Assignee
ASML NETHERLANDS BV
NL·3,861 granted patents·1,026 pending applications·32,320 citations·filing 1998–2025
Top patents by PatentIndex Score
4,887 records- 0199US11960213B2Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holderASML NETHERLANDS BV·Filed 2023·Granted Apr 16, 2024·2 cites·20 claims
- 0299US11669021B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2022·Granted Jun 6, 2023·2 cites·20 claims
- 0399US11640116B2Metrology method, computer product and systemASML NETHERLANDS BV·Filed 2020·Granted May 2, 2023·5 cites·20 claims
- 0499US11628498B2Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holderASML NETHERLANDS BV·Filed 2022·Granted Apr 18, 2023·3 cites·20 claims
- 0599US11480882B2Flows of optimization for patterning processesASML NETHERLANDS BV·Filed 2021·Granted Oct 25, 2022·4 cites·20 claims
- 0699US11376663B2Substrate holder and method of manufacturing a substrate holderASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·4 cites·20 claims
- 0799US11235388B2Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holderASML NETHERLANDS BV·Filed 2020·Granted Feb 1, 2022·4 cites·21 claims
- 0899US9946167B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 17, 2018·18 cites·18 claims
- 0999US9740107B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Aug 22, 2017·10 cites·20 claims
- 1099US9366972B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Jun 14, 2016·14 cites·20 claims
- 1199US9360765B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Jun 7, 2016·13 cites·20 claims
- 1299US7593092B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Sep 22, 2009·60 cites·15 claims
- 1399US7593093B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Sep 22, 2009·67 cites·9 claims
- 1499US7388648B2Lithographic projection apparatusASML NETHERLANDS BV·Filed 2005·Granted Jun 17, 2008·136 cites·20 claims
- 1599US7362446B2Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unitASML NETHERLANDS BV·Filed 2005·Granted Apr 22, 2008·164 cites·19 claims
- 1699US7352434B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 1, 2008·178 cites·43 claims
- 1799US7213963B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 8, 2007·196 cites·28 claims
- 1899US7199858B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 3, 2007·409 cites·29 claims
- 1999US7193232B2Lithographic apparatus and device manufacturing method with substrate measurement not through liquidASML NETHERLANDS BV·Filed 2003·Granted Mar 20, 2007·216 cites·33 claims
- 2099US7161659B2Dual stage lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jan 9, 2007·271 cites·14 claims
- 2199US7081943B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jul 25, 2006·199 cites·51 claims
- 2299US7075616B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jul 11, 2006·366 cites·33 claims
- 2399US6952253B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Oct 4, 2005·1.8k cites·45 claims
- 2498US11822254B2Metrology apparatus and a method of determining a characteristic of interestASML NETHERLANDS BV·Filed 2020·Granted Nov 21, 2023·5 cites·17 claims
- 2598US11784098B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Oct 10, 2023·3 cites·21 claims
- 2698US11487198B2Patterning device, a method of making the same, and a patterning device design methodASML NETHERLANDS BV·Filed 2021·Granted Nov 1, 2022·3 cites·20 claims
- 2798US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 2898US11145557B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Oct 12, 2021·5 cites·23 claims
- 2998US11126090B2Model for calculating a stochastic variation in an arbitrary patternASML NETHERLANDS BV·Filed 2020·Granted Sep 21, 2021·9 cites·21 claims
- 3098US11042687B2Fast freeform source and mask co-optimization methodASML NETHERLANDS BV·Filed 2020·Granted Jun 22, 2021·4 cites·20 claims
- 3198US10879031B2Apparatus of plural charged-particle beamsASML NETHERLANDS BV·Filed 2019·Granted Dec 29, 2020·30 cites·20 claims
- 3298US10643820B2Apparatus of plural charged-particle beamsASML NETHERLANDS BV·Filed 2019·Granted May 5, 2020·29 cites·13 claims
- 3398US10585357B2Alternative target design for metrology using modulation techniquesASML NETHERLANDS BV·Filed 2016·Granted Mar 10, 2020·12 cites·20 claims
- 3498US10379445B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2018·Granted Aug 13, 2019·13 cites·20 claims
- 3598US10245641B2Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holderASML NETHERLANDS BV·Filed 2016·Granted Apr 2, 2019·11 cites·20 claims
- 3698US10133188B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2016·Granted Nov 20, 2018·10 cites·25 claims
- 3798US9111062B2Fast freeform source and mask co-optimization methodASML NETHERLANDS BV·Filed 2013·Granted Aug 18, 2015·22 cites·16 claims
- 3898US8760662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2013·Granted Jun 24, 2014·16 cites·7 claims
- 3998US7936444B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted May 3, 2011·35 cites·35 claims
- 4098US7880901B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2010·Granted Feb 1, 2011·63 cites·10 claims
- 4198US7864292B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jan 4, 2011·57 cites·30 claims
- 4298US7859686B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2009·Granted Dec 28, 2010·61 cites·15 claims
- 4398US7791727B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2004·Granted Sep 7, 2010·89 cites·32 claims
- 4498US7791732B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2005·Granted Sep 7, 2010·80 cites·15 claims
- 4598US7733459B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jun 8, 2010·66 cites·50 claims
- 4698US7710540B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted May 4, 2010·94 cites·24 claims
- 4798US7649611B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jan 19, 2010·45 cites·27 claims
- 4898US7636165B2Displacement measurement systems lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 22, 2009·104 cites·43 claims
- 4998US7602489B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Oct 13, 2009·117 cites·18 claims
- 5098US7528965B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2007·Granted May 5, 2009·69 cites·14 claims
Showing the top 50 of 4,887 patent records by PatentIndex Score.
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