, 2006·3 cites·16 claims
- 3553US6841032B2Plasma processing apparatus for adjusting plasma processing through detecting plasma processing state within chamberHITACHI HIGH TECH CORP·Filed 2002·Granted Jan 11, 2005·2 cites·4 claims
- 3653US2007193687A1Disturbance-free, recipe-controlled plasma processing system and methodKAGOSHIMA AKIRA·Filed 2007·Application pending·0 cites
- 3752US2006199288A1Data processing apparatus for semiconductor processing apparatusTANAKA JUNICHI·Filed 2006·Application pending·0 cites
- 3851US6885906B2Operating method of vacuum processing system and vacuum processing systemHITACHI LTD·Filed 2002·Granted Apr 26, 2005·2 cites·29 claims
- 3950US6939433B2Sample processing apparatus and sample processing systemHITACHI HIGH TECH CORP·Filed 2002·Granted Sep 6, 2005·2 cites·9 claims
- 4050US2006260746A1Plasma processing apparatusIKUHARA SHOJI·Filed 2005·Application pending·0 cites
- 4148US2010297783A1Plasma Processing MethodIKUHARA SHOJI·Filed 2010·Application pending·0 cites
- 4248US2005284574A1Plasma processing apparatus and processing methodTANAKA JUNICHI·Filed 2005·Application pending·0 cites
- 4348US2010132888A1Plasma Processing ApparatusIKUHARA SHOJI·Filed 2010·Application pending·0 cites
- 4446US2005189320A1Plasma processing methodFiled 2005·Application pending·0 cites
- 4545US2005022932A1Disturbance-free, recipe-controlled plasma processing system and methodFiled 2004·Application pending·0 cites
- 4644US2004177924A1Data processing apparatus for semiconductor processing apparatusFiled 2004·Application pending·0 cites
- 4744US2005108577A1Remote diagnostic system for facilities and remote diagnostic methodFiled 2004·Application pending·0 cites
- 4842US2012085494A1Plasma Etching ApparatusUCHIDA HIROSHIGE·Filed 2011·Application pending·0 cites
- 4941US2003036282A1Etching end point judging deviceFiled 2002·Application pending·0 cites
- 5041US2005217794A1Semiconductor manufacturing apparatus and method for assisting monitoring and analysis of the sameHITACHI HIGH TECH CORP·Filed 2004·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →