Lithographic apparatus and device manufacturing method

Abstract

An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.

1 .- 29 . (canceled) 
   
   
       30 . A device manufacturing method comprising projecting a patterned beam of radiation using a projection system onto the substrate through a liquid, wherein liquid leaks from a space between the projection system and the substrate to cover the substrate and the liquid comprises an additive for lowering the contact angle of the liquid on the substrate. 
   
   
       31 . The method of  claim 30 , wherein the liquid, has a contact angle of less than 70° with the substrate. 
   
   
       32 . A device manufacturing method comprising projecting a patterned beam of radiation onto a substrate through a liquid wherein the liquid is supplied by a liquid supply system and any liquid escaping from the liquid supply system is removed by a liquid removal system which surrounds the liquid supply system and moves relative to the liquid supply system. 
   
   
       33 .- 34 . (canceled)