Inventor · disambiguated record
Jan Cornelis Van Der Hoeven
Also filed as: VAN DER HOEVEN JAN C · VAN DER HOEVEN JAN CORNELIS
12 granted patents·5 pending applications·95 citations·filing 2004–2018
90Inventor score
Files withASML NETHERLANDS BV8JANSEN HANS3VAN DER HOEVEN JAN CORNELIS2DE JONG FREDERIK EDUARD1KNAAPEN THIJS EGIDIUS JOHANNES1
Top patents by PatentIndex Score
17 records- 0192US9703210B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jul 11, 2017·4 cites·18 claims
- 0292US7880860B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 1, 2011·31 cites·29 claims
- 0392US7705586B2Magnetic sensor for input devicesNXP BV·Filed 2005·Granted Apr 27, 2010·41 cites·20 claims
- 0490US8941811B2Lithographic apparatus and device manufacturing methodJANSEN HANS·Filed 2011·Granted Jan 27, 2015·4 cites·21 claims
- 0589US8638419B2Lithographic apparatus and device manufacturing methodJANSEN HANS·Filed 2011·Granted Jan 28, 2014·4 cites·20 claims
- 0683US8115899B2Lithographic apparatus and device manufacturing methodJANSEN HANS·Filed 2007·Granted Feb 14, 2012·4 cites·31 claims
- 0774US10061207B2Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Aug 28, 2018·1 cites·14 claims
- 0873US8514365B2Lithographic apparatus and device manufacturing methodDE JONG FREDERIK EDUARD·Filed 2007·Granted Aug 20, 2013·5 cites·20 claims
- 0964US10509326B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Dec 17, 2019·0 cites·20 claims
- 1063US2018364585A1Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatusASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 1159US8125610B2Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatusVAN DER HOEVEN JAN CORNELIS·Filed 2005·Granted Feb 28, 2012·1 cites·29 claims
- 1257US2010165319A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 1351US7656502B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Feb 2, 2010·0 cites·29 claims
- 1448US2011281039A1Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatusVAN DER HOEVEN JAN CORNELIS·Filed 2011·Application pending·0 cites
- 1547US2011273679A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 1646US8780321B2Lithographic apparatus and device manufacturing methodKNAAPEN THIJS EGIDIUS JOHANNES·Filed 2009·Granted Jul 15, 2014·0 cites·21 claims
- 1743US2007079318A1Method of manufacturing at least one actuator, as well as a lead frame, optical reading and/or writing head, and an optical reading and/or writing deviceKONINKL PHILIPS ELECTRONICS NV·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →