Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus

Abstract

A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.

What is claimed is: 
     
         1 . A method for preventing or reducing contamination of an immersion type projection apparatus, the apparatus comprising at least one immersion space that is at least partially filled with an immersion liquid when the apparatus projects a beam of radiation onto a substrate, the method comprising:
 supplying at least part of the immersion space with a rinsing liquid and removing the rinsing liquid both before the apparatus is used to project the beam of radiation onto a substrate through the immersion liquid.   
     
     
         2 . The method according to  claim 1 , wherein the supplying and removing occurs during an idle operational mode of the apparatus. 
     
     
         3 . The method according to  claim 1 , wherein the immersion liquid and the rinsing liquid are the same liquid. 
     
     
         4 . The method according to  claim 1 , wherein the supplying and removing occurs substantially continuously until the apparatus is used to project radiation onto a substrate. 
     
     
         5 . The method according to  claim 1 , further comprising illuminating at least part of the immersion space and/or the rinsing liquid with ultraviolet radiation. 
     
     
         6 . The method according to  claim 1 , wherein the immersion space at least extends between at least part of a substrate, a dummy substrate or a substrate-shaped object and/or a substrate holder on one side, and a projection system on an opposite side. 
     
     
         7 . The method according to  claim 6 , further comprising:
 placing the dummy substrate or the substrate-shaped object on the substrate holder; and   replacing the dummy substrate or the substrate-shaped object a substrate to be illuminated by the projection system after the supplying and removing has been completed.   
     
     
         8 . The method according to  claim 1 , wherein the immersion space at least extends between a patterning device, a dummy patterning device or a patterning device-shaped object and/or a patterning device holder on one side, and a projection system on opposite side. 
     
     
         9 . The method according to  claim 8 , further comprising:
 placing the dummy patterning device or the patterning device-shaped object on the patterning device holder; and   replacing the dummy patterning device or the patterning device-shaped object with a patterning device to be used to pattern radiation before the radiation enters the projection system.   
     
     
         10 . The method according to  claim 1 , wherein the apparatus is a lithographic projection apparatus. 
     
     
         11 . The method according to  claim 1 , further comprising:
 varying the location of the immersion space during the supplying and removing to clean different parts and/or areas of the apparatus.   
     
     
         12 . A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including a substrate holder constructed to hold a substrate, a patterning device holder constructed to hold a patterning device, a projection system, and an immersion system configured to at least partially fill an immersion space of the apparatus with an immersion liquid, the method comprising:
 moving the immersion system, or at least part of the apparatus, or both relative to the other; and   supplying the at least part of the apparatus with a rinsing liquid and removing the rinsing liquid both before the apparatus is used to project a patterned beam of radiation through the immersion liquid onto a target portion of a substrate.   
     
     
         13 . The method according to  claim 12 , wherein the at least part of the apparatus comprises at least part of the substrate holder. 
     
     
         14 . The method according to  claim 12 , wherein the at least part of the apparatus comprises at least one slit or aperture extending in or near the substrate holder. 
     
     
         15 . The method according to  claim 12 , wherein the at least part of the apparatus comprises at least part of the patterning device holder. 
     
     
         16 . The method according to  claim 12 , wherein the at least part of the apparatus comprises at least one slit or aperture extending in or near the patterning device holder. 
     
     
         17 . A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including an immersion space, the method comprising:
 supplying a rinsing liquid to at least part of the immersion space for at least one minute.   
     
     
         18 . The method according to  claim 17 , wherein the filling occurs substantially continuously for at least one day, including at least one idle operational period of the apparatus or a part thereof. 
     
     
         19 . A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including a substrate holder constructed to hold a substrate, a patterning device holder constructed to hold a patterning device, a projection system, and an immersion space, the method comprising:
 supplying a rinsing liquid to at least part of the immersion space during an idle time of the apparatus to prevent or reduce substrate contamination during at least one subsequent start-up run of the apparatus.   
     
     
         20 . An immersion type lithographic apparatus comprising:
 at least one immersion space; and   an immersion system configured to at least partially fill the immersion space with an immersion liquid,   wherein the apparatus is configured to supply at least part of the immersion space with a rinsing liquid and to remove the rinsing liquid both before the apparatus is used to project a beam of radiation through the immersion liquid onto a radiation-sensitive substrate.